JP4760807B2 - Die and coating liquid coating apparatus and coating method, and plasma display panel manufacturing method - Google Patents

Description

  The present invention relates to a die for applying a coating liquid, and a coating liquid coating apparatus and method for applying a paste-like coating liquid to the surface of a substrate using the die. The present invention is particularly applicable to the field of manufacturing plasma display panels (hereinafter sometimes abbreviated as PDP), liquid crystal color filters (hereinafter sometimes abbreviated as LCM), optical filters, printed circuit boards, semiconductors and the like. Application of coating liquid that forms a thin film pattern while discharging the coating liquid in a non-contact manner onto the surface of the object to be coated, such as a glass substrate, particularly in a PDP manufacturing process for applying a high-viscosity coating liquid. It is suitable for the application die and the coating liquid coating apparatus and coating method.

  In recent years, displays have become increasingly diversified in their methods. One thing that is currently attracting attention is a plasma display that is larger, thinner and lighter than conventional cathode-ray tubes. This causes a discharge in the discharge space formed between the front plate and the back plate, and this discharge generates ultraviolet rays centering on a wavelength of 147 nm from the xenon gas, and the ultraviolet rays excite the phosphor to cause display. It becomes possible. Full-color display can be supported by causing the driving circuit to emit light by separately emitting discharge cells in which phosphors emitting red (R), green (G), and blue (B) are separately applied.

  In addition, the AC type plasma display that has been actively developed recently has a front glass plate on which display electrodes / dielectric layers / protective layers are formed and address electrodes / dielectric layers / partition layers / phosphor layers. It has a structure in which a mixed gas of He—Xe or Ne—Xe is sealed in a discharge space that is bonded to a back glass plate and partitioned by stripe-shaped barrier ribs.

  Each phosphor layer of R, G, and B is formed on a concave portion of a concavo-convex portion formed by a partition wall that extends in one direction for each color formed of a phosphor paste mainly composed of powdered phosphor particles on a back plate. Filled in stripes.

  The structure in which the phosphors are formed in a stripe shape also includes a striped black matrix type color picture tube panel.

  In order to manufacture a product having such a structure with high productivity and high quality, a technique of coating phosphors in a certain pattern is important.

  For example, Patent Document 1 discloses a method of applying between the partition walls of a plasma display panel with an application die.

  In this base, a plurality of discharge holes are formed in a substantially straight line at regular intervals, and a coating liquid reservoir is provided inside the base.

  In addition, a coating liquid supply port for supplying the coating liquid to the coating liquid reservoir is provided in the upper part of the base.

  In the base as described above, when the coating liquid is supplied from the coating liquid supply port, the internal pressure of the coating liquid reservoir increases, whereby a predetermined amount of the coating liquid is discharged from the discharge hole, and the coating liquid is applied to the substrate surface. Is to be applied.

Further, the base needs to have a structure having a coating liquid reservoir and a space above the coating liquid, injecting pressurized air into the upper space, and pushing the coating liquid from the base with the pressure. This is because in the structure in which the coating liquid is filled in the base and the fixed amount liquid is fed by a pump or the like, when the viscosity of the phosphor paste, which is the coating liquid, is high, the pipe pressure loss of the coating liquid is large and the coating start delay becomes significant. is there.
In addition, in the die having a space above the coating liquid, it is necessary to supply the phosphor paste in the same amount as the applied amount after the phosphor paste is applied to the base material that is the application target. .

  However, the application of the coating liquid as disclosed in Patent Document 1 has the following problems.

  That is, when the phosphor paste is supplied into the die, if a method of simply dropping the phosphor paste from the upper part of the die is employed, bubbles may be mixed into the phosphor paste. When bubbles are mixed in, the discharged paste is interrupted when the bubbles exit from the discharge holes of the die, resulting in poor application.

  Further, when supplying the phosphor paste into the die, it takes time to supply the phosphor paste from one place. If the phosphor paste has a high viscosity, it takes time for the liquid surface to become flat in the die.

  In addition, the discharge amount of the phosphor paste discharged from the base is determined by the sum of the pressure of the phosphor paste accumulated in the base of the phosphor paste stored in the base and the space above the phosphor paste. Therefore, it is necessary to keep the liquid level of the phosphor paste constant.

  In particular, in the case of a die having a plurality of discharge holes, if the liquid level of the phosphor paste is not kept constant and flat, the discharge amount from each discharge hole will vary and uneven coating will occur. cause. Therefore, it is preferable to supply the coating liquid into the base from a plurality of coating liquid supply ports.

  However, it has been found that if coating liquid is supplied from a plurality of coating liquid supply ports, uneven coating may occur. According to the study of the present inventor, the phosphor paste supplied from a plurality of coating liquid supply ports always joins and stays at a fixed position in the base, but is discharged from the discharge holes near the joining point. It was found that the phosphor paste caused uneven coating.

  That is, when the phosphor paste is supplied to the die, a shearing stress that acts when the phosphor paste flows in the tube or the like acts on the phosphor paste. A high-viscosity paste such as a phosphor paste changes in viscosity depending on the magnitude of the shear stress and the time during which it acts. Part of the phosphor paste that is sheared and supplied into the die always reaches the junction and stays there.

The phosphor paste at the joining point is different from the phosphor paste in the other part because the magnitude of the shear stress and the time during which it acts is different from the phosphor paste in the other part. When pressure is applied to the phosphor paste to be discharged from the discharge hole, there is a correlation between the discharge amount and the viscosity of the paste under the same pressure. As a result, the phosphor paste discharged from the discharge hole near this junction This amount is different from other parts, and causes coating defects such as coating unevenness.
Japanese Patent Laid-Open No. 10-27543

  Accordingly, an object of the present invention is to pay attention to various problems as described above, and to discharge a coating liquid from a plurality of discharge holes, thereby preventing unevenness in coating, and a coating using the same. When applying a high-viscosity phosphor paste from a coating die to a plurality of concave portions of a substrate on which a certain uneven pattern is formed, such as a liquid coating device and a coating method, particularly a partition wall of a plasma display panel, An object of the present invention is to provide a coating apparatus and a coating method capable of coating an appropriate amount of phosphor paste in a desired uniform form.

In order to solve the above-described problems, a die according to the present invention includes a coating liquid reservoir that stores a coating liquid, a plurality of discharge holes that open from the inside to the outside of the coating liquid reservoir, and a coating liquid that is applied to the coating liquid reservoir. A plurality of coating liquid supply ports for supplying are supplied, and each coating liquid supply port branches the flow of the coating liquid from the coating liquid supply source upstream from the coating liquid supply port to supply each coating liquid. It is connected to a tournament channel for supplying to the mouth, and has a mechanism that can divide a plurality of coating liquid supply ports into a plurality of groups and adjust the supply amount or supply opportunity from the coating liquid supply ports of the group It is made up of. In other words, when supplying the coating liquid into the coating liquid reservoir of the base, the coating liquid is supplied from the coating liquid supply source through the tournament channel to each coating liquid supply port in order to make the supply flow rate of the plurality of coating liquid supply ports uniform. To be flown into.

  Moreover, it is preferable that the tip of the coating liquid supply port is formed in a pipe shape, and the tip is provided so as to be immersed in the coating liquid in the coating liquid reservoir. That is, when supplying the coating liquid, in particular, the supply port has a pipe shape so that bubbles are not mixed, and the tip is immersed in the coating liquid.

  Moreover, it is preferable that the intervals between adjacent coating liquid supply ports are all equal. That is, it is desirable that the supply flow rates from the respective coating liquid supply ports are the same and that the intervals between the adjacent coating liquid supply ports are all equal in consideration of the flatness of the coating liquid surface height.

  Moreover, the tournament type flow path can be constituted by a pipe, or can be constituted by sticking together a plate material in which a groove is formed. In particular, in the latter configuration, the inside of the flow path can be easily cleaned by removing the bonded plate material, so that the cleaning property is high.

  A supply flow rate adjustment control valve for adjusting and controlling the supply flow rate of the coating liquid can be provided upstream of the coating liquid supply port. Moreover, the structure which provided the flow volume adjustment control valve upstream of the at least one coating liquid supply port of an adjacent coating liquid supply port is also employable. This supply flow rate adjustment control valve simply opens or closes the valve, or has a throttle element, and changes the supply flow rate over time when it is opened once, and does not change the supply flow rate when it is opened once. In addition, it is a valve that can change the supply flow rate at every supply opportunity in a cycle. With such a configuration, it is possible to shake (move) the position where the coating liquid supplied from each coating liquid supply port joins in the coating liquid reservoir. In other words, if the adjustment control valve for the supply flow rate from each coating liquid supply port is changed (every supply opportunity or over time), the joining position can be moved. In addition, if a change is made in at least one coating liquid supply flow rate of adjacent coating liquid supply ports, the joining position can be moved. As a result, it is possible to shake the coating liquid that has stayed at the merging position or to remain there, the viscosity of the coating liquid does not change significantly, and coating unevenness does not occur.

  Further, the joining position can be moved in a form different from the above. For example, a structure in which the plurality of coating liquid supply ports are divided into two groups, and a tournament type flow path is formed for each group can be adopted. That is, the supply amount supplied from the coating liquid supply port in the same group is made uniform by each tournament type flow path. It is assumed that the coating liquid supply ports are linearly arranged at four places, and the supply ports are arranged in the order of (1), (2), (3), and (4). These are divided into two groups (1) and (2), (3) and (4), and a tournament type flow path is formed in each group. Thereby, it can supply four places simultaneously, and can supply only from (1) and (2) or only from (3) and (4). (1) (2) (3) (4) When supplying at the same time, a location (boundary) where the coating liquid merges occurs between the coating liquid supply ports, and the coating liquid discharged from the coating liquid is applied. Causes unevenness. Therefore, in order to move (blur) the location to be merged, first, when supplying from (1) and (2) only, a merge location is generated between (1) and (2), but (3) and (4) ), The coating liquid flows in the direction of (3) and (4) with time, and the boundary where (1) and (2) join is also moved and blurred. This eliminates coating unevenness. However, if the supply liquid is supplied only from (1) and (2), it is difficult to flow if the coating liquid has a high viscosity. Therefore, the coating liquid on the (3) (4) side is lost or (1) ( The liquid surface height of the coating liquid is greatly different between the 2) side and the (3) (4) side, resulting in poor coating. Therefore, this time, switching from (3) and (4) is performed so as not to happen. That is, if the supply of only (1) and (2), and only (3) and (4) are continued alternately for a certain number of times, the joining position moves each time, and coating unevenness does not occur. In addition, although the several coating liquid supply port was divided and mentioned to two groups, if it is two or more groups, any may be sufficient and the same effect is acquired.

  Alternatively, four or more coating liquid supply ports are provided, and the coating liquid supply ports arranged in a straight line are divided into two groups every other one, and a tournament type flow path is formed for each group. It can also be a structure. That is, similarly to the above, when there are four coating liquid supply ports, (1) and (3) and (2) and (4) are in the same group and are connected by a tournament type flow path. Thereby, it can supply four places simultaneously, and can supply only from (1) and (3) or only from (2) and (4). If the intervals of (1), (2), (3), and (4) are the same, first, if supplied from only (1) and (3), the coating liquid will merge at the position of (2). . Similarly, if the liquid is supplied only from (2) and (4), the coating liquid will merge at the position (3). In other words, when supplying from one group ((1) and (3)), application unevenness occurs at the joining position ((2)) between them, but before the application unevenness occurs, the other group ( When supplied from (2) and (4)), the previously generated joining position is forcibly disturbed (moved), so coating unevenness does not occur. As described above, the supply of only (1) and (3) and only (2) and (4) may be continued alternately. Further, this configuration is more advantageous for the flatness of the liquid level than the configuration described above. For convenience of explanation, (1), (2), (3), and (4) are set at the same interval, but the present invention is not limited to this. Although it can be forcedly disturbed if it is directly supplied later to the position where it merges first, it is possible to sufficiently move the merge position even near the position where it merges. Further, a supply flow rate adjustment control valve for adjusting and controlling the supply flow rate of the coating liquid can be provided upstream of the tournament type flow paths of the two groups. The supply flow rate adjustment control valve is a valve that simply opens and closes the valve, or has a throttle element and can change the supply flow rate with time when it is opened once. If such a structure is taken, supply and stop from each group can be performed easily.

  Further, the base according to the present invention can have a configuration in which the plurality of discharge holes are arranged in a straight line, and the plurality of coating liquid supply ports are arranged in a straight line substantially in parallel with the arrangement direction of the discharge holes.

  A coating liquid coating apparatus according to the present invention includes a table for fixing a substrate, a base provided to face the base, and a base for applying a predetermined amount of coating liquid to the base, and the table and the base in three dimensions. A supply flow rate adjusting control valve for adjusting and controlling a supply flow rate of the coating liquid between the coating liquid tank and the base in a coating apparatus having a moving means for relative movement and a coating liquid tank as a supply source of the coating liquid to the base; And a control means for controlling the flow rate of the supply flow rate adjustment control valve, wherein the base is used as described above.

  Such a coating liquid coating apparatus has a detecting means for detecting the coating liquid amount in the coating liquid reservoir of the base, and the coating liquid between the coating liquid tank and the base is detected according to the detection result of the coating liquid amount. By controlling the liquid supply flow rate adjustment control valve, the coating liquid can be supplied from the coating liquid tank to the base. As a means for detecting the coating liquid amount in the coating liquid reservoir, for example, a sensor for detecting the coating liquid surface height can be used.

  Such a coating liquid coating apparatus is particularly useful for manufacturing a substrate for a plasma display panel. That is, in the plasma display panel substrate manufacturing apparatus according to the present invention, the substrate is a plasma display light-emitting substrate, and the coating liquid emits red, green, or blue light. This paste is characterized by using the coating apparatus as described above.

In the coating liquid coating method according to the present invention, a coating liquid is supplied from a coating liquid supply source to a base having a plurality of discharge holes, the base and the base material are faced to move the base and the base material relatively, A method of discharging a coating liquid from a discharge hole of the base and applying the coating liquid to a substrate, wherein the base is a coating liquid reservoir part for storing the coating liquid, and a plurality of parts for supplying the coating liquid to the coating liquid reservoir part The plurality of coating liquid supply ports are divided into a plurality of groups, and the supply amount or supply opportunity from at least one group of the coating liquid supply ports is divided into a plurality of groups. It consists of a method characterized in that it differs from the supply amount or supply opportunity from the coating liquid supply port .

  In this method, the supply flow rate of the coating liquid from each coating liquid supply port of the plurality of coating liquid supply ports is changed over time, and the coating liquid reservoirs of the coating liquid supplied from the respective coating liquid supply ports are It is possible to supply the coating liquid so that the position where it joins in the section does not remain at a certain fixed position. In addition, when repeating the application of the coating liquid to the substrate and the supply of the coating liquid into the coating liquid reservoir of the base, the supply flow rate of the coating liquid from each coating liquid supply port is changed for each supply. The coating liquid can also be supplied so that the position where the coating liquid supplied from each coating liquid supply port joins in the coating liquid reservoir does not stay at a fixed position.

  In the coating liquid application method according to the present invention, a coating liquid is supplied from a coating liquid supply source to a die having a plurality of ejection holes, and the supply and the substrate are relatively moved with the die facing the substrate. A method of discharging a coating liquid from a discharge hole of the base and applying the coating liquid to a base material, wherein the coating liquid is applied to the base using the base as described above. Become.

  In this method, when the application to the substrate and the supply of the coating liquid into the coating liquid reservoir of the base are repeated, the supply flow rate of the coating liquid from each coating liquid supply port is changed for each supply. be able to. In addition, when a plurality of coating liquid supply ports are divided into two groups, when repeating the application to the base material and the supply of the coating liquid into the coating liquid reservoir of the base, The supply of the coating liquid from the liquid supply port can be alternately switched at every supply opportunity. At that time, the supply of the coating liquid from the coating liquid supply port of each group can be continued, for example, twice or more, and thereafter, this supply operation can be repeated alternately in each group. Also, supply the coating liquid from the coating liquid supply port of one group, supply the coating liquid from the coating liquid supply port of the other group, and supply the coating liquid from the coating liquid supply port of both groups. It can also be repeated at a fixed number of times and cycles.

  In such a coating liquid coating method, the amount of the coating liquid in the coating liquid reservoir of the base can be detected, and the coating liquid can be supplied to the base according to the detection result. In the method for manufacturing a substrate for a plasma display panel according to the present invention, the substrate is a light-emitting substrate for plasma display, and the coating liquid contains phosphor powder that emits light in any one of red, green, and blue. The paste is a method characterized by including a step of applying a coating liquid using the above-described coating method.

  The plasma display panel according to the present invention comprises a substrate for a plasma display panel manufactured by the method as described above.

  Further, according to the die according to the present invention, when supplying a coating liquid such as a phosphor paste to the die, it can be evenly supplied into the coating liquid reservoir by the tournament-type flow path, and supplied from each coating liquid supply port. Since the merging position of the applied coating liquid can be changed, it is possible to ensure a uniform discharge amount from each discharge hole, prevent air bubbles from being mixed into the coating liquid, and prevent the occurrence of defective coating Can do. Therefore, it is possible to apply stably over a long period of time without application unevenness.

  According to the coating liquid coating apparatus and coating method according to the present invention using such a die, high productivity and high quality can be achieved for coating on a substrate.

  Moreover, according to the method for manufacturing a substrate for a plasma display panel and the plasma display of the present invention, since the coating liquid coating apparatus and the coating method are used, a high quality plasma display panel can be produced stably over a long period of time. As a result, high productivity and low cost can be produced.

  The present invention is a die having a plurality of discharge holes for applying a coating liquid to an object to be applied and arranged in a substantially straight line and having a coating liquid reservoir inside, and the discharge hole is formed in the coating liquid reservoir. It is a base provided with struts extending in a direction substantially orthogonal to the arrangement direction.

  A plurality of coating liquid supply ports are provided to supply the coating liquid to the coating liquid reservoir of the base, and the flow of the coating liquid from the upstream coating liquid supply source is branched to each coating liquid supply port. It is a base connected to a tournament channel for supplying the coating liquid to each coating liquid supply port.

  Then, when the supply flow rate of the coating liquid from each coating liquid supply port is changed over time, or the application of the coating liquid to the substrate and the supply of the coating liquid into the coating liquid reservoir of the base are repeated. The position where the coating liquid supplied from each coating liquid supply port merges in the coating liquid reservoir is changed by changing the supply flow rate of the coating liquid from each coating liquid supply port for each supply. It is preferable to apply the coating liquid by supplying the coating liquid so that it does not remain in the area.

  Further, a vertical barrier rib is formed on the surface in a stripe shape, and a base material in which a horizontal barrier rib having a height equal to or less than the height of the vertical barrier rib is formed in a direction substantially orthogonal to the vertical barrier rib, and provided facing the base material. When the coating liquid is discharged from a plurality of discharge holes provided in the base while the base is relatively moved, and the coating liquid is applied to the grooves between the selected vertical partition walls of the base, the discharge of the base is performed. The hole diameter (D), the height of the horizontal partition wall (Hh), the distance between the surface of the base having the discharge holes and the bottom surface of the groove formed between the vertical partition wall and the horizontal partition wall (C) Is preferably defined such that the diameter (D) and the interval (C) satisfy the condition of D + Hh <C.

  Then, the coating liquid is discharged from a plurality of discharge holes provided in the base while relatively moving the base material on which the vertical barrier ribs are formed on the surface and the base provided to face the base material. , A method of applying a coating liquid to a groove between selected vertical partition walls of a base material, the relative speed (V) between the base material and the base, and the discharge speed (v) of the coating liquid from the discharge hole of the base Preferably satisfies the condition of 0 <V / v ≦ 1.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

  FIG. 3 is a perspective view of a die according to the present invention and a coating liquid coating apparatus using the die. This coating apparatus is an apparatus that forms a plurality of rows of striped coating liquid coating portions in a predetermined direction on the upper surface of the substrate 1 to be coated (in this embodiment, a light emitting substrate for plasma display). In FIG. 3, the coating apparatus has X slide rails 3 a and 3 b extending on the machine base 2 in the X-axis direction. An X slide table 4 is provided on the X slide rails 3a and 3b so as to be slidable in the X axis direction. The X slide table 4 is engaged with a drive shaft 5 for sliding the table 4 in the X axis direction. The X slide table 4 is slid in the X axis direction by the X axis motor 6. The substrate 1 is positioned on the X slide table 4 and is adsorbed and supported in a detachable manner.

  Above the machine base 2, a gate-type support machine base 7 is provided so as to straddle the machine base 2. The support machine base 7 has Y slide rails 8a and 8b extending in the Y-axis direction on the side surface 7a on the front side. A Y slide table 9 is provided on the Y slide rails 8a and 8b so as to be slidable in the Y-axis direction. A drive shaft 10 for sliding the table 9 in the Y-axis direction is engaged with the Y slide table 9. The Y slide table 9 is slid in the Y axis direction by the Y axis motor 11. The X slide table 4, the Y slide table 9, etc. constitute a first moving means 29 a that relatively moves the base 18 and the substrate 1 to be coated in the coating direction (X axis, Y axis direction).

  On the Y slide table 9, Z slide rails 12a and 12b extending in the Z-axis direction are provided. A Z slide table 13 is provided on the Z slide rails 12a and 12b so as to be slidable in the Z-axis direction. A drive shaft 14 for sliding the table 13 in the Z-axis direction is engaged with the Z slide table 13. The Z slide table 13 is slid in the Z-axis direction, that is, the direction in which the base 18 approaches and separates from the base material 1 by the Z-axis motor 15 connected to the Z-axis direction position control means 41. In this way, the second moving means 29b is configured.

  A base 18 is attached to the Z slide table 13. A position sensor 17 for detecting the position of the base 18 in the Y-axis direction is attached to the Y slide table 9. The position sensor 17 is movably supported on a sensor support shaft 16 provided in the Y-axis direction on the upper surface of the support machine base 7. A Y-axis direction speed control means 20 for changing the moving speed of the Y slide table 9 is connected to the Y-axis motor 11.

  The base 18 is moved in the Y-axis direction of FIG. 3, and the coating liquid is discharged from a plurality of discharge holes 18 a provided in a substantially straight line at a predetermined interval on the discharge hole forming member 32 of the base 18. A plurality of rows of coating stripes 19 are formed on 1. The discharge holes 18a can be arranged at equal intervals, but can also be formed by changing the intervals at a predetermined period.

  FIG. 4 shows the periphery of the base 18 when the coating apparatus shown in FIG. 3 is viewed from the X-axis direction. The camera 22 attached to the Z slide table 13 images the representative recess 21 in the substrate 1, and the X slide table 4 is moved by the X axis position control unit 24 via the image position processing unit 23. Then, the center of the representative recess 21 is controlled so that the center of the representative discharge hole 18a in the base 18 corresponding to the representative recess 21 substantially coincides. That is, as shown in FIG. 5, the difference ΔX between the image of the concave portion 21 that is a representative of the substrate 1 and the center of the cursor 50 for image processing is corrected by moving the X slide table 4 in the X axis direction. ing.

  The representative recess 21 is the recess 21 in the center of the recess arrangement direction. The representative discharge hole 18a is the discharge hole 18a at the center in the arrangement direction. If the representative concave portion 21 and the representative discharge hole 18a are set to the concave portion 21 and the discharge hole 18a at the center in the arrangement direction, respectively, the positional deviation at the center between the concave portion 21 and the discharge hole 18a at the end in the arrangement direction is minimized. Can be suppressed.

  FIG. 6 is a longitudinal sectional view of the base 18. The base 18 includes a coating liquid reservoir forming member 31 in which a coating liquid reservoir 30 is formed, a discharge hole forming member 32 and a lid member 33 that are joined to the member 31. The members 31, 32, and 33 can be firmly joined to each other by welding, diffusion bonding, adhesion, fastening with bolts, or the like. The lid member 33 has a coating liquid supply port 35 that supplies the coating liquid 34 into the coating liquid reservoir 30 and a compressed air that feeds compressed air into a space 36 formed in the upper part of the coating liquid reservoir 30. A supply port 37 is provided.

  The compressed air supply port 37 is connected to one end of a gas pressure conduction path 38 formed of a pipe line. The other end of the gas pressure conducting path 38 is opened to a gas pressure source 40 having a pressure maintained at a set pressure. The gas pressure conduction path 38 is provided with an opening / closing means 39 formed of a direction switching valve, and the opening / closing switching of the opening / closing means 39 allows the space portion 36 and the gas pressure source 40 to communicate with each other. When the space portion 36 and the gas pressure source 40 are communicated with each other, compressed air is sent into the space portion 36, and the internal pressure of the space portion 36 rises. Along with this, a certain amount of the coating liquid 30 is discharged from the discharge hole 18a. It is designed to be discharged. The opening / closing means 39 detects the position of the discharge hole 18a of the base 18 and the relative position of the substrate 1, and controls the timing of the opening / closing means 39 so that the opening / closing timing is controlled by a position detection / discharge control means (not shown). It has become.

  In the coating liquid reservoir 30, as shown in FIGS. 6 and 7, a support column 41 extending in a direction orthogonal to the arrangement direction of the discharge holes 18a is provided. A plurality of columns 41 are arranged at equal intervals along the arrangement direction of the discharge holes 18a. In this embodiment, the cross-sectional shape of the support column 41 is circular. However, the cross-sectional shape is not limited to this, and it can be formed in an elliptical shape, a triangular shape, a quadrangular shape, a wing shape, or the like. Moreover, the support | pillar 41 and the coating liquid reservoir formation member 31 can also be fastened with the volt | bolt 48, as shown in FIG. An O-ring 49 is interposed on the joint surface between the support column 41 and the member 31 to ensure the sealability of the portion. In this embodiment, the type in which the space portion 36 is formed inside the base 18 is shown. However, for the type of base in which there is no space portion 36 and the coating liquid 34 is filled inside the base. The present invention can also be applied.

  FIG. 9 shows details of the recess 21 formed on the substrate 1 as seen from above. The recesses 21 are filled with phosphor paste 27 (coating liquid 34) of any one of red, blue and green, and the recesses 21 formed at a predetermined pitch by the partition walls 25 (vertical ribs) are the end portions of the display unit. It is not formed in the non-display portion 26. In this embodiment, as shown in FIG. 10, the same color coating liquid can be applied to every second recess 21. Therefore, the pitch of the discharge holes 18a is three times the pitch of the partition walls 25. In addition, the base material 1 may have a horizontal rib perpendicular to the partition wall 25 and the concave portions 21 may be formed in a lattice shape.

  In the present embodiment, since the strut 41 extending in the direction orthogonal to the arrangement direction of the discharge holes 18a is provided in the coating liquid reservoir 30 of the base 18, the arrangement direction of the discharge holes 18a of the base 18, in other words, The pressure strength against the internal pressure in the width direction of the base 18 can be greatly improved, the deformation of the base 18 can be effectively prevented, and the coating liquid can be uniformly applied onto the substrate 1.

  Further, since the columns 41 are arranged at equal intervals in the direction along the arrangement direction of the discharge holes 18a, the pressure resistance against internal pressure can be improved uniformly over the entire length direction of the base 18.

  Moreover, according to the structure which provides the support | pillar 41 like this embodiment, compared with the structure which thickens each member which forms a nozzle | cap | die in order to improve the pressure-proof intensity | strength with respect to the internal pressure of a nozzle | cap | die, a cost increase can be reduced significantly. Further, an increase in weight can be suppressed, and the attaching / detaching work of the base 18 can be facilitated.

  11 and 12 show a base according to the second embodiment of the present invention. In the present embodiment, the base 42 includes a coating liquid reservoir forming member 44 that forms the coating liquid reservoir 43, a discharge hole forming member 45 and a lid member 46 that are joined to the member 44. . A column 47 that extends in a direction perpendicular to the arrangement direction of the discharge holes 42 a is provided in the coating liquid reservoir 43. The support columns 47 are formed integrally with the coating liquid reservoir forming member 44, and a plurality of columns 47 are arranged along the arrangement direction of the discharge holes 42a.

  Also in this embodiment, the pressure strength against the internal pressure of the base 42 can be improved uniformly along the direction in which the discharge holes 42a are arranged, so that deformation of the base 42 can be prevented while suppressing an increase in weight and cost. .

  In this embodiment, since the support column 47 is formed integrally with the coating liquid reservoir forming member 44, an increase in the number of parts constituting the base 42 can be prevented, and handling properties when the base 42 is assembled can be prevented. Can also be improved.

  Next, another preferred embodiment of the present invention will be described with reference to the drawings.

  First, an example of an overall configuration of a coating liquid coating apparatus according to the present invention, particularly an overall configuration of a coating liquid coating apparatus for an uneven base material (for example, a plasma display panel base material) will be described.

  FIG. 13 is an overall perspective view of a coating liquid coating apparatus according to an embodiment of the present invention, and FIG. 14 is a schematic view around the table 206 and the base 220 of FIG.

  First, the overall configuration of the coating liquid coating apparatus will be described. FIG. 13 shows an example of a coating apparatus applied to manufacture of the plasma display panel according to the present invention. This apparatus includes a base 202. A pair of guide groove rails 208 is provided on the base 202, and a table 206 is disposed on the guide groove rails 208. The upper surface of the table 206 is provided with a plurality of suction holes 207 so that the base material 204 having irregularities formed on the surface in a striped pattern in one direction can be fixed to the table surface by vacuum suction. Yes. The base material 204 is moved up and down on the table 206 by lift pins (not shown). Further, the table 206 can reciprocate in the X-axis direction on the guide groove rail 208 via the slide leg 209.

  A feed screw 210 constituting the feed screw mechanism shown in FIG. 14 extends between the pair of guide groove rails 208 through a nut-like connector 211 fixed to the lower surface of the table 206. Both ends of the feed screw 210 are rotatably supported by a bearing 212, and an AC servo motor 216 is connected to one end of the feed screw 210 via a universal joint 214.

  As shown in FIG. 13, a base 220 that discharges the coating liquid is connected to an elevating mechanism 230 and a width direction moving mechanism 236 via a holder 222 above the table 206. The elevating mechanism 230 includes an elevating bracket 228 that can be moved up and down, and is attached to a pair of guide rods inside the casing of the elevating mechanism 230 so as to be movable up and down. In the casing, a feed screw (not shown) made of a ball screw is also rotatably disposed between the guide rods, and is connected to the lifting bracket 228 via a nut-type connector. . Further, an AC servo motor (not shown) is connected to the upper end of the feed screw, and the lifting bracket 228 can be arbitrarily moved up and down by the rotation of the AC servo motor.

  Further, the elevating mechanism 230 is connected to the width direction moving mechanism 236 via a Y-axis moving bracket 232 (actuator). The width direction moving mechanism 236 moves the Y-axis moving bracket 232 so as to reciprocate in the width direction of the base, that is, the Y-axis direction. Guide rods, feed screws, nut type connectors, AC servo motors and the like necessary for operation are arranged in the casing in the same manner as the lifting mechanism 230. The width direction moving mechanism 236 is fixed on the base 202 by a support column 234. With these configurations, the base 220 can be freely moved in the Z-axis and Y-axis directions.

  Further, referring to FIG. 13, an inverted L-shaped sensor column 238 is fixed to the upper surface of the base 202, and the position (height) of the top of the convex portion of the base material 204 on the table 206 is measured at the tip. A height sensor 240 is attached. Next to the height sensor 240, a camera 272 that detects the position of the uneven portion of the base material 204 is attached to the support column 270. As shown in FIG. 14, the camera 272 is electrically connected to the image processing device 274 and can quantitatively determine the change in the uneven portion position.

  Further, a sensor 266 that detects the position of the lower end surface (discharge hole surface) where the discharge hole 244 of the base 220 is provided with respect to the table 206 is attached to one end of the table 206 via the sensor bracket 264.

  Here, one embodiment of the coating apparatus of the present invention is shown in FIG. 14 for the portion for supplying and discharging the coating liquid and the compressed air to the base 220. The base 220 has a coating liquid reservoir 277 for storing the coating liquid therein, and a space 276 at the upper surface of the coating liquid. A compressed air supply hose 281, a compressed air control valve 282, a pressure reducing valve 284, and a compressed air source 286 are connected to the space portion 276 so that compressed air of an arbitrary pressure can be supplied. The pneumatic control valve 282 is controlled to be opened and closed by the overall controller 260. The pneumatic control valve 282 is controlled to be open when the coating liquid is applied, and the coating liquid 242 is discharged from the discharge hole 244 by the pressing force of the compressed air supplied to the space portion 276 in the base 220. The discharge hole 244 may have a hole diameter of 10 to 500 μm depending on the application width of the coating liquid.

  It is preferable that the base 220 has a configuration in which the inside of the base can be opened by removing the lid 280 and a cleaning operation can be performed.

  The amount of coating liquid in the base 220 is detected every time the coating operation is stopped. The coating apparatus of the present invention has a detecting means for detecting the coating liquid amount in the base 220 in a non-contact manner with respect to the coating liquid. For the detection of the coating liquid amount in the coating liquid reservoir 277 of the base 220, contamination by the coating liquid can be prevented by using a non-contact detection means. As this non-contact detection means, a sensor 288 for detecting the liquid level of the coating liquid is provided. The sensor 288 is electrically connected to the general controller 260, and the general controller 260 controls the supply device controller 258 according to the detection signal. In addition, the sensor may not be directly fixed to the base 220 but may be fixed to a sensor bracket (not shown) which is a separate member. In this manner, the sensor 288 is always a separate member even when the base 220 is replaced. There is no need to adjust the sensor position or the like every time the base is replaced. The sensor bracket is preferably one that can adjust the position of the sensor 288 in the height direction and can be fixed at an arbitrary position in consideration of the fact that the detected liquid surface height level varies depending on the shape specification of the base 220. In the present invention, the sensor 288 can be applied as long as it is a sensor capable of non-contact detection such as a laser type and an ultrasonic type. Among them, a laser displacement meter is most preferable from the viewpoint of detection accuracy and wide detection range. In this case, it is preferable to attach a transparent plate to the base 220 so that the liquid level can be detected.

  A filter 247, a coating liquid supply hose 246, a coating liquid supply flow rate adjustment control valve 248, and a coating liquid tank 297 are connected to the base 220. A coating liquid 242 is stored in the coating liquid tank 297 and is connected to a pressurized air source 250 via a compressed air control valve 254.

  In the above embodiment, the motor controller 262 includes the AC servo motor 216 that drives the table 206, the actuators 291 and 293 (for example, AC servo motors) of the elevating mechanism 230 and the width direction moving mechanism 236, and the table 206. A signal from a position sensor 268 for detecting the movement position of the nozzle 220, a signal from each of Y and Z axis linear sensors (not shown) for detecting the operating position of the base 220, and the like are input. Instead of using the position sensor 268, it is also possible to incorporate an encoder in the AC servo motor 216 and detect the position of the table 206 based on a pulse signal output from the encoder.

  In the overall configuration of the above-described coating liquid coating apparatus, the height sensor 240 is a non-contact measurement type using a laser, ultrasonic wave, or the like, or a contact measurement type using a dial gauge, a differential transformer, or the like. Any material having a measurable principle may be used.

  Further, the detection means for detecting the relative position where the discharge hole 244 of the die corresponds to the recess may be configured by an image processing apparatus using a camera that separately detects the recess and the discharge hole of the base material.

  Next, each embodiment is shown regarding the nozzle | cap | die of this invention. That is, the above-described base 220 and the coating liquid supply unit connected thereto can employ the following various configurations.

  FIG. 15 shows a longitudinal sectional view of a base 301 according to an embodiment of the present invention. A plurality of coating liquid supply ports 302 are provided in the base 301, and the plurality of coating liquid supply ports 302 are connected to a pipe that forms a tournament-shaped flow path 303 upstream thereof. Thereby, when supplying the coating liquid 305 to the coating liquid reservoir 304 of the base 301, the coating liquid 305 from the coating liquid supply source is evenly distributed and supplied from each coating liquid supply port 302 into the coating liquid reservoir 304. can do. The lid 306 of the base 301 is provided with a pressurized air supply port 309 that supplies pressurized air for discharging the coating liquid 305 stored in the coating liquid reservoir 304 from the discharge hole 307 to the upper space 308. The plurality of discharge holes 307 are arranged in a straight line, and the plurality of coating liquid supply ports 302 are arranged in a straight line substantially parallel to the arrangement direction of the discharge holes 307.

  FIG. 16 shows a base 311 in which the tip of the coating liquid supply port 312 has a pipe shape and the tip is immersed in the coating liquid 305. Thereby, it is possible to prevent bubbles from being mixed into the coating liquid when the coating liquid is supplied. In addition, in these bases 301 and 311, it is desirable that the intervals between the adjacent coating liquid supply ports are all equal in consideration of the flatness of the coating liquid level. Also, when the intervals between the coating liquid supply ports cannot be made equal, or when the number of coating liquid supply ports is an odd number, or even an even number can only be a multiple of 3, and a uniform tournament type flow path cannot be formed. In order to make the supply amounts from the respective coating liquid supply ports uniform, for example, the flow loss can be made uniform by changing the flow path length or changing the flow path diameter and adjusting the supply flow rate.

  FIG. 17 shows a base 321 in which a tournament channel 323 upstream of the coating liquid supply port 322 is formed by bonding a plate material 324 having a groove. In the case of the pipe as described above, it becomes difficult to clean the inner wall of the pipe if the pipe becomes long. However, if the plate member 324 having the groove is formed, it can be disassembled and cleaned, so that the length of the flow path is increased. It is easy to clean.

  By supplying the coating liquid through the tournament type flow paths 303 and 323 as described above, the coating liquid can be evenly distributed in the coating liquid reservoir 304, and the uniform from each discharge hole 307. A discharge amount can be obtained.

  FIG. 18 shows a base 331 provided with a supply flow rate adjustment control valve 333 for adjusting and controlling the supply flow rate of the coating liquid upstream of the coating liquid supply port 332. The opening degree of the supply flow rate adjustment control valve 333 can be controlled by an electric signal, and the opening degree is controlled by the supply device controller 258. In the illustrated example, a supply flow rate adjustment control valve 333 is provided on one of the flow paths to the pair of coating liquid supply ports 332 branched by the tournament type flow path 334. Accordingly, as shown in FIG. 19, the supply flow rate of the coating liquid from each coating liquid supply port over time at every supply opportunity into the coating liquid reservoir 304 or even once in the supply as shown in FIG. Therefore, the position where the coating liquid merges in the coating liquid reservoir 304 is shaken (moved) so that coating unevenness does not occur. As shown in the figure, the valve 333 can shake the joining position only with one of the adjacent coating liquid supply ports.

  FIG. 21 shows a base 341 in which a plurality of coating liquid supply ports 342 are divided into two groups (groups (1) and (2), (3) and (4)), and each is connected by a tournament channel 343. Is shown. Supply flow adjustment control valves 344a and 344b are provided in each of the two groups. The opening degree of these supply flow rate adjustment control valves 344a and 344b can be controlled by an electric signal, and the opening degree is controlled by the supply device controller 258. Thereby, at the timing as shown in FIG. 22, four locations can be simultaneously supplied, and only (1) and (2) of the coating liquid supply port 342 or only (3) and (4), It is also possible to repeat the supply from only one group. The supply flow rate adjustment control valves 344a and 344b are controlled in a pattern predetermined by the supply device controller 258.

  (1) (2) (3) (4) When supplying simultaneously, the location (boundary) where a coating liquid merges will generate | occur | produce between each coating liquid supply port 342, but as a countermeasure, first, If it is supplied only from 1) and (2), a confluence point is generated between (1) and (2), but since it is not supplied from (3) and (4), the coating liquid will gradually become (3 ) And (4), and the boundary where (1) and (2) meet also moves and blurs. This eliminates coating unevenness. However, if the supply liquid is supplied only from (1) and (2), it is difficult to flow if the coating liquid has a high viscosity. Therefore, the coating liquid on the (3) (4) side is lost or (1) ( The liquid surface height of the coating liquid is greatly different between the 2) side and the (3) (4) side, resulting in poor coating. Therefore, this time, switching from (3) and (4) is performed so as not to happen. That is, if the supply of only (1) and (2), only (3) and (4) is continued a certain number of times, for example, twice or more, and then this supply operation is repeated alternately in each group, The joining position moves each time, and coating unevenness does not occur. In consideration of the flatness of the coating liquid surface, it is better to periodically hold the opportunity to supply simultaneously from both groups, that is, (1), (2), (3), and (4).

  In FIG. 23, every other plurality of coating liquid supply ports 352 are divided into two groups (groups (1) and (3), (2) and (4)), and each is divided into a tournament flow path. A base 351 connected by 353a and 353b is shown. Supply flow rate adjustment control valves 354a and 354b are provided on each of the two groups and on the upstream side where they merge. These supply flow rate adjustment control valves 354a and 354b may be a supply flow rate adjustment control valve having a form as shown in FIG. 21. Alternatively, as shown in FIG. 23, the opening and closing of the valve is controlled by compressed air, and the compressed air is opened and closed by an electric signal. It may be controlled by a pneumatic control valve 354a ′, 354b ′ for controlling the air pressure. As a result, it is possible to supply four locations at the same time, and it is possible to repeat the supply from only one group, such as only (1) and (3) or only (2) and (4). The difference from the embodiment shown in FIG. 21 is that the coating liquid supply port of the other group is located near the joining position of the coating liquid of one group. As a result, when supplying from the coating liquid supply port of one group, a merging position of the coating liquid occurs between them, but if it is switched to supply from the other group before coating unevenness occurs, it occurs first. The approaching merging position is disturbed and coating unevenness does not occur. Further, in this embodiment, compared with the embodiment shown in FIG. 21, the flatness of the liquid level is advantageous. In particular, if the coating liquid supply port of the other group is arranged at the joining position of the coating liquid of one group, it is effective because the joining position can be further disturbed.

  FIG. 24 shows a base 361 provided with a sensor 362 for detecting a coating liquid amount (liquid level in this embodiment) in the coating liquid reservoir 304. Other configurations are substantially the same as those shown in FIG. The sensor 362 is electrically connected to the overall controller 60, and the overall controller 60 controls the supply device controller 58 in accordance with the electrical signal. The supply flow rate adjustment control valves 344a and 344b are application devices that are opened and closed by a supply device controller 258 to supply (replenish) the coating liquid.

  In this apparatus, as one method, an upper limit value and a lower limit value are set for the amount of coating liquid in the coating liquid reservoir 304, and supply is started when the lower limit is exceeded, and the upper limit is reached. Although this method depends on the difference between the upper limit value and the lower limit value, it is a method of supplying a relatively large amount of coating liquid in one supply operation. If the base is as shown in FIG. Since the supply flow rate from each coating liquid supply port can be changed over time during the supply operation, the joining position does not remain at a fixed position and coating unevenness does not occur.

  As another method, there is a method in which a management value is set for the amount of coating liquid in the coating liquid reservoir 304, and supply is started when the amount falls below the management value, and stopped when the amount exceeds the amount. This method is a method of supplying the coating liquid into the coating liquid reservoir 304 every time the coating operation is completed, although it depends on the coating amount on the base material (discharge amount from the base), as shown in FIG. With such a base, if the supply flow rate is changed every time the supply operation is performed, the joining position does not remain at a fixed position, and coating unevenness does not occur. 21 and 23, only (1) and (2) (or (1) and (3) only), (3) and (4) only (or (2) and If the supply of (4) only) is continued a certain number of times, for example, twice or more, and then this supply operation is repeated alternately in each group, the joining position moves each time, and coating unevenness does not occur. As the number of times of the continuous operation increases, the amount of movement at the joining position increases and coating unevenness does not occur. However, considering the flatness of the coating liquid surface, both grooves, that is, (1) (2) (3) (4) It is even better to narrow the opportunity to supply at the same time on a regular basis.

  In addition, as a sensor, there exist some which detect the liquid level height of a coating liquid non-contactingly as mentioned above, for example, there are non-contact displacement meters, such as a laser type and an ultrasonic type. Further, there is a method of measuring the weight of the base and detecting the amount of coating liquid in the coating liquid reservoir, and it is preferable to use a load cell capable of converting the detected weight into an electric signal as the weight detection sensor.

  Furthermore, another preferred embodiment of the present invention will be described with reference to the drawings.

  3, a plurality of vertical barrier ribs 101 extending in the coating liquid application direction and horizontal barrier ribs 102 extending in a direction orthogonal to the vertical barrier ribs 101 are formed on the surface of the substrate 1 in FIG. The relationship between the height (H) of the vertical partition wall 101 and the height (Hh) of the horizontal partition wall 102 is H ≧ Hh. Further, a lattice-shaped groove 110 is formed on the surface of the substrate 1 by the walls 101 and 102, and the groove 110 has recesses 104 and 103. The recess 104 is formed as a portion surrounded by the vertical partition wall 101 and the horizontal partition wall 102. On the other hand, the recess 103 is formed from the tops of the vertical partition walls 101 and the horizontal partition walls 102.

  FIG. 4 shows the periphery of the base 18 when the coating apparatus shown in FIG. 3 is viewed from the X-axis direction. A camera 22 attached to the Z slide table 13 captures an image of the representative groove 110 in the substrate 1, and the X slide table 4 is moved by the X axis position control unit 24 via the image position processing unit 23. The center of the representative groove portion 110 is controlled so that the center of the representative discharge hole 18a in the base 18 corresponding to the representative groove portion 110 substantially coincides.

  FIG. 25 is a schematic longitudinal sectional view of the supply controller for supplying the coating liquid to the base 18 of the coating apparatus shown in FIG. In FIG. 25, a base 418 includes a casing 431, and discharge holes 418a for discharging a large number of coating liquids are formed in a row at predetermined intervals on the lower surface plate 432 of the casing 431. A space 433 inside the housing 431 is formed by a coating liquid storage part 434 in which the coating liquid 430 (phosphor paste 427) is stored and a gas space 435 positioned above the coating liquid storage part 434. The upper surface plate 436 of the housing 431 is provided with a gas pressure conduction hole 437, and one end of a gas pressure conduction path 438 formed of a pipe line is connected to the gas pressure conduction hole 437. The other end of the gas pressure conducting path 438 is opened to a gas pressure source 440 having a pressure maintained at a set pressure. The gas pressure conducting path 438 is provided with an opening / closing means 439 including a direction switching valve, and the gas space 435 and the gas pressure source 440 are communicated with each other by being opened / closed by the opening / closing means 439. The opening / closing means 439 detects the position of the discharge hole 418a of the base 418 and the relative position of the substrate 1, and the opening / closing timing is controlled by a position detection / discharge control means (not shown) that controls the timing of the opening / closing means 439. ing. In this embodiment, the paste 427 is applied with one of R (red), G (green), and B (blue).

  FIG. 26 shows details of the groove 421 formed on the substrate 1 as viewed from above. In this embodiment, as shown in FIG. 27, the same color coating liquid can be applied to every second groove 421. Therefore, the pitch of the discharge holes 418a is three times the pitch of the vertical partition walls 425a. In addition, as the board | substrate 1, as shown in FIG. 28, the thing without the horizontal partition 425b may be sufficient.

  In the present embodiment, there is a gap between the diameter (D) of the discharge hole 418a, the height (Hh) of the horizontal partition wall 425b, and the distance C from the bottom plate 432 of the base 418 to the bottom surface of the recess 421a of the groove 421. , D + Hh <C is established (FIG. 29). The paste 427 discharged from the discharge hole 418a immediately maintains the shape of the discharge hole 418a (FIG. 30). However, as long as the relationship of D + Hh <C is established, even if the paste 427 is applied to the top of the horizontal partition wall 421b, it does not adhere to the lower surface plate 432.

  When the discharge hole 418a is non-circular, the opening dimension (B) in the direction along the application direction of the discharge hole 418a satisfies the relationship B + Hh <C.

  In this embodiment, the relative movement speed (V) between the base 418 and the substrate 1 and the discharge speed (v) of the paste 427 from the discharge hole 418a need to satisfy 0 <V / v ≦ 1. As shown in FIGS. 30 and 31, the paste 427 discharged from the discharge hole 418 a bends in the moving direction of the base 418 or the substrate 1. Therefore, in order to prevent the discharged paste 427 from adhering to the lower surface plate 432, the discharge consisting of the discharge speed (v) and the moving speed (V) of the substrate 1 or the base 418 in the application direction (arrow direction). It is preferable to make the angle (θ) as small as possible. The discharge angle (θ) can be expressed by tan θ = V / v. Further, it has been experimentally found that the adhesion of the paste 427 to the lower surface plate 432 can be prevented in the range of 0 ° <θ ≦ 45 °. Therefore, if 0 <V / v ≦ 1, θ can be kept within the above range, so that the adhesion of the paste 427 to the lower surface plate 432 can be prevented.

  Further, in order to fill the recess 421a with the paste 427 as a whole, the application amount (Q) per unit time is expressed as tan θ = V / v = a / A because Q = a · v = A · V. Can do. Therefore, if 0 <a / A ≦ 1, θ can be kept within the above range, and adhesion of the paste 427 to the lower surface plate 432 can be prevented.

  Further, the coating amount of the substrate having the horizontal partition wall 425b to the groove 421 may be less by the volume of the horizontal partition wall 425b than that of the substrate without the horizontal partition wall 425b. Since the paste 427 is uniformly applied to the substrate with the horizontal barrier ribs as well as the substrate without the horizontal barrier ribs, the paste 427 is deposited on the recesses 421b immediately after the application. However, when left standing (leveling) for a certain period of time, the paste 427 in the recess 421b flows down into the recess 421a, and the filling amount of the coating groove between the horizontal partition walls becomes a necessary amount (full).

Here, the application amount per unit length to the groove portion of the substrate having the horizontal barrier rib is Qh, and the application amount to the groove portion of the substrate having no horizontal barrier rib is Q. In FIG. 2, when the groove width is W, Qh per unit length (Lh + L) is
Qh = W / H / L + W / (H-Hh) / Lh
Q when there is no horizontal partition is
Q = W · H · (Lh + L)
Therefore, the ratio k of the coating amount Qh to the groove portion of the substrate with the horizontal partition wall and the coating amount Q to the groove portion of the substrate without the horizontal partition wall is
k = Qh / Q
= [W · H · L + W · (H−Hh) · Lh] / [W · H · (Lh + L)] = 1− (Hh / H) · (Lh / (L + Lh))
It can be expressed as. Also in this case, since the discharge angle (θ) needs to be set to θ = 45 ° or less, in this embodiment, the condition of 0 <a / (k · A) ≦ 1 is satisfied. .

Example 1
In FIG. 23, four coating liquid supply ports are arranged at intervals of 246 mm on a base having a length of 985 mm, divided into two groups every other, and connected to each other by a stainless steel pipe (inner diameter φ8 mm) to form a tournament type flow path. Configured. When a paste containing a phosphor powder emitting blue light (viscosity of about 600 poise) is supplied to the base and applied to the substrate, the paste is supplied from one group of coating liquid supply ports, and the other group of coating liquid is applied. When the paste supply from the supply port was alternately switched every opportunity, coating unevenness did not occur on the substrate even when 50 substrates were continuous.

It is a perspective view of the board | substrate which has a grid | lattice-like groove part. It is an expanded sectional view of a substrate. It is a perspective view of the nozzle | cap | die which concerns on one embodiment of this invention, and the coating device of the coating liquid using this nozzle | cap | die. FIG. 4 is a schematic view of the periphery of the base when the coating apparatus shown in FIG. 3 is viewed from the X-axis direction. It is the schematic which shows the image of a recessed part, and the cursor of an image process. It is sectional drawing of the nozzle | cap | die of the coating device shown in FIG. It is sectional drawing which follows the VV line of the nozzle | cap | die of FIG. It is an expanded sectional view of the nozzle | cap | die which joined the support | pillar and the coating liquid reservoir formation member with the volt | bolt. It is the schematic which looked at the recessed part on a board | substrate from the upper surface. It is the schematic which shows the positional relationship of a discharge hole and a recessed part. It is sectional drawing of the nozzle | cap | die which concerns on another embodiment of this invention. It is sectional drawing which follows the XX line of the nozzle | cap | die of FIG. 1 is an overall perspective view of a coating liquid coating apparatus according to an embodiment of the present invention. It is a schematic diagram which shows the table of the apparatus of FIG. 13, and the structure around a nozzle | cap | die. It is a schematic block diagram of the nozzle | cap | die which concerns on one embodiment of this invention. It is a schematic block diagram of the nozzle | cap | die which concerns on another embodiment of this invention. It is a schematic block diagram of the nozzle | cap | die which concerns on another embodiment of this invention. It is a schematic block diagram of the nozzle | cap | die which concerns on another embodiment of this invention. It is the figure which represented typically the supply flow volume of the coating liquid from each coating liquid supply port to the coating liquid reservoir part based on one embodiment of this invention. It is the figure which represented typically the supply flow volume of the coating liquid from each coating liquid supply port to another coating liquid reservoir part which concerns on another embodiment of this invention. It is a schematic block diagram of the nozzle | cap | die which concerns on another embodiment of this invention. It is the figure which represented typically the supply timing and flow volume of the coating liquid from each coating liquid supply port which concern on one embodiment of this invention to a coating liquid reservoir. It is a schematic block diagram of the nozzle | cap | die which concerns on another embodiment of this invention. It is a schematic block diagram of the nozzle | cap | die which concerns on another embodiment of this invention. It is the schematic of the supply control apparatus of the coating liquid to the nozzle | cap | die of the apparatus of FIG. It is the elements on larger scale of the board | substrate with which the coating liquid was apply | coated to the groove part. It is the schematic which shows the positional relationship of the discharge hole of a nozzle | cap | die, and a groove part. It is a partial enlarged plan view of a substrate. It is an expanded sectional view which shows the positional relationship of a nozzle | cap | die and a board | substrate of the apparatus of FIG. It is an expanded sectional view which follows the XI-XI line of FIG. It is an expanded sectional view which shows the application state of the coating liquid from the discharge hole of a nozzle | cap | die of FIG.

Explanation of symbols

303 Tournament type channel 304 Coating liquid reservoir 305 Coating liquid 307 Discharge port 308 Upper space 309 Compressed air supply port 311 Base 312 Coating liquid supply port

Claims (11)

A coating solution reservoir for storing the coating solution;
A plurality of ejection holes that open from the inside to the outside of the coating liquid reservoir;
A plurality of coating liquid supply ports for supplying the coating liquid to the coating liquid reservoir;
Each coating liquid supply port is connected to a tournament channel for branching the flow of the coating liquid from the coating liquid supply source upstream from the coating liquid supply port and supplying the coating liquid to each coating liquid supply port. ,
A die having a mechanism capable of dividing a plurality of the coating liquid supply ports into a plurality of groups and adjusting a supply amount or a supply opportunity from the coating liquid supply ports of the group . The base according to claim 1, wherein a tip of the coating liquid supply port is provided so as to be immersed in the coating liquid in the coating liquid reservoir. The coating liquid supply port is provided more than four positions, the claims linearly arranged a coating liquid supply port is divided into two groups every other tournament form passages for each group is formed 1. The base according to 1 . 4. The base according to claim 3 , wherein another group of coating liquid supply ports is disposed at a position where the coating liquid supplied from one group of coating liquid supply ports merges in the coating liquid reservoir. The base according to claim 1, wherein the plurality of discharge holes are arranged in a straight line, and the plurality of coating liquid supply ports are arranged in a straight line substantially parallel to the arrangement direction of the discharge holes. A table for fixing the base material; a base provided opposite to the base material for applying a predetermined amount of coating liquid to the base; a moving means for relatively moving the table and the base in three dimensions; In a coating liquid coating apparatus for a substrate having a coating liquid tank as a liquid supply source, a supply flow rate adjustment control valve for adjusting and controlling a coating liquid supply flow rate between the coating liquid tank and a base, and the flow rate A coating liquid coating apparatus comprising: a control means for controlling a flow rate of the adjustment control valve, wherein the base according to claim 1 is used as the base. A coating liquid is supplied from a coating liquid supply source to a base having a plurality of discharge holes, the base is opposed to the base material, the base and the base material are relatively moved, and the coating liquid is discharged from the discharge holes of the base. , A method of applying a coating liquid to a substrate,
The base is a coating liquid reservoir for storing a coating liquid;
A plurality of coating liquid supply ports for supplying the coating liquid to the coating liquid reservoir;
Dividing the plurality of coating liquid supply ports into a plurality of groups,
A coating amount or a supply opportunity from a coating liquid supply port of at least one group of the plurality of groups is different from a supply amount or a supply opportunity from a coating liquid supply port of another group. Liquid application method. The coating liquid application method according to claim 7, wherein a tip of the coating liquid supply port is immersed in a coating liquid in the coating liquid reservoir. A coating liquid is supplied from a coating liquid supply source to a base having a plurality of discharge holes, the base is opposed to the base material, the base and the base material are relatively moved, and the coating liquid is discharged from the discharge holes of the base. A method for applying a coating liquid to a substrate, wherein the coating liquid is applied to the base using the base according to claim 1-5 . The supply of coating liquid from the coating liquid supply port of one group, the supply of coating liquid from the coating liquid supply port of the other group, and the supply of coating liquid from the coating liquid supply port of both groups are constant. The coating liquid coating method according to claim 7 , wherein the coating liquid is repeated at the number of times and the cycle. The manufacturing method of the plasma display panel which has the process of apply | coating a coating liquid with the coating method of the coating liquid of Claim 7-10.

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