JP2004537157A5 - - Google Patents
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- Publication number
- JP2004537157A5 JP2004537157A5 JP2002553187A JP2002553187A JP2004537157A5 JP 2004537157 A5 JP2004537157 A5 JP 2004537157A5 JP 2002553187 A JP2002553187 A JP 2002553187A JP 2002553187 A JP2002553187 A JP 2002553187A JP 2004537157 A5 JP2004537157 A5 JP 2004537157A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2000/035394 WO2002052347A1 (en) | 2000-12-21 | 2000-12-21 | Mitigation of radiation induced surface contamination |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004537157A JP2004537157A (ja) | 2004-12-09 |
| JP2004537157A5 true JP2004537157A5 (enExample) | 2005-12-22 |
| JP4790970B2 JP4790970B2 (ja) | 2011-10-12 |
Family
ID=21742108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002553187A Expired - Lifetime JP4790970B2 (ja) | 2000-12-21 | 2000-12-21 | 放射線誘起表面汚染の軽減 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1344110B1 (enExample) |
| JP (1) | JP4790970B2 (enExample) |
| AT (1) | ATE460688T1 (enExample) |
| DE (1) | DE60043998D1 (enExample) |
| WO (1) | WO2002052347A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6724460B2 (en) * | 2001-11-19 | 2004-04-20 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
| TWI254839B (en) * | 2002-09-30 | 2006-05-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| EP1403715A3 (en) * | 2002-09-30 | 2006-01-18 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP1431830A3 (en) * | 2002-12-20 | 2004-10-20 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| SG139554A1 (en) | 2002-12-20 | 2008-02-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| TWI299505B (en) * | 2003-04-08 | 2008-08-01 | Cymer Inc | Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source |
| GB0408543D0 (en) * | 2004-04-16 | 2004-05-19 | Boc Group Plc | Cleaning of multi-layer mirrors |
| US20060196525A1 (en) * | 2005-03-03 | 2006-09-07 | Vrtis Raymond N | Method for removing a residue from a chamber |
| JP4599342B2 (ja) * | 2005-12-27 | 2010-12-15 | エーエスエムエル ネザーランズ ビー．ブイ． | 光学装置、リソグラフィ装置、および、デバイス製造方法 |
| EP2157584A3 (en) * | 2008-08-14 | 2011-07-13 | ASML Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
| JP5381607B2 (ja) * | 2009-10-19 | 2014-01-08 | 富士通セミコンダクター株式会社 | 極端紫外光利用装置 |
| JP6564451B2 (ja) * | 2015-03-27 | 2019-08-21 | ギガフォトン株式会社 | 極端紫外光生成装置及びその設計方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2752386B1 (fr) * | 1996-08-14 | 1998-09-11 | Commissariat Energie Atomique | Procede de nettoyage ou de decontamination d'un objet au moyen d'un faisceau laser ultraviolet et dispositif pour sa mise en oeuvre |
| JPH11224839A (ja) * | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
| JP2000091207A (ja) * | 1998-09-14 | 2000-03-31 | Nikon Corp | 投影露光装置及び投影光学系の洗浄方法 |
| TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
-
2000
- 2000-12-21 AT AT00988384T patent/ATE460688T1/de not_active IP Right Cessation
- 2000-12-21 JP JP2002553187A patent/JP4790970B2/ja not_active Expired - Lifetime
- 2000-12-21 WO PCT/US2000/035394 patent/WO2002052347A1/en not_active Ceased
- 2000-12-21 EP EP00988384A patent/EP1344110B1/en not_active Expired - Lifetime
- 2000-12-21 DE DE60043998T patent/DE60043998D1/de not_active Expired - Lifetime