JP4743002B2 - Joining method - Google Patents

Joining method Download PDF

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JP4743002B2
JP4743002B2 JP2006163025A JP2006163025A JP4743002B2 JP 4743002 B2 JP4743002 B2 JP 4743002B2 JP 2006163025 A JP2006163025 A JP 2006163025A JP 2006163025 A JP2006163025 A JP 2006163025A JP 4743002 B2 JP4743002 B2 JP 4743002B2
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metal
bonding
bonding material
uneven film
pressurizing
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JP2007330980A (en
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善則 村上
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Nissan Motor Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/2901Shape
    • H01L2224/29011Shape comprising apertures or cavities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8384Sintering

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  • Pressure Welding/Diffusion-Bonding (AREA)

Description

本発明は接合方法に関し、特に、2つの金属面を、金属を主成分とする接合材で接合する接合方法に関する。   The present invention relates to a joining method, and more particularly, to a joining method in which two metal surfaces are joined with a joining material containing metal as a main component.

従来の、2つの金属面を、金属を主成分とする接合材で接合する接合方法には、たとえば、下記特許文献1に記載されたようなものがある。この接合方法は、常温付近で融合することが知られている数nmの金属微粒子を有機材料からなる有機被覆膜で被覆して常温では融合しないようにしたものを有機溶媒に分散させてなる接合材ペーストを用いる。このような接合材ペーストを2つの金属面の間に挟んで、溶媒を蒸発させ、有機被覆膜を分解させるための比較的低い温度にまで加熱し、同時に金属微粒子の融合を促すために圧力を印加する。このようにして、ひとたび接合層が形成されると、接合層は接合温度より遙かに高い、微粒子金属の融点までその強度を保持する。
国際公開番号WO 2005/095040 A1号公報
As a conventional joining method for joining two metal surfaces with a joining material containing metal as a main component, for example, there is a method described in Patent Document 1 below. This bonding method is obtained by dispersing metal fine particles of several nm, which are known to be fused at around room temperature, with an organic coating film made of an organic material so as not to be fused at room temperature in an organic solvent. A bonding material paste is used. Such a bonding material paste is sandwiched between two metal surfaces to evaporate the solvent and heat it to a relatively low temperature for decomposing the organic coating film, and at the same time pressurize to promote the fusion of the metal particulates. Is applied. In this way, once the bonding layer is formed, the bonding layer retains its strength up to the melting point of the particulate metal, which is much higher than the bonding temperature.
International Publication Number WO 2005/095040 A1

しかし、上記の接合方法において、接合面積が広くなると、次のような問題が発生する。すなわち、有機被覆膜が印加した熱によって分解すると金属微粒子同士の融合が起こるが、その発生は微小領域ごとにランダムに開始するので、有機物が十分に分解し、接合領域の外部へと飛散する前に経路が閉ざされ、最終的には炭化物が接合層に残ってしまう領域が確率的に発生し、これが接合強度や導電性に悪影響を与えることが起こりうる。そこで、このようなことが起こらないようにすることが重要な課題となる。   However, in the above bonding method, when the bonding area is widened, the following problems occur. That is, when the organic coating film is decomposed by the applied heat, the metal fine particles are fused with each other, but since the generation starts at random for each minute region, the organic matter is sufficiently decomposed and scattered outside the bonding region. The path is closed before, and eventually a region in which carbide remains in the bonding layer is generated stochastically, which may adversely affect the bonding strength and conductivity. Therefore, it is important to prevent this from happening.

本発明は、この課題を解決し、大接合面積でも良好な接合を実現する接合方法を提供することを目的としている。   An object of the present invention is to solve this problem and to provide a bonding method that realizes good bonding even with a large bonding area.

上記目的を達成するために、本発明においては、2つの金属面の一方に、金属微粒子と溶媒とを構成成分とする接合材ペーストを塗布し、縞状、格子縞状または網状の溝を有する接合材凹凸膜とした後、この金属面に他の金属面を重ね、前記溝が消失しないような第一の圧力範囲内の圧力を前記2つの金属面間に印加しつつ第一の温度範囲内の温度に第一の時間だけ保持し、さらに、前記第一の圧力範囲よりも高い第二の圧力範囲内の圧力を前記2つの金属面間に印加しつつ前記第一の温度範囲よりも高い第二の温度範囲内の温度に第二の時間だけ保持して接合を完成させる。   In order to achieve the above object, in the present invention, a bonding paste containing metal fine particles and a solvent as a constituent component is applied to one of two metal surfaces to form a striped, checkered or net-like groove. After forming the material uneven film, another metal surface is superimposed on the metal surface, and the pressure within the first pressure range is applied between the two metal surfaces so that the groove does not disappear. The first temperature range is maintained while the pressure in the second pressure range higher than the first pressure range is applied between the two metal surfaces. Holding at a temperature within the second temperature range for a second time completes the bond.

有機物の分解生成物が接合領域外部へと飛散する経路が確保されている接合材凹凸膜を形成し、加圧・加熱工程を、その飛散経路が閉ざされないような第一の加圧・加熱工程と、それよりも高圧高温の第二の加圧・加熱工程との2回に分けて実施することにより、大接合面積でも良好な接合を実現する接合方法を提供することが可能となる。   Form a bonding material uneven film that ensures a path for the decomposition products of organic matter to scatter to the outside of the bonding area, and pressurize and heat the first pressurization and heating so that the scattering path is not closed By performing the process and the second pressurizing / heating process at a higher pressure and higher temperature in two steps, it is possible to provide a bonding method that realizes good bonding even with a large bonding area.

以下、図面を用いて本発明の実施の形態を説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[第一の実施の形態]
図1〜図4は、本発明の第一の実施の形態である接合方法の工程を説明するための断面図である。図中、1と2は接合される2つの金属板、3は金属微粒子、4は有機溶媒で、5は金属微粒子3と有機溶媒4とを構成要素とする接合材ペースト、6はマスクスクリーンであるスクリーン印刷用のメッシュである。なお、金属微粒子3の粒径が1nm以上1μm以下であると、常温でも相互融合してしまう場合があり、そのような場合には、金属微粒子3の表面を高級アルコールなどの有機物による有機被覆膜(図示せず)で覆うことにより、融合を防ぐ。また、図中、金属板1の上面を、請求項で述べている2つの金属面の一方とし、金属板2の下面を2つの金属面の他方とする。
[First embodiment]
1-4 is sectional drawing for demonstrating the process of the joining method which is 1st embodiment of this invention. In the figure, 1 and 2 are two metal plates to be joined, 3 is a metal fine particle, 4 is an organic solvent, 5 is a bonding material paste comprising the metal fine particle 3 and the organic solvent 4, and 6 is a mask screen. A screen printing mesh. If the particle size of the metal fine particles 3 is 1 nm or more and 1 μm or less, mutual fusion may occur even at room temperature. In such a case, the surface of the metal fine particles 3 is organically coated with an organic substance such as a higher alcohol. Covering with a membrane (not shown) prevents fusion. In the figure, the upper surface of the metal plate 1 is one of the two metal surfaces described in the claims, and the lower surface of the metal plate 2 is the other of the two metal surfaces.

図1、図2は、金属面の一方(金属板1の上面)に、金属微粒子3と溶媒(ここでは有機溶媒4であるが、無機溶媒である水や有機無機混合溶媒であってもよい)とを構成成分とする接合材ペースト5を、縞状、格子縞状または網状の溝を有する接合材凹凸膜の状態に塗布する凹凸膜塗布工程を説明するための断面図である。   In FIG. 1 and FIG. 2, metal fine particles 3 and a solvent (here, an organic solvent 4, but water or an organic / inorganic mixed solvent may be used on one of the metal surfaces (the upper surface of the metal plate 1). FIG. 6 is a cross-sectional view for explaining a concavo-convex film coating step in which a bonding material paste 5 having the above-described components as a constituent component is applied to a bonding material concavo-convex film having striped, checkered or net-like grooves.

まず、図1に示すように、金属板1の上面にメッシュ6を置き、その上から金属微粒子3を含んだ接合材ペースト5を乗せ、スキージ(図示せず)によってメッシュ表面を掃引し、膜厚が均一になるように塗布を行う。   First, as shown in FIG. 1, a mesh 6 is placed on the upper surface of a metal plate 1, a bonding material paste 5 containing metal fine particles 3 is placed thereon, and the surface of the mesh is swept with a squeegee (not shown). Application is performed so that the thickness is uniform.

次に、図2に示すように、メッシュ6を外すと、有機溶媒4は通常の印刷インク同様、メッシュ6があった場所(6’で示す)にも流れ出るが、金属微粒子3は有機溶媒4とは比重が1桁近く高いので、いくら接合材ペースト5の粘度を調整しても、その大半はそのままの位置に残り、図に示すような厚みの差が生じる。このようにして、縞状、格子縞状または網状の溝を有する接合材凹凸膜が形成される。メッシュがあった場所6’は接合材凹凸膜における上記の溝となっていて、メッシュ6が、たとえば平行線状であれば縞状の溝が形成され、メッシュ6が、たとえば直交格子状であれば格子縞状の溝が形成され、メッシュ6が、たとえば正六角形の網目を持つ網状(蜂の巣状)であれば網状の溝が形成される。   Next, as shown in FIG. 2, when the mesh 6 is removed, the organic solvent 4 flows out to the place where the mesh 6 was present (indicated by 6 ′) as in the case of normal printing ink, but the metal fine particles 3 are removed from the organic solvent 4. Since the specific gravity is almost one digit higher, even if the viscosity of the bonding material paste 5 is adjusted, most of it remains in the same position, resulting in a difference in thickness as shown in the figure. In this manner, a bonding material uneven film having striped, checkered or net-like grooves is formed. The place 6 ′ where the mesh is located is the above groove in the bonding material uneven film. If the mesh 6 is, for example, a parallel line, a striped groove is formed, and the mesh 6 may be, for example, an orthogonal lattice. For example, if the mesh 6 is a net-like (honeycomb-like) mesh having a regular hexagonal mesh, for example, a net-like groove is formed.

次に、図2に示した状態の金属板1の上面に、接合材凹凸膜を挟み込むように金属板2を重ねた状態を図3に示す。この状態は、接合材凹凸膜が塗布されている金属面に、他の金属面を密着させた状態である。なお、ここでは、有機溶媒4が既に蒸発飛散した状態を示した。   Next, FIG. 3 shows a state in which the metal plate 2 is superimposed on the upper surface of the metal plate 1 in the state shown in FIG. This state is a state in which another metal surface is in close contact with the metal surface to which the bonding material uneven film is applied. Here, a state where the organic solvent 4 has already evaporated and scattered is shown.

この有機溶媒4の蒸発飛散を図2に示した状態において行わせると、有機溶媒が無くなる時間が短くなり好都合な場合もある。すなわち、図2に示した状態において、接合材凹凸膜に含まれる少なくとも1成分(たとえば有機溶媒4)が飛散しうる第三の温度範囲内の温度に第三の時間だけ保持する予備加熱工程を実施してもよい。   When the evaporation and scattering of the organic solvent 4 is performed in the state shown in FIG. 2, the time for which the organic solvent disappears may be shortened, which may be convenient. That is, in the state shown in FIG. 2, a preheating step of maintaining at a temperature within a third temperature range in which at least one component (for example, organic solvent 4) contained in the bonding material uneven film can be scattered for a third time. You may implement.

図3において、2つの金属板1、2の間に出来たトンネルを7とする。トンネル7は上記の溝によって構成されている。上記の溝は、縞状、格子縞状または網状であるので、必ず、接合材凹凸膜の周縁にまで通じている。従って、有機溶媒4の蒸発飛散はトンネル7を経由して円滑に進行する。   In FIG. 3, the tunnel formed between the two metal plates 1 and 2 is designated as 7. The tunnel 7 is constituted by the groove. Since the groove is striped, checkered or net-like, it always leads to the periphery of the bonding material uneven film. Accordingly, the evaporation and scattering of the organic solvent 4 proceeds smoothly via the tunnel 7.

次に、従来技術においては、単一工程で加圧と加熱をし接合形成を完了してしまうが、本発明に係る接合方法においは、それを第一の加圧・加熱工程と第二の加圧・加熱工程との2回に分けて実施する。   Next, in the prior art, pressurization and heating are performed in a single step to complete the joint formation. In the joining method according to the present invention, the first pressurization / heating step and the second step are performed. Carry out in two steps, the pressurization and heating process.

まず、第一の加圧・加熱工程として、上記溝で構成されたトンネル7が消失しないような第一の圧力範囲内の圧力を前記2つの金属面間に印加しつつ第一の温度範囲内の温度に第一の時間だけ保持する。すなわち、上記溝が潰れずに残る程度の圧力を印加してトンネル7を残し、接合材凹凸膜中の有機物(たとえば金属微粒子3の有機被覆膜)が分解する温度に保持して、有機物の分解を促す。この第一の加圧・加熱工程において、ほぼ気体となる有機物の分解生成物は、接合材凹凸膜の周縁にまで通じているトンネル7を経由して、容易に膜外に達することができる。   First, as a first pressurizing / heating step, a pressure within the first pressure range is applied between the two metal surfaces so that the tunnel 7 constituted by the grooves does not disappear. Hold at the temperature for a first time. That is, a pressure is applied so that the groove remains without being crushed, leaving the tunnel 7, and maintaining the temperature at which the organic matter (eg, the organic coating film of the metal fine particles 3) in the bonding material uneven film is decomposed. Encourage disassembly. In the first pressurizing / heating step, the decomposition product of the organic substance that is almost a gas can easily reach the outside of the film via the tunnel 7 leading to the periphery of the bonding material uneven film.

そして、有機物がたとえ残ったとしても、完成した接合層の特性に影響を与えない程度の量までに減少した時点で、第二の加圧・加熱工程として、前記第一の圧力範囲よりも高い第二の圧力範囲内の圧力を前記2つの金属面間に印加しつつ前記第一の温度範囲よりも高い第二の温度範囲内の温度に第二の時間だけ保持する。これによって、高い圧力と高い温度を印加して、図4に示したような接合層9を完成させる。   And even if organic matter remains, it is higher than the first pressure range as the second pressurizing / heating step when it is reduced to an amount that does not affect the properties of the completed bonding layer. While a pressure within the second pressure range is applied between the two metal surfaces, the temperature is maintained at a temperature within a second temperature range higher than the first temperature range for a second time. As a result, a high pressure and a high temperature are applied to complete the bonding layer 9 as shown in FIG.

このように、第一の加圧・加熱工程に続く第二の加圧・加熱工程によって、残渣有機物や炭化物に邪魔されずに接合層9を形成することができ、従来技術に比べて高い接合強度の接合を得ことができる。   In this way, the second pressurization / heating process following the first pressurization / heating process can form the bonding layer 9 without being disturbed by residual organic matter and carbides, which is higher than the conventional technique. A strong bond can be obtained.

ここで、上述したように、金属微粒子3の粒径が1nm以上1μm以下であると、常温でも相互融合してしまう場合がある。そのような場合には、金属微粒子3の表面を高級アルコールなどの有機物による有機被覆膜(図示せず)で覆うことにより融合を防ぐ。金属微粒子3が1μmよりも大きい場合には、常温で相互融合する心配がないので、有機被覆膜は必ずしも必要でないが、金属板表面の接合が形成されるためには、有機物が金属板との界面に残存し、その有機物が金属板表面の金属酸化膜によって酸化され、逆に金属酸化膜が金属にまで還元されることが好ましく、この場合にも、トンネル7は接合強度向上のために有効な働きをする。   Here, as described above, if the particle size of the metal fine particles 3 is 1 nm or more and 1 μm or less, they may be fused together at room temperature. In such a case, fusion is prevented by covering the surface of the metal fine particles 3 with an organic coating film (not shown) made of an organic substance such as higher alcohol. When the metal fine particles 3 are larger than 1 μm, there is no fear of mutual fusion at room temperature, so an organic coating film is not necessarily required. However, in order to form a bond on the metal plate surface, Preferably, the organic matter is oxidized by the metal oxide film on the surface of the metal plate, and the metal oxide film is reduced to metal. In this case as well, the tunnel 7 is used to improve the bonding strength. It works effectively.

有機溶媒4には、このような金属微粒子3が分散しやすく、さらに扱いやすいように沸点が常温よりも比較的高いものが選ばれる。好適な溶媒としては、たとえばシクロヘキサンなどが知られている。   As the organic solvent 4, one having a boiling point relatively higher than room temperature is selected so that the metal fine particles 3 can be easily dispersed and handled. As a suitable solvent, for example, cyclohexane and the like are known.

しかし、有機溶媒4がなくなった状態で、金属板1上の金属微粒子3の塊と金属板2とを接触させると、金属板2の表面で金属微粒子3に触れない領域が出来てしまう可能性がある。とくに有機被覆膜に覆われた金属微粒子を用いる場合、この有機被覆膜が分解する際に金属板表面の金属酸化膜を還元する作用があるが、それを受けられない領域が発生する場合もあり、その場合の対策としては、あらかじめ金属板2の表面にも一定量の接合材ペースト5を塗布しておく。すなわち、第一の加圧・加熱工程の前に、接合材ペースト5を、金属板2の表面にも塗布する工程を設ける。   However, when the mass of the metal fine particles 3 on the metal plate 1 and the metal plate 2 are brought into contact with each other without the organic solvent 4, there is a possibility that an area that does not touch the metal fine particles 3 is formed on the surface of the metal plate 2. There is. Especially when metal fine particles covered with an organic coating film are used, when this organic coating film decomposes, there is an action that reduces the metal oxide film on the surface of the metal plate, but there is a region that cannot receive it. In this case, as a countermeasure, a predetermined amount of the bonding material paste 5 is applied to the surface of the metal plate 2 in advance. That is, a step of applying the bonding material paste 5 to the surface of the metal plate 2 is provided before the first pressurizing / heating step.

ここで、金属微粒子は、たとえば平均粒径が10nm程度のAgである。Agは、たとえ表面に酸化物が形成されてしまっていたとしても、180℃程度の温度で分解して酸素とAgになるため、高温加熱による金属表面の酸化を心配する必要がない。その他、酸化されないAu、有機物が酸化される際に金属酸化物が金属にまで還元されるCu、Pt、Pd、Ni、Ru、Rhなどが好適金属として知られている。すなわち、金属微粒子の構成金属元素が、Au、Ag、Cu、Pt、Pd、Ni、Ru、Rhのいずれかであることが好ましい。   Here, the metal fine particles are, for example, Ag having an average particle diameter of about 10 nm. Ag decomposes at a temperature of about 180 ° C. to become oxygen and Ag even if an oxide has been formed on the surface, so there is no need to worry about oxidation of the metal surface due to high temperature heating. In addition, Au, which is not oxidized, and Cu, Pt, Pd, Ni, Ru, Rh, etc., in which a metal oxide is reduced to a metal when an organic substance is oxidized, are known as suitable metals. That is, the constituent metal element of the metal fine particles is preferably any one of Au, Ag, Cu, Pt, Pd, Ni, Ru, and Rh.

また、金属板1、2の少なくとも表面における構成金属元素としては、Cu、Ag、Au、Ptなどが好ましい。   Further, as a constituent metal element on at least the surface of the metal plates 1 and 2, Cu, Ag, Au, Pt, or the like is preferable.

さらに、これら金属微粒子のほか、酸化銀または炭酸銀の粒子を含んだ接合材を用いると、これらも180〜190℃にてAgとなり酸素を発生するので、有機物(たとえば有機被覆膜)が酸化されガス化して、トンネル7を通って飛散するための支援になる。このように、接合材ペースト5が、第一の温度範囲にて酸素を放出して金属となるような物質を含有していることが、有機物の酸化を促進するのに有効である。   Further, when a bonding material containing silver oxide or silver carbonate particles in addition to these metal fine particles is used, these also become Ag at 180 to 190 ° C. and generate oxygen, so that organic substances (for example, organic coating films) are oxidized. Then, it is gasified and becomes support for scattering through the tunnel 7. Thus, it is effective for promoting the oxidation of organic matter that the bonding material paste 5 contains a substance that releases oxygen in the first temperature range to become a metal.

あるいは、第一の加圧・加熱工程を大気中もしくは酸素を大気よりも多く含む気体中で、大気もしくは該気体の圧力を、たとえば、大気圧と、その数分の1の圧力との間で往復変動させながら実施して、トンネル7を通して、有機物の酸化に必要な酸素を供給し、ガス化した炭素酸化物の飛散を支援するようにしてもよい。   Alternatively, the first pressurizing / heating step is performed in the atmosphere or in a gas containing more oxygen than the atmosphere, and the pressure of the atmosphere or the gas is, for example, between atmospheric pressure and a fraction of the pressure. It may be carried out while reciprocating, and oxygen necessary for the oxidation of the organic substance may be supplied through the tunnel 7 to support the scattering of the gasified carbon oxide.

[第二の実施の形態]
次に、第二の実施の形態を、図5、図6を用いて説明する。
[Second Embodiment]
Next, a second embodiment will be described with reference to FIGS.

本実施の形態の要点は、第一の実施の形態とは異なる方法で、2つの金属板1、2の間の接合材の膜に、有機物の分解ガスが外部へ飛散できるように、図3に示したようなトンネル7を形成する点にある。   The main point of the present embodiment is that the organic decomposition gas can be scattered to the outside in the film of the bonding material between the two metal plates 1 and 2 by a method different from that of the first embodiment. The tunnel 7 as shown in FIG.

本実施の形態では、図5に示すように、接合材ペースト5を金属板1の上面に平坦に塗布し、接合材ペースト5が流動性を保っている間に、図6に示すように、押し型8を接合材ペースト5の塗布膜に押し当てて、塗布膜に厚みの差を付ける。押し型8の表面が、前記縞状、格子縞状または網状の溝とは反対の凹凸を有するようにしておけば、このようにして形成した接合材凹凸膜は、前記縞状、格子縞状または網状の溝を有している。   In the present embodiment, as shown in FIG. 5, the bonding material paste 5 is applied flatly on the upper surface of the metal plate 1, and while the bonding material paste 5 maintains fluidity, as shown in FIG. The pressing die 8 is pressed against the coating film of the bonding material paste 5 to give a difference in thickness to the coating film. If the surface of the pressing die 8 has irregularities opposite to the striped, checkered, or net-like grooves, the bonding material uneven film formed in this way has the striped, checkered or net-like shape. It has a groove.

上記以降の工程は、第一の実施の形態に準じる。   The subsequent steps are the same as those in the first embodiment.

このような工程、すなわち、接合材ペースト5を金属面の一方に平坦に塗布した後、接合材ペースト5の膜に、前記縞状、格子縞状または網状の溝とは反対の凹凸の表面を有する押し型を押し当てる工程の方が、作業が効率的である場合もある。   After such a process, that is, after the bonding material paste 5 is applied flat on one of the metal surfaces, the film of the bonding material paste 5 has an uneven surface opposite to the striped, checkered or net-like grooves. The process of pressing the pressing mold may be more efficient.

本発明に係る接合方法は、半導体実装工程に有効利用される。この場合に、半導体チップの裏面金属電極が金属板1または2に相当する。   The bonding method according to the present invention is effectively used in a semiconductor mounting process. In this case, the back metal electrode of the semiconductor chip corresponds to the metal plate 1 or 2.

第一の実施の形態の工程を説明する断面図である。It is sectional drawing explaining the process of 1st embodiment. 第一の実施の形態の工程を説明する断面図である。It is sectional drawing explaining the process of 1st embodiment. 第一の実施の形態の工程を説明する断面図である。It is sectional drawing explaining the process of 1st embodiment. 第一の実施の形態の工程を説明する断面図である。It is sectional drawing explaining the process of 1st embodiment. 第二の実施の形態の工程を説明する断面図である。It is sectional drawing explaining the process of 2nd embodiment. 第二の実施の形態の工程を説明する断面図である。It is sectional drawing explaining the process of 2nd embodiment.

符号の説明Explanation of symbols

1、2:金属板、3:金属微粒子、4:有機溶媒、5:接合材ペースト、6:メッシュ、6’:メッシュがあった場所、7:トンネル、8:押し型、9:接合層。   1, 2: metal plate, 3: metal fine particles, 4: organic solvent, 5: bonding material paste, 6: mesh, 6 ': place where the mesh was present, 7: tunnel, 8: pressing mold, 9: bonding layer.

Claims (10)

金属微粒子を2つの金属面の間に介在させ、加圧かつ加熱して前記2つの金属面の間の接合を完成させる接合方法において、
前記金属面の一方に、前記金属微粒子と溶媒とを構成成分とする接合材ペーストを塗布し、縞状、格子縞状または網状の溝を有する接合材凹凸膜とする凹凸膜塗布工程と、
前記接合材凹凸膜が形成されている金属面に、前記金属面の他方を重ね、前記溝が消失しないような第一の圧力範囲内の圧力を前記2つの金属面間に印加しつつ第一の温度範囲内の温度に第一の時間だけ保持する第一の加圧・加熱工程と、
前記第一の加圧・加熱工程後に、前記第一の圧力範囲よりも高い第二の圧力範囲内の圧力を前記2つの金属面間に印加しつつ前記第一の温度範囲よりも高い第二の温度範囲内の温度に第二の時間だけ保持する第二の加圧・加熱工程とを有することを特徴とする接合方法。
In a bonding method in which metal fine particles are interposed between two metal surfaces, pressurized and heated to complete the bonding between the two metal surfaces,
An uneven film coating step of applying a bonding material paste comprising the metal fine particles and a solvent as constituent components to one of the metal surfaces to form a bonding material uneven film having a striped, checkered or net-like groove;
The other metal surface is overlapped with the metal surface on which the bonding material uneven film is formed, and the first pressure range is applied between the two metal surfaces so that the groove does not disappear. A first pressurizing / heating step for maintaining the temperature within the temperature range for a first time;
After the first pressurizing / heating step, a second pressure higher than the first temperature range while applying a pressure within a second pressure range higher than the first pressure range between the two metal surfaces. And a second pressurizing / heating step of maintaining the temperature within the temperature range for a second time.
前記凹凸膜塗布工程と前記第一の加圧・加熱工程との間に、前記接合材凹凸膜を、該接合材凹凸膜に含まれる少なくとも1成分が飛散しうる第三の温度範囲内の温度に第三の時間だけ保持する予備加熱工程を有することを特徴とする請求項1に記載の接合方法。   Between the uneven film coating step and the first pressurizing / heating step, the bonding material uneven film has a temperature within a third temperature range in which at least one component contained in the bonding material uneven film can scatter. The bonding method according to claim 1, further comprising a preheating step for holding for a third time. 前記金属微粒子の粒径が1nm以上1μm以下であることを特徴とする請求項1に記載の接合方法。   The bonding method according to claim 1, wherein a particle diameter of the metal fine particles is 1 nm or more and 1 μm or less. 前記金属微粒子の構成金属元素が、Au、Ag、Cu、Pt、Pd、Ni、Ru、Rhのいずれかであることを特徴とする請求項1に記載の接合方法。   The joining method according to claim 1, wherein a constituent metal element of the metal fine particle is any one of Au, Ag, Cu, Pt, Pd, Ni, Ru, and Rh. 前記金属微粒子が有機被覆膜で覆われていることを特徴とする請求項1に記載の接合方法。   The bonding method according to claim 1, wherein the metal fine particles are covered with an organic coating film. 前記接合材ペーストが、前記第一の温度範囲にて酸素を放出して金属となるような物質を含有していることを特徴とする請求項1に記載の接合方法。   The bonding method according to claim 1, wherein the bonding material paste contains a substance that releases oxygen in the first temperature range to become a metal. 前記第一の加圧・加熱工程が、大気中もしくは酸素を大気よりも多く含む気体中で、大気もしくは該気体の圧力を変動させながら実施されることを特徴とする請求項1に記載の接合方法。   2. The bonding according to claim 1, wherein the first pressurizing / heating step is performed in the atmosphere or in a gas containing more oxygen than the atmosphere while changing the pressure of the atmosphere or the gas. Method. 前記凹凸膜塗布工程が、前記接合材ペーストを、マスクスクリーンを通して、前記金属面の一方に塗布する工程を含むことを特徴とする請求項1に記載の接合方法。   The bonding method according to claim 1, wherein the uneven film application step includes a step of applying the bonding material paste to one of the metal surfaces through a mask screen. 前記凹凸膜塗布工程が、前記接合材ペーストを前記金属面の一方に平坦に塗布した後、該接合材ペーストの塗布膜に、前記縞状、格子縞状または網状の溝とは反対の凹凸の表面を有する押し型を押し当てる工程を含むことを特徴とする請求項1に記載の接合方法。   After the uneven film coating step applies the bonding material paste flatly to one of the metal surfaces, the uneven film surface opposite to the striped, checkered, or net-like grooves is applied to the bonding material paste coating film. The bonding method according to claim 1, further comprising a step of pressing a pressing die having a shape. 前記第一の加圧・加熱工程の前に、前記接合材ペーストを、前記金属面の他方にも塗布する工程を有することを特徴とする請求項1に記載の接合方法。   The bonding method according to claim 1, further comprising a step of applying the bonding material paste to the other of the metal surfaces before the first pressurizing / heating step.
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