ATE460688T1 - Reduction de la contamination superficielle causee par des radiations - Google Patents
Reduction de la contamination superficielle causee par des radiationsInfo
- Publication number
- ATE460688T1 ATE460688T1 AT00988384T AT00988384T ATE460688T1 AT E460688 T1 ATE460688 T1 AT E460688T1 AT 00988384 T AT00988384 T AT 00988384T AT 00988384 T AT00988384 T AT 00988384T AT E460688 T1 ATE460688 T1 AT E460688T1
- Authority
- AT
- Austria
- Prior art keywords
- contamination
- causee
- superficielle
- reduction
- par des
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Radiation-Therapy Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2000/035394 WO2002052347A1 (en) | 2000-12-21 | 2000-12-21 | Mitigation of radiation induced surface contamination |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE460688T1 true ATE460688T1 (de) | 2010-03-15 |
Family
ID=21742108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00988384T ATE460688T1 (de) | 2000-12-21 | 2000-12-21 | Reduction de la contamination superficielle causee par des radiations |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1344110B1 (de) |
JP (1) | JP4790970B2 (de) |
AT (1) | ATE460688T1 (de) |
DE (1) | DE60043998D1 (de) |
WO (1) | WO2002052347A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6724460B2 (en) * | 2001-11-19 | 2004-04-20 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
SG128447A1 (en) * | 2002-09-30 | 2007-01-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1403715A3 (de) * | 2002-09-30 | 2006-01-18 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
EP1431830A3 (de) * | 2002-12-20 | 2004-10-20 | ASML Netherlands B.V. | Lithographischer Gerät und Verfahren zur Herstellung einer Vorrichtung |
SG135934A1 (en) | 2002-12-20 | 2007-10-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
TWI299505B (en) * | 2003-04-08 | 2008-08-01 | Cymer Inc | Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source |
GB0408543D0 (en) * | 2004-04-16 | 2004-05-19 | Boc Group Plc | Cleaning of multi-layer mirrors |
US20060196525A1 (en) * | 2005-03-03 | 2006-09-07 | Vrtis Raymond N | Method for removing a residue from a chamber |
JP4599342B2 (ja) * | 2005-12-27 | 2010-12-15 | エーエスエムエル ネザーランズ ビー.ブイ. | 光学装置、リソグラフィ装置、および、デバイス製造方法 |
EP2157584A3 (de) * | 2008-08-14 | 2011-07-13 | ASML Netherlands B.V. | Strahlungsquelle, Lithografiegerät und Herstellungsverfahren für ein Bauteil |
JP5381607B2 (ja) * | 2009-10-19 | 2014-01-08 | 富士通セミコンダクター株式会社 | 極端紫外光利用装置 |
WO2016157315A1 (ja) * | 2015-03-27 | 2016-10-06 | ギガフォトン株式会社 | 極端紫外光生成装置及びその設計方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2752386B1 (fr) * | 1996-08-14 | 1998-09-11 | Commissariat Energie Atomique | Procede de nettoyage ou de decontamination d'un objet au moyen d'un faisceau laser ultraviolet et dispositif pour sa mise en oeuvre |
JPH11224839A (ja) * | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
JP2000091207A (ja) * | 1998-09-14 | 2000-03-31 | Nikon Corp | 投影露光装置及び投影光学系の洗浄方法 |
TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
-
2000
- 2000-12-21 AT AT00988384T patent/ATE460688T1/de not_active IP Right Cessation
- 2000-12-21 DE DE60043998T patent/DE60043998D1/de not_active Expired - Lifetime
- 2000-12-21 WO PCT/US2000/035394 patent/WO2002052347A1/en active Application Filing
- 2000-12-21 JP JP2002553187A patent/JP4790970B2/ja not_active Expired - Lifetime
- 2000-12-21 EP EP00988384A patent/EP1344110B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1344110B1 (de) | 2010-03-10 |
JP4790970B2 (ja) | 2011-10-12 |
WO2002052347A1 (en) | 2002-07-04 |
EP1344110A1 (de) | 2003-09-17 |
DE60043998D1 (de) | 2010-04-22 |
JP2004537157A (ja) | 2004-12-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |