JP4790970B2 - 放射線誘起表面汚染の軽減 - Google Patents

放射線誘起表面汚染の軽減 Download PDF

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Publication number
JP4790970B2
JP4790970B2 JP2002553187A JP2002553187A JP4790970B2 JP 4790970 B2 JP4790970 B2 JP 4790970B2 JP 2002553187 A JP2002553187 A JP 2002553187A JP 2002553187 A JP2002553187 A JP 2002553187A JP 4790970 B2 JP4790970 B2 JP 4790970B2
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Japan
Prior art keywords
hydrocarbon
gas
water vapor
radiation
carbon
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Expired - Lifetime
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JP2002553187A
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English (en)
Japanese (ja)
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JP2004537157A (ja
JP2004537157A5 (enExample
Inventor
イー クレバノフ レオナルド
エイチ スタレン リチャード
Original Assignee
イーユーヴィー リミテッド リアビリティ コーポレーション
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Radiation-Therapy Devices (AREA)
JP2002553187A 2000-12-21 2000-12-21 放射線誘起表面汚染の軽減 Expired - Lifetime JP4790970B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/035394 WO2002052347A1 (en) 2000-12-21 2000-12-21 Mitigation of radiation induced surface contamination

Publications (3)

Publication Number Publication Date
JP2004537157A JP2004537157A (ja) 2004-12-09
JP2004537157A5 JP2004537157A5 (enExample) 2005-12-22
JP4790970B2 true JP4790970B2 (ja) 2011-10-12

Family

ID=21742108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002553187A Expired - Lifetime JP4790970B2 (ja) 2000-12-21 2000-12-21 放射線誘起表面汚染の軽減

Country Status (5)

Country Link
EP (1) EP1344110B1 (enExample)
JP (1) JP4790970B2 (enExample)
AT (1) ATE460688T1 (enExample)
DE (1) DE60043998D1 (enExample)
WO (1) WO2002052347A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
TWI254839B (en) * 2002-09-30 2006-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1403715A3 (en) * 2002-09-30 2006-01-18 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1431830A3 (en) * 2002-12-20 2004-10-20 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG139554A1 (en) 2002-12-20 2008-02-29 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
TWI299505B (en) * 2003-04-08 2008-08-01 Cymer Inc Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source
GB0408543D0 (en) * 2004-04-16 2004-05-19 Boc Group Plc Cleaning of multi-layer mirrors
US20060196525A1 (en) * 2005-03-03 2006-09-07 Vrtis Raymond N Method for removing a residue from a chamber
JP4599342B2 (ja) * 2005-12-27 2010-12-15 エーエスエムエル ネザーランズ ビー．ブイ． 光学装置、リソグラフィ装置、および、デバイス製造方法
EP2157584A3 (en) * 2008-08-14 2011-07-13 ASML Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
JP5381607B2 (ja) * 2009-10-19 2014-01-08 富士通セミコンダクター株式会社 極端紫外光利用装置
JP6564451B2 (ja) * 2015-03-27 2019-08-21 ギガフォトン株式会社 極端紫外光生成装置及びその設計方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1075991A (ja) * 1996-08-14 1998-03-24 Commiss Energ Atom 紫外線レーザビームによって物体を清掃または汚染除去するための方法および装置
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
JP2000091207A (ja) * 1998-09-14 2000-03-31 Nikon Corp 投影露光装置及び投影光学系の洗浄方法
JP2002110539A (ja) * 2000-09-04 2002-04-12 Asm Lithography Bv リソグラフィ投影装置、デバイス製造方法、およびそれらによって製造されたデバイス

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1075991A (ja) * 1996-08-14 1998-03-24 Commiss Energ Atom 紫外線レーザビームによって物体を清掃または汚染除去するための方法および装置
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
JP2000091207A (ja) * 1998-09-14 2000-03-31 Nikon Corp 投影露光装置及び投影光学系の洗浄方法
JP2002110539A (ja) * 2000-09-04 2002-04-12 Asm Lithography Bv リソグラフィ投影装置、デバイス製造方法、およびそれらによって製造されたデバイス

Also Published As

Publication number Publication date
JP2004537157A (ja) 2004-12-09
EP1344110B1 (en) 2010-03-10
EP1344110A1 (en) 2003-09-17
WO2002052347A1 (en) 2002-07-04
ATE460688T1 (de) 2010-03-15
DE60043998D1 (de) 2010-04-22

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