JP4778958B2 - 光学膜の製造方法 - Google Patents
光学膜の製造方法 Download PDFInfo
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- JP4778958B2 JP4778958B2 JP2007508397A JP2007508397A JP4778958B2 JP 4778958 B2 JP4778958 B2 JP 4778958B2 JP 2007508397 A JP2007508397 A JP 2007508397A JP 2007508397 A JP2007508397 A JP 2007508397A JP 4778958 B2 JP4778958 B2 JP 4778958B2
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- 238000004519 manufacturing process Methods 0.000 title description 6
- 239000012788 optical film Substances 0.000 title description 2
- 239000010410 layer Substances 0.000 claims description 236
- 239000000463 material Substances 0.000 claims description 162
- 239000002243 precursor Substances 0.000 claims description 84
- 239000002356 single layer Substances 0.000 claims description 83
- 238000000034 method Methods 0.000 claims description 72
- 239000003153 chemical reaction reagent Substances 0.000 claims description 55
- 239000007789 gas Substances 0.000 claims description 24
- 238000000151 deposition Methods 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 13
- 230000001902 propagating effect Effects 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 12
- 238000001127 nanoimprint lithography Methods 0.000 claims description 10
- 238000001020 plasma etching Methods 0.000 claims description 10
- 239000003989 dielectric material Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 3
- 238000000025 interference lithography Methods 0.000 claims description 3
- 238000001459 lithography Methods 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- HLDBBQREZCVBMA-UHFFFAOYSA-N hydroxy-tris[(2-methylpropan-2-yl)oxy]silane Chemical group CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C HLDBBQREZCVBMA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052743 krypton Inorganic materials 0.000 claims description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 2
- 239000012815 thermoplastic material Substances 0.000 claims description 2
- 229910052724 xenon Inorganic materials 0.000 claims description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 6
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- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
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- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 229910021617 Indium monochloride Inorganic materials 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
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- 230000001934 delay Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
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- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
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- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- -1 Ta 2 O 5 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
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- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1347—Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Polarising Elements (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56289004P | 2004-04-15 | 2004-04-15 | |
US60/562,890 | 2004-04-15 | ||
US10/866,416 | 2004-06-11 | ||
US10/866,416 US20050275944A1 (en) | 2004-06-11 | 2004-06-11 | Optical films and methods of making the same |
PCT/US2005/011860 WO2005101112A2 (en) | 2004-04-15 | 2005-04-08 | Optical films and methods of making the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007532977A JP2007532977A (ja) | 2007-11-15 |
JP2007532977A5 JP2007532977A5 (de) | 2008-05-22 |
JP4778958B2 true JP4778958B2 (ja) | 2011-09-21 |
Family
ID=35150603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007508397A Active JP4778958B2 (ja) | 2004-04-15 | 2005-04-08 | 光学膜の製造方法 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1741003A4 (de) |
JP (1) | JP4778958B2 (de) |
KR (1) | KR20070034992A (de) |
WO (1) | WO2005101112A2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019239926A1 (ja) | 2018-06-12 | 2019-12-19 | ウシオ電機株式会社 | 真空紫外光偏光素子、真空紫外光偏光装置、真空紫外光偏光方法及び配向方法 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8164721B2 (en) | 2003-12-11 | 2012-04-24 | Tan Kim L | Grating trim retarders |
US20050275944A1 (en) * | 2004-06-11 | 2005-12-15 | Wang Jian J | Optical films and methods of making the same |
WO2008022099A2 (en) * | 2006-08-15 | 2008-02-21 | Api Nanofabrication And Research Corp. | Polarizer films and methods of making the same |
US8755113B2 (en) | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
KR100808204B1 (ko) | 2007-04-10 | 2008-03-03 | 엘지전자 주식회사 | 드럼세탁기 |
JP5424730B2 (ja) * | 2009-06-12 | 2014-02-26 | 三菱電機株式会社 | 光学フィルタの製造方法 |
US8611007B2 (en) | 2010-09-21 | 2013-12-17 | Moxtek, Inc. | Fine pitch wire grid polarizer |
US8913321B2 (en) | 2010-09-21 | 2014-12-16 | Moxtek, Inc. | Fine pitch grid polarizer |
US8873144B2 (en) | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
US8913320B2 (en) | 2011-05-17 | 2014-12-16 | Moxtek, Inc. | Wire grid polarizer with bordered sections |
US8922890B2 (en) | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
CN103529507B (zh) * | 2012-07-06 | 2016-05-25 | 三菱电机株式会社 | 偏振光相位差板以及激光加工机 |
JP6274916B2 (ja) * | 2014-03-10 | 2018-02-07 | キヤノン株式会社 | 偏光情報取得ユニットを有する撮像装置 |
KR101944440B1 (ko) * | 2016-03-23 | 2019-01-31 | 한국과학기술원 | 3 차원 나노구조체를 이용한 초박막형 위상차 필름, 및 이를 포함하는 디스플레이 디바이스 |
JPWO2017195810A1 (ja) * | 2016-05-11 | 2019-03-07 | Scivax株式会社 | 位相差素子、位相差素子製造方法および光学部材 |
JP6981074B2 (ja) * | 2017-07-25 | 2021-12-15 | Agc株式会社 | 光学素子 |
JP7165029B2 (ja) * | 2017-12-05 | 2022-11-02 | 信越化学工業株式会社 | 反射防止積層膜、反射防止積層膜の形成方法、及び眼鏡型ディスプレイ |
KR20230074638A (ko) * | 2018-04-16 | 2023-05-30 | 어플라이드 머티어리얼스, 인코포레이티드 | 임시 및 영구 접합을 사용하는 다중 적층 광학 요소들 |
CN108417719B (zh) * | 2018-05-04 | 2021-08-24 | 苏州宝澜环保科技有限公司 | 一种硅基核壳结构光伏电池及其制备方法 |
JP6825610B2 (ja) | 2018-10-02 | 2021-02-03 | セイコーエプソン株式会社 | 偏光素子、液晶装置、および電子機器 |
KR102265168B1 (ko) * | 2019-12-30 | 2021-06-14 | 백석대학교산학협력단 | 스트라이프 구조를 이용한 자외선 차단용 자동차 썬팅 필름 및 썬팅 장치 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1017022B (it) * | 1974-07-02 | 1977-07-20 | Marazzi Ceramica | Impianto automatico perfezionato per l essiccazione e la monocot tura rapida di piastrelle cerami che |
DE3412958A1 (de) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Phasengitter |
US4915463A (en) * | 1988-10-18 | 1990-04-10 | The United States Of America As Represented By The Department Of Energy | Multilayer diffraction grating |
JPH02230203A (ja) * | 1989-03-03 | 1990-09-12 | Nippon Telegr & Teleph Corp <Ntt> | 偏光子 |
US5119231A (en) * | 1990-06-15 | 1992-06-02 | Honeywell Inc. | Hybrid diffractive optical filter |
US5245471A (en) * | 1991-06-14 | 1993-09-14 | Tdk Corporation | Polarizers, polarizer-equipped optical elements, and method of manufacturing the same |
EP0582986B1 (de) * | 1992-08-10 | 1999-01-20 | Canon Kabushiki Kaisha | Halbleitervorrichtung und Herstellungsverfahren |
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-
2005
- 2005-04-08 JP JP2007508397A patent/JP4778958B2/ja active Active
- 2005-04-08 WO PCT/US2005/011860 patent/WO2005101112A2/en active Application Filing
- 2005-04-08 EP EP05744565A patent/EP1741003A4/de not_active Withdrawn
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2006
- 2006-11-08 KR KR1020067023383A patent/KR20070034992A/ko not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019239926A1 (ja) | 2018-06-12 | 2019-12-19 | ウシオ電機株式会社 | 真空紫外光偏光素子、真空紫外光偏光装置、真空紫外光偏光方法及び配向方法 |
KR20210012005A (ko) | 2018-06-12 | 2021-02-02 | 우시오덴키 가부시키가이샤 | 진공 자외광 편광 소자, 진공 자외광 편광 장치, 진공 자외광 편광 방법 및 배향 방법 |
US11709301B2 (en) | 2018-06-12 | 2023-07-25 | Ushio Denki Kabushiki Kaisha | VUV polarizer, VUV polarization device, VUV polarization method and alignment method |
Also Published As
Publication number | Publication date |
---|---|
WO2005101112A3 (en) | 2007-02-08 |
EP1741003A4 (de) | 2009-11-11 |
KR20070034992A (ko) | 2007-03-29 |
EP1741003A2 (de) | 2007-01-10 |
JP2007532977A (ja) | 2007-11-15 |
WO2005101112A2 (en) | 2005-10-27 |
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