JP4741563B2 - Circuit board - Google Patents

Circuit board Download PDF

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Publication number
JP4741563B2
JP4741563B2 JP2007254846A JP2007254846A JP4741563B2 JP 4741563 B2 JP4741563 B2 JP 4741563B2 JP 2007254846 A JP2007254846 A JP 2007254846A JP 2007254846 A JP2007254846 A JP 2007254846A JP 4741563 B2 JP4741563 B2 JP 4741563B2
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Japan
Prior art keywords
layer
insulating layer
conductor layer
insulating
circuit board
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Expired - Fee Related
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JP2009088171A (en
Inventor
良幸 内野々
正英 武藤
崇 進藤
政明 南
知義 田代
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Kyocera Corp
Panasonic Corp
Panasonic Electric Works Co Ltd
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Kyocera Corp
Panasonic Corp
Matsushita Electric Works Ltd
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Priority to JP2007254846A priority Critical patent/JP4741563B2/en
Priority to PCT/JP2008/067281 priority patent/WO2009041484A1/en
Priority to TW97137059A priority patent/TW200930198A/en
Publication of JP2009088171A publication Critical patent/JP2009088171A/en
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Publication of JP4741563B2 publication Critical patent/JP4741563B2/en
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/245Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
    • H05K3/246Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/182Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
    • H05K1/183Components mounted in and supported by recessed areas of the printed circuit board
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0347Overplating, e.g. for reinforcing conductors or bumps; Plating over filled vias
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09818Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09981Metallised walls
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/403Edge contacts; Windows or holes in the substrate having plural connections on the walls thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4629Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets

Description

本発明は、セラミックス製の絶縁層の間に1乃至複数の内層導体層が形成されてなる積層基板と、積層基板の表面に形成され且つ内層導体層と電気的に接続された表面導体層とを有する回路基板関する発明である。 The present invention provides a laminated substrate in which one or more inner conductor layers are formed between ceramic insulating layers, a surface conductor layer formed on the surface of the laminated substrate and electrically connected to the inner conductor layer. an invention which relates to a circuit board having a.

従来、絶縁基材の表面に導体パターンを形成して回路基板を製造する方法として、特許文献1に開示されているような製造方法があった。   Conventionally, as a method of manufacturing a circuit board by forming a conductor pattern on the surface of an insulating base material, there has been a manufacturing method as disclosed in Patent Document 1.

特許文献1に開示されている製造方法は、所望形状の絶縁基材を形成する工程と、絶縁基材の表面に導電体(例えば、銅)の薄膜からなる下地めっき層を形成する工程と、レーザビームを照射することで必要な導体パターン輪郭部の下地めっき層を除去する工程と、レーザビームが照射されずに残った下地めっき層のうちで必要な部分を電気めっきすることで導体パターンを形成する工程とを有するものである。
特許第3153682号公報
The manufacturing method disclosed in Patent Document 1 includes a step of forming an insulating base material having a desired shape, a step of forming a base plating layer made of a conductor (eg, copper) thin film on the surface of the insulating base material, The process of removing the underlying plating layer on the necessary conductor pattern contour by irradiating the laser beam, and the conductive pattern by electroplating the necessary part of the remaining underlying plating layer without being irradiated with the laser beam Forming the process.
Japanese Patent No. 3153682

しかしながら、上記従来例では電気めっきの給電用導体層が絶縁基材の表面にしか形成し得ないため、絶縁基材の表面に形成される導体パターンの形状や配置の自由度が低いという問題があった。   However, in the above-described conventional example, since the electroplating power supply conductor layer can be formed only on the surface of the insulating base material, there is a problem that the degree of freedom of the shape and arrangement of the conductor pattern formed on the surface of the insulating base material is low. there were.

本発明は上記事情に鑑みて為されたものであり、その目的は、従来例における導体パターンに比較して積層基板の表面に形成される表面導体層の形状や配置の自由度が高くなる回路基を提供することにある。 The present invention has been made in view of the above circumstances, and its purpose is a circuit in which the degree of freedom of the shape and arrangement of the surface conductor layer formed on the surface of the multilayer substrate is higher than that of the conductor pattern in the conventional example. and to provide a board.

請求項1の発明は、上記目的を達成するために、セラミックス製の絶縁層の間に1乃至複数の内層導体層が形成されてなる積層基板と、積層基板の表面に形成され且つ内層導体層と電気的に接続された表面導体層とを有する回路基板であって、前記表面導体層は、積層基板の表面に形成される下地めっき層と、内層導体層を介して給電することにより下地めっき層上に形成される電気めっき層とから構成されるものであり、下地めっき層の電気めっき層が形成される部分と電気めっき層が形成されない部分との、少なくとも境界領域の下地めっき層をレーザビーム照射により除去してなり、さらに、第1の絶縁層の表面と第1の絶縁層上に積層されている第2の絶縁層の端面とで形成される階段状の段差が積層基板に設けられ、第1の絶縁層の表面若しくは第2の絶縁層の端面に露出する内層導体層の一部を覆うように表面導体層が形成されたことを特徴とする。 In order to achieve the above object, the invention according to claim 1 is a laminated substrate in which one or more inner layer conductor layers are formed between ceramic insulating layers, and an inner layer conductor layer formed on the surface of the laminate substrate. A circuit board having a surface conductor layer electrically connected to the surface conductor layer, wherein the surface conductor layer is grounded by supplying power through a base plating layer formed on the surface of the multilayer substrate and an inner conductor layer. The electroplating layer is formed on the layer, and at least the base plating layer in the boundary region between the portion of the base plating layer where the electroplating layer is formed and the portion where the electroplating layer is not formed is laser. beam Ri Na is removed by irradiation, further, the first insulating layer on the surface and the first step-like level difference formed by the end face of the second insulating layer laminated on the insulating layer is laminated substrate A first insulating layer provided Wherein the surface or surface conductor layer so as to cover a portion of the inner conductor layer exposed to the end face of the second insulating layer is formed.

請求項の発明は、請求項の発明において、第2の絶縁層の端面と同一面上に露出する内層導体層の端面を覆うように表面導体層が形成されることを特徴とする。 The invention of claim 2 is characterized in that, in the invention of claim 1 , the surface conductor layer is formed so as to cover the end face of the inner conductor layer exposed on the same plane as the end face of the second insulating layer.

請求項の発明は、請求項の発明において、第1の絶縁層表面に沿って第2の絶縁層端面より突出する内層導体層の前記一部を覆うように表面導体層が形成されることを特徴とする。 The invention of claim 3 is the invention of claim 1, the surface conductor layer is formed to cover the portion of the inner conductor layer projecting from the second insulating layer end surface along the first surface of the insulating layer It is characterized by that.

請求項の発明は、請求項の発明において、第2の絶縁層上に積層されている第3の絶縁層は、第2の絶縁層端面より突出し且つ内層導体層の前記一部を挟んで積層方向に対して第1の絶縁層と対向することを特徴とする。 According to a fourth aspect of the invention, in the third aspect of the invention, the third insulating layer laminated on the second insulating layer protrudes from the end face of the second insulating layer and sandwiches the part of the inner conductor layer. It is characterized by facing the first insulating layer in the stacking direction.

請求項の発明は、請求項の発明において、複数の内層導体層同士を電気的に接続するビアホールが第1の絶縁層表面に露出し、当該ビアホールの端面を覆うように表面導体層が形成されたことを特徴とする。 According to a fifth aspect of the present invention, in the first aspect of the present invention, the via hole for electrically connecting the plurality of inner layer conductor layers is exposed on the surface of the first insulating layer, and the surface conductor layer is formed so as to cover the end face of the via hole. It is formed.

本発明によれば、セラミックス製の絶縁層の間に形成されている内層導体層を介して給電することにより下地めっき層上に電気めっきを行って表面導体層を形成しているので、電気めっきの給電用導体層が絶縁基材の表面にしか形成し得ない従来例に比較して、積層基板の表面に形成される表面導体層の形状や配置の自由度が高くなる回路基が提供できる。 According to the present invention, the surface conductor layer is formed by performing electroplating on the base plating layer by supplying power through the inner conductor layer formed between the ceramic insulating layers. compared to the conventional example feeding conductor layer can not be formed only on the surface of the insulating substrate, providing a circuit board in which the degree of freedom is high in the shape and arrangement of the surface conductor layer formed on the surface of the laminated substrate it can.

以下、図面を参照して本発明を実施形態により詳細に説明する。   Hereinafter, the present invention will be described in detail with reference to the drawings.

本実施形態の回路基板1は、図1に示すように導電ペーストが所定のパターンに印刷塗布されたセラミックス製のグリーンシートを積層した積層体を焼成することでセラミックス製の絶縁層31〜34の間に複数の内層導体層41〜43が形成されてなる積層基板2と、積層基板2の表面に形成されビアホール5を介して内層導体層41〜43と電気的に接続された表面導体層6とを備えている。また本実施形態では、積層基板2を厚み方向において縦横に分断することにより一枚の回路基板1から複数個の回路基板10,…を分割する構造となっており、積層基板2の表裏両面に分断用の複数の溝7が縦横に形成されている。さらに、個々の回路基板10,…に相当する部分には、厚み方向(図1における上下方向)から見て略円形の凹所11が設けられている。この凹所11は、複数層(図示例では2層)の絶縁層33,34を貫通する深さを有し、底面には絶縁層32の表面が露出している。但し、本実施形態では回路基板1を分断して形成される複数個の回路基板10,…を同一のものとしているが、複数個の回路基板10を全て同一とする必要はなく、例えば、全てが異なる構造の回路基板10,…であっても構わない。 As shown in FIG. 1, the circuit board 1 according to the present embodiment fires a laminated body in which a green sheet made of ceramics, on which a conductive paste is printed and applied in a predetermined pattern, is fired, thereby insulating layers 3 1 to 3 made of ceramics. A multilayer substrate 2 in which a plurality of inner layer conductor layers 4 1 to 4 3 are formed between 4 and an electrical connection to the inner layer conductor layers 4 1 to 4 3 formed on the surface of the multilayer substrate 2 via via holes 5. The surface conductor layer 6 is provided. In the present embodiment, the laminated substrate 2 is divided into a plurality of circuit boards 10 from a single circuit board 1 by dividing the laminated board 2 vertically and horizontally in the thickness direction. A plurality of dividing grooves 7 are formed vertically and horizontally. Further, in a portion corresponding to each circuit board 10,..., A substantially circular recess 11 is provided when viewed from the thickness direction (vertical direction in FIG. 1). The recess 11 has a depth penetrating through a plurality of layers (two layers in the illustrated example) of insulating layers 3 3 and 3 4 , and the surface of the insulating layer 3 2 is exposed on the bottom surface. However, in the present embodiment, the plurality of circuit boards 10 formed by dividing the circuit board 1 are the same, but the plurality of circuit boards 10 do not have to be the same, for example, all May be circuit boards 10 having different structures.

ここで、説明を簡単にするため、各絶縁層31〜34を第1絶縁層31,第2絶縁層32,第3絶縁層33,第4絶縁層34と呼び、第1絶縁層31と第2絶縁層32との間の内層導体層41を第1内層導体層、第2絶縁層32と第3絶縁層33との間の内層導体層42を第2内層導体層、第3絶縁層33と第4絶縁層34との間の内層導体層43を第3内層導体層と呼ぶこととする。 Here, in order to simplify the description, each of the insulating layers 3 1 to 3 4 is referred to as a first insulating layer 3 1 , a second insulating layer 3 2 , a third insulating layer 3 3 , and a fourth insulating layer 3 4 . The inner conductor layer 4 1 between the first insulating layer 3 1 and the second insulating layer 3 2 is the first inner conductor layer, and the inner conductor layer 4 2 between the second insulating layer 3 2 and the third insulating layer 3 3. Is referred to as a second inner layer conductor layer, and the inner layer conductor layer 4 3 between the third insulating layer 3 3 and the fourth insulating layer 3 4 is referred to as a third inner layer conductor layer.

上述のような構造を有する積層基板2は、以下のような方法で製造される。すなわち、導電ペーストを所定のパターンに印刷塗布し且つ所定位置に形成したビアホール5に導電ペーストを充填したセラミックス製のグリーンシートを4層に積層して積層体を形成し、さらに当該積層体の表裏両面に分断用の溝7をそれぞれ形成した後、この積層体を焼成することで積層基板2が形成される。但し、第3絶縁層33並びに第4絶縁層34となる2枚のグリーンシートには積層前に予め凹所11用の丸孔が縦横に並べて貫設してあり、積層体を焼成して形成される積層基板2には、溝7で区切られた領域毎に各々凹所11が設けられることになる。ここで、凹所11の内壁面においては、絶縁層3の表面に内層導体層4の端面やビアホール5の端部が露出してなる露出部が設けられている。なお、凹所11用の孔は、必ずしも丸孔である必要はなく多角形状でもよい。 The laminated substrate 2 having the structure as described above is manufactured by the following method. That is, a laminate is formed by laminating four layers of ceramic green sheets filled with a conductive paste in via holes 5 formed by printing and applying a conductive paste in a predetermined pattern, and further, front and back of the laminate. After forming the dividing grooves 7 on both surfaces, the laminated substrate 2 is formed by firing the laminated body. However, the two green sheets to be the third insulating layer 3 3 and the fourth insulating layer 3 4 have circular holes for the recesses 11 arranged in advance vertically and horizontally before lamination, and the laminate is fired. In the laminated substrate 2 formed in this manner, the recesses 11 are provided for each of the regions delimited by the grooves 7. Here, on the inner wall surface of the recess 11, an exposed portion formed by exposing the end surface of the inner conductor layer 4 and the end portion of the via hole 5 is provided on the surface of the insulating layer 3. In addition, the hole for the recess 11 does not necessarily need to be a round hole, and may be a polygonal shape.

そして、上述した第1絶縁層31、第2絶縁層32、第3絶縁層33、第4絶縁層34の各々の層は、グリーンシート1枚のみからなる単層グリーンシートにより形成されていてもよいし、またグリーンシートを複数積層した複数層グリーンシートにより形成されていてもよい。さらに、グリーンシートにプレス成形を施す場合には、単層グリーンシートや複数層グリーンシートの各々をプレス成形してから、これらを積層して第1絶縁層31乃至第4絶縁層34となる積層体を形成してもよいし、この後、更に積層体をプレス成形してもよい。或いは、単層グリーンシートや複数層グリーンシートを積層して、第1絶縁層31乃至第4絶縁層34となる積層体を形成してから、この積層体をプレス成形してもよい。なお、このようなプレス成形は、焼結一体化までの間にグリーンシート同士を仮圧着するためや、積層体を所定の厚みになすために行われる。 Each of the first insulating layer 3 1 , the second insulating layer 3 2 , the third insulating layer 3 3 , and the fourth insulating layer 3 4 described above is formed of a single-layer green sheet composed of only one green sheet. It may be formed by a multilayer green sheet in which a plurality of green sheets are laminated. Furthermore, when performing press molding the green sheet, each of the single-layer green sheets and multiple layer green sheet after press forming, the first insulating layer 3 first to fourth insulating layer 3 4 laminating these A laminate may be formed, and thereafter, the laminate may be further press-molded. Alternatively, by laminating a single-layer green sheets and multiple layer green sheet, after forming a laminate of a first insulating layer 3 first to fourth insulating layer 3 4, the laminate may be press-molded. In addition, such press molding is performed in order to temporarily press-bond green sheets to each other until sintering integration, or to make the laminated body have a predetermined thickness.

次に、積層基板2の表面、すなわち、第1絶縁層31並びに第4絶縁層34の表面と凹所11の内壁面(凹所11の側壁を形成する第3絶縁層33並びに第4絶縁層34の端面と凹所11の底壁を形成する第2絶縁層32の表面)に、前記露出部と電気的に接続される所定形状(パターン)の表面導体層6を形成する方法について説明する。 Next, the surface of the multilayer substrate 2, that is, the surfaces of the first insulating layer 3 1 and the fourth insulating layer 3 4 and the inner wall surface of the recess 11 (the third insulating layer 3 3 forming the side wall of the recess 11 and the second 4 second insulating layer 3 2 of the surface forming the bottom wall of the end face and the recess 11 of the insulating layer 3 4), forming the surface conductor layer 6 of the exposed portion and electrically connected to a predetermined shape (pattern) How to do will be described.

まず、積層基板2の表面の全面に、無電解めっきあるいはCVDやスパッタリング等を行うことにより導電性薄膜からなる下地めっき層を形成する。そして、積層基板2の表面にレーザビームを照射することで当該照射部分の下地めっき層を除去する。かかるレーザビームは、ガルバノミラー等で走査することにより表面導体層6の輪郭に沿って積層基板2の表面を移動しつつ照射され、下地めっき層のうちで表面導体層6のパターンに一致した部分(以下、「下地層」と呼ぶ。)6aと表面導体層6のパターンに一致しない部分との境界領域の下地めっき層を除去するものである。従って、積層基板2の表面にはレーザビームが照射された輪郭内側の下地めっき層(表面導体層6のパターンに一致した下地層)6aと、下地層6aの輪郭に沿った部分のみがレーザビーム照射で除去された下地めっき層(図示せず)とが残ることになる。但し、隣接する表面導体層6の間隔が狭いような場合においては、上述のように輪郭部分だけでなく表面導体層6間の下地めっき層を全てレーザビーム照射で除去することも可能である。   First, a base plating layer made of a conductive thin film is formed on the entire surface of the multilayer substrate 2 by performing electroless plating, CVD, sputtering, or the like. Then, by irradiating the surface of the multilayer substrate 2 with a laser beam, the underlying plating layer at the irradiated portion is removed. Such a laser beam is irradiated while moving on the surface of the multilayer substrate 2 along the contour of the surface conductor layer 6 by scanning with a galvanometer mirror or the like, and a portion of the underlying plating layer that matches the pattern of the surface conductor layer 6 (Hereinafter referred to as “underlying layer”.) The underlying plating layer in the boundary region between 6a and the portion not matching the pattern of the surface conductor layer 6 is removed. Accordingly, the surface of the multilayer substrate 2 is irradiated with a laser beam on the inner plating layer (underlayer matching the pattern of the surface conductor layer 6) 6a and only the portion along the contour of the underlayer 6a is a laser beam. A base plating layer (not shown) removed by irradiation remains. However, in the case where the interval between the adjacent surface conductor layers 6 is narrow, it is possible to remove not only the contour portion but also the entire underlying plating layer between the surface conductor layers 6 by laser beam irradiation as described above.

続いて、表面導体層6のパターンに一致した下地層6aの上に電気めっきにより銅などのめっき層6bを厚付けすることで表面導体層6を形成し、下地層6a以外の不要な下地めっき層をエッチングで除去すれば、第1〜第3内層導体層41〜43と表面導体層6により所望の回路が形成された積層基板2、すなわち、回路基板1が製造できるものである。ここで、めっき層6bを形成する電気めっきを行うには、下地層6aを直流電源の陰極に接続し電気めっき浴に積層基板2を浸漬した状態で給電する必要があり、本実施形態では積層基板2の第1〜第3内層導体層41〜43を給電路として用いている。そのために第1〜第3内層導体層41〜43と電気的に接続された給電用のビアホール5aを積層基板2の長手方向両端部に設け、積層基板2の周縁部に形成した矩形枠状の給電用表面導体層8に直流電源の陰極を接続して給電用表面導体層8からビアホール5a、第1〜第3内層導体層41〜43を介して下地層6aに給電するようにしている。従って、第1〜第4絶縁層31〜34の間に形成されている第1〜第3内層導体層41〜43を介して下地層6aに給電することにより電気めっきを行い、めっき層6bを厚付けすることにより表面導体層6を形成するので、電気めっきの給電用導体層が絶縁基材の表面にしか形成し得ない従来例に比較して、積層基板2の表面に形成される表面導体層6の形状や配置の自由度が高くなるという利点がある。特に、本実施形態では積層基板2の表面に分断用の溝7が縦横に形成してあるため、各回路基板10,…の部分から積層基板2の周縁部まで積層基板2の表面に給電用表面導体層を引き回すことができずに配線の自由度が低下してしまうが、上述のように第1〜第3内層導体層41〜43を給電路として利用することで表面導体層6の形状や配置の自由度が向上するものである。 Subsequently, the surface conductor layer 6 is formed by thickening a plating layer 6b such as copper on the underlayer 6a corresponding to the pattern of the surface conductor layer 6 by electroplating, and unnecessary undercoat other than the underlayer 6a is formed. If the layer is removed by etching, the laminated substrate 2 in which a desired circuit is formed by the first to third inner conductor layers 4 1 to 4 3 and the surface conductor layer 6, that is, the circuit substrate 1 can be manufactured. Here, in order to perform electroplating to form the plating layer 6b, it is necessary to supply power while the base layer 6a is connected to the cathode of the DC power source and the laminated substrate 2 is immersed in the electroplating bath. The first to third inner conductor layers 4 1 to 4 3 of the substrate 2 are used as power feeding paths. Therefore, a rectangular frame formed on the peripheral edge of the multilayer substrate 2 by providing power supply via holes 5 a electrically connected to the first to third inner conductor layers 4 1 to 4 3 at both longitudinal ends of the multilayer substrate 2. The cathode of the DC power supply is connected to the power feeding surface conductor layer 8 so that power is supplied from the power feeding surface conductor layer 8 to the base layer 6a through the via hole 5a and the first to third inner conductor layers 4 1 to 4 3. I have to. Therefore, electroplating is performed by supplying power to the base layer 6a through the first to third inner conductor layers 4 1 to 4 3 formed between the first to fourth insulating layers 3 1 to 3 4 , Since the surface conductor layer 6 is formed by thickening the plating layer 6b, compared to the conventional example in which the electroplating power supply conductor layer can be formed only on the surface of the insulating base material, There is an advantage that the degree of freedom of the shape and arrangement of the surface conductor layer 6 to be formed is increased. In particular, in this embodiment, the dividing grooves 7 are formed vertically and horizontally on the surface of the multilayer substrate 2, so that power is supplied to the surface of the multilayer substrate 2 from the portions of the circuit substrates 10,. Although the surface conductor layer cannot be routed and the degree of freedom of the wiring is reduced, the surface conductor layer 6 can be obtained by using the first to third inner layer conductor layers 4 1 to 4 3 as the feeding path as described above. The degree of freedom of shape and arrangement is improved.

そして、上述のように構成された回路基板1を溝7の部分で分断すれば、複数個の同一回路基板10,…を得ることができるのである。本実施形態においては、図1に示すように第4絶縁層34の表面に露出するビアホール5の露出部と電気的に接続され凹所11の側壁面から底壁面まで延出された表面導体層6や、凹所11の側壁面において第3内層導体層43の露出部と電気的に接続された表面導体層6、凹所11の底壁面や第1絶縁層31の表面でビアホール5の露出部と電気的に接続された表面導体層6などが形成されており、以下、これらの表面導体層6の構造について詳述する。 And if the circuit board 1 comprised as mentioned above is parted by the part of the groove | channel 7, the several same circuit board 10, ... can be obtained. In the present embodiment, it extends out surface conductors from the side wall surface of the exposed portion and electrically connected to the recess 11 of the via hole 5 to be exposed to the fourth insulating layer 3 fourth surface, as shown in FIG. 1 to the bottom wall surface layer 6 and, via holes in the third inner conductor layer 4 3 of the exposed portion and electrically connected to the surface conductor layer 6, the bottom wall surface and the first insulating layer 3 1 of the surface of the recess 11 in the side wall surface of the recess 11 The surface conductor layers 6 and the like electrically connected to the exposed portions 5 are formed, and the structure of these surface conductor layers 6 will be described in detail below.

図2(a)に示すように第4絶縁層34と第3絶縁層33とに挟まれた第3内層導体層43に、凹所11の側壁面に露出する露出部が設けてあり、第3内層導体層43の露出部を含む凹所11の側壁面に、当該側壁面の法線方向から見て平面視長方形の表面導体層6が設けてある。また、図2(b)に示すように凹所11の底壁面にはビアホール5の端部を露出させてなる露出部が設けてあり、第2内層導体層42と電気的に接続されているビアホール5の露出部を含む凹所11の底壁面に、当該底壁面の法線方向から見て平面視略円形の表面導体層6が設けてある。このように絶縁層3の端面(凹所11の側壁面や底壁面)に導体層4やビアホール5の端面を露出させてなる露出部を設け、当該露出部を覆うように表面導体層6を形成して導体層4やビアホール5の露出部と電気的に接続する構造とすれば、レーザビーム照射による下地めっき層の除去が側壁面や底壁面と平行な面だけで済むため、凹所11内における回路形成が容易になるという利点がある。 2 and the fourth insulating layer 3 4 as shown in (a) third inner conductor layer 4 3 3 sandwiched between the insulating layer 3 3, the exposed portion is provided to be exposed on the side wall surface of the recess 11 There, the sidewall surface of the recess 11 including the third exposure portion of the inner conductor layer 4 3, the surface conductor layer 6 of a rectangular shape as viewed in plan when viewed from the normal direction of the side wall is provided. Also, FIG. 2 is the bottom wall surface of the recess 11 as shown in (b) Yes with exposed portions provided comprising exposing the ends of the via hole 5, second internal conductor layer 4 2 and is electrically connected On the bottom wall surface of the recess 11 including the exposed portion of the via hole 5, the surface conductor layer 6 having a substantially circular shape in plan view when viewed from the normal direction of the bottom wall surface is provided. In this way, an exposed portion is formed by exposing the end surface of the conductor layer 4 or the via hole 5 on the end surface of the insulating layer 3 (the side wall surface or the bottom wall surface of the recess 11), and the surface conductor layer 6 is formed so as to cover the exposed portion. If the structure is formed and electrically connected to the exposed portions of the conductor layer 4 and the via hole 5, the removal of the base plating layer by the laser beam irradiation can be performed only on the surface parallel to the side wall surface and the bottom wall surface. There is an advantage that the circuit formation inside becomes easy.

また、図3に示すように第2内層導体層42の一部を凹所11の底壁面(第2絶縁層32の表面)に沿って露出させてなる露出部が設けてあり、凹所11の側壁面から第2内層導体層42の露出部を覆うように表面導体層6が設けてある。この場合、凹所11の側壁面や底壁面において第2内層導体層42の露出部の輪郭よりもやや大きくレーザビームを照射して下地めっき層を除去するのであるが、凹所11の側壁面(第3絶縁層33の端面)と第2内層導体層42の露出部との境界部分については凹所11の側壁面にレーザビームを照射すればよく、第2内層導体層42(露出部)にレーザビームを照射しなくて済むという利点がある。 Further, as shown in FIG. 3, there is provided an exposed portion in which a part of the second inner conductor layer 4 2 is exposed along the bottom wall surface of the recess 11 (the surface of the second insulating layer 3 2 ). surface conductor layer 6 as from the side wall surface to cover the second exposed portion of the inner conductor layer 4 2 place 11 is provided. In this case, although the removal of base plating layer is irradiated with a slightly larger laser beam than the contour of the second inner conductor layer 4 2 of the exposed portion in the side wall surface and the bottom wall surface of the recess 11, the side of the recess 11 wall may be irradiated with a laser beam on the side wall surface of the recess 11 for the boundary portion (the third insulating layer 3 end surfaces of 3) and the second inner conductor layer 4 2 of the exposed portion, the second inner conductor layer 4 2 There is an advantage that it is not necessary to irradiate the (exposed portion) with a laser beam.

ここで、第3絶縁層33に設ける丸孔の径を第4絶縁層34に設ける丸孔の径よりも大きくすることにより、図4に示すように第4絶縁層34が第3絶縁層33の端面より突出し且つ第3絶縁層33の端面から突出する第2内層導体層42を挟んで積層方向に対して第2絶縁層32と対向する構造とすれば、スパッタリングのように成膜に方向性を有する方法によって下地めっき層を形成する際、第2内層導体層42の露出部のうちで第4絶縁層34によって覆われている部分には薄膜が形成されない。したがって、図3に示した構造のように凹所11の側壁面にレーザビームを照射する必要がなく、第2内層導体層42の露出部のうちで第4絶縁層34で覆われていない部分のみを覆い且つ電気的に接続された表面導体層6を形成することができる。なお、本実施形態では凹所11の側壁面並びに底壁面に露出する内層導体層4の露出部を覆うように表面導体層6を形成する場合について説明したが、凹所11を含む段差全般において、上述のように段差の側面(凹所11の側壁面)や表面(凹所11の底壁面)に露出する内層導体層4の露出部を覆うように表面導体層6を形成することができる。 Here, to be larger than the diameter of the round hole providing a diameter of the round holes provided in the third insulating layer 3 3 in the fourth insulating layer 3 4, the fourth insulating layer 3 4 4 3 if a structure that faces the second insulating layer 3 2 to the stacking direction across the second internal conductor layer 4 2 projecting from the end surface of the third insulating layer 3 3 and protrudes from the end face of the insulating layer 3 3, sputtering when forming the lower plating layer by a method having a directivity in the film formation, the fourth portion covered by an insulating layer 3 4 among the second inner conductor layer 4 2 of the exposed portion thin film formed as Not. Therefore, it is not necessary to irradiate the laser beam on the side wall surface of the recess 11 so that the structure shown in FIG. 3, 4 are covered with the insulating layer 3 4 among the second inner conductor layer 4 2 of the exposed portion It is possible to form the surface conductor layer 6 that covers only the non-existing portion and is electrically connected. In the present embodiment, the case where the surface conductor layer 6 is formed so as to cover the exposed portion of the inner layer conductor layer 4 exposed on the side wall surface and the bottom wall surface of the recess 11 has been described. As described above, the surface conductor layer 6 can be formed so as to cover the exposed portion of the inner conductor layer 4 exposed on the side surface of the step (the side wall surface of the recess 11) and the surface (the bottom wall surface of the recess 11). .

ここで、積層基板2として各絶縁層3が1枚のグリーンシートで構成されるものを例示したが、複数枚のグリーンシートを積層することで各絶縁層3が構成される積層基板2であっても構わない。例えば、図4(b)には第3絶縁層33が1つの層(1枚のグリーンシート)で構成されている状態を図示しているが、第3絶縁層33が複数枚のグリーンシートを積層して構成された積層基板2であってもよい。 Here, the laminated substrate 2 has been exemplified in which each insulating layer 3 is composed of one green sheet, but the laminated substrate 2 is composed of each insulating layer 3 by laminating a plurality of green sheets. It doesn't matter. For example, although illustrated a state in which the third insulating layer 3 3 is composed of one layer (a single green sheet) in FIG. 4 (b), the third insulating layer 3 3 is a plurality Green The laminated substrate 2 may be configured by laminating sheets.

ところで、積層されたグリーンシートを焼成してなる積層体にレーザビームを照射してビアホール5を形成する方法によれば、積層前のグリーンシートにビアホール5を形成する方法に比べて回路基板1の配線パターンが容易に変更可能になるとともに回路形成の自由度が高まるという利点がある。   By the way, according to the method of forming the via hole 5 by irradiating the laminated body obtained by firing the laminated green sheets with the laser beam, the circuit board 1 is compared with the method of forming the via hole 5 in the green sheet before lamination. There is an advantage that the wiring pattern can be easily changed and the degree of freedom of circuit formation is increased.

また、図5(b)(c)に示すようにすり鉢状の凹所11の側壁面に表面導体層61を形成するとともに、凹所11の底壁面に露出する第2内層導体層42の露出部を覆った表面導体層62を形成する場合、凹所11の側壁面に露出部が設けられた第3内層導体層43を介して一方の表面導体層61の下地層(図示せず)に給電する給電用表面導体層81を積層基板2の一端側に設け、他方の表面導体層62の下地層(図示せず)に給電する給電用表面導体層82を積層基板2の他端側に設け、各給電用表面導体層81,82へ各別に給電することで個別に電気めっきすればよい。例えば、底壁面の表面導体層62に発光ダイオードチップ(図示せず)を実装し、側壁面の表面導体層61を発光ダイオードチップから放射する光の反射面とする場合であれば、給電用表面導体82へ給電することで下地層6aに実装用の金めっきを厚付けして表面導体層62を形成し、別途、給電用表面導体81へ給電することで下地層6aに銀めっきを厚付けして表面導体層61を形成することができる。 FIG. 5 (b) to form a surface conductor layer 61 on the side wall surface of the conical recess 11 as shown in (c), the second inner conductor layer exposed at the bottom wall of the recess 11 4 2 when forming the surface conductor layer 6 2 covering the exposed portion of the third inner conductor layer 4 3 through one surface conductive layer 6 1 of the base layer exposed portion is provided on the side wall surface of the recess 11 ( the feeding for surface conductive layer 81 to power not shown) to one end of the laminated substrate 2, the feeding surface conductor layer 82 for supplying power to the base layer on the other surface conductor layer 6 2 (not shown) What is necessary is just to electroplate separately by providing in the other end side of the multilayer substrate 2, and supplying electric power to each of the surface conductor layers 8 1 and 8 2 for electric power feeding. For example, mounting the light emitting diode chip on the surface conductor layer 6 and second bottom wall surface (not shown), in the case of a reflective surface of the light emitting surface conductor layer 61 of the side wall surface from the light emitting diode chip, power supply By supplying power to the surface conductor 8 2 for use, the surface layer 6 2 is formed by thickening a gold plating for mounting on the base layer 6 a, and separately supplying power to the surface conductor 8 1 for supplying power to the base layer 6 a it is possible to form the surface conductive layer 6 1 of silver-plated thickening to.

さらに、図6に示すように回路基板1の端面に内層導体層4の端面を露出させてなる露出部を設け、これら内層導体層4の露出部と電気的に接続された給電用表面導体層8を回路基板1の端面に形成すれば、給電用のビアホール5aを設ける必要が無くなるという利点がある。   Further, as shown in FIG. 6, an exposed portion formed by exposing the end surface of the inner layer conductor layer 4 is provided on the end surface of the circuit board 1, and the power supply surface conductor layer electrically connected to the exposed portion of the inner layer conductor layer 4. If 8 is formed on the end face of the circuit board 1, there is an advantage that it is not necessary to provide the via hole 5a for feeding.

本発明の実施形態を示し、(a)は回路基板の斜視図、(b)は回路基板の一部省略した断面図である。1A and 1B show an embodiment of the present invention, in which FIG. 1A is a perspective view of a circuit board, and FIG. 同上における回路基板の要部斜視図である。It is a principal part perspective view of the circuit board in the same as the above. 同上における回路基板の要部斜視図である。It is a principal part perspective view of the circuit board in the same as the above. (a)は同上における回路基板の要部斜視図、(b)同上における回路基板の要部断面図である。(A) is a principal part perspective view of the circuit board same as the above, (b) It is principal part sectional drawing of the circuit board same as the above. 本発明の他の実施形態を示し、(a)は回路基板の斜視図、(b)は回路基板の要部斜視図、(c)は回路基板の要部断面図である。2A and 2B show another embodiment of the present invention, in which FIG. 1A is a perspective view of a circuit board, FIG. 1B is a perspective view of main parts of the circuit board, and FIG. 本発明のさらに他の実施形態を示す回路基板の斜視図である。It is a perspective view of the circuit board which shows other embodiment of this invention.

符号の説明Explanation of symbols

1 回路基板
2 積層基板
1〜34 第1絶縁層〜第4絶縁層
1〜43 第1内層導体層〜第3内層導体層
5 ビアホール
6 表面導体層
7 溝
10 回路基板
11 凹所
1 circuit board 2 laminated substrate 3 1 to 3 4 first insulating layer to the fourth insulating layer 41 to 3 first internal conductor layer through the third inner conductor layer 5 via hole 6 surface conductor layer 7 groove 10 the circuit board 11 recess

Claims (5)

セラミックス製の絶縁層の間に1乃至複数の内層導体層が形成されてなる積層基板と、積層基板の表面に形成され且つ内層導体層と電気的に接続された表面導体層とを有する回路基板であって、
前記表面導体層は、積層基板の表面に形成される下地めっき層と、内層導体層を介して給電することにより下地めっき層上に形成される電気めっき層とから構成されるものであり、下地めっき層の電気めっき層が形成される部分と電気めっき層が形成されない部分との、少なくとも境界領域の下地めっき層をレーザビーム照射により除去してなり、さらに、第1の絶縁層の表面と第1の絶縁層上に積層されている第2の絶縁層の端面とで形成される階段状の段差が積層基板に設けられ、第1の絶縁層の表面若しくは第2の絶縁層の端面に露出する内層導体層の一部を覆うように表面導体層が形成されたことを特徴とする回路基板。
A circuit board having a laminated substrate in which one or a plurality of inner layer conductor layers are formed between ceramic insulating layers, and a surface conductor layer formed on the surface of the laminated substrate and electrically connected to the inner layer conductor layer Because
The surface conductor layer is composed of a base plating layer formed on the surface of the multilayer substrate and an electroplating layer formed on the base plating layer by supplying power through the inner conductor layer. At least the base plating layer in the boundary region between the portion where the electroplating layer is formed and the portion where the electroplating layer is not formed is removed by laser beam irradiation, and the surface of the first insulating layer A stepped step formed between the end surface of the second insulating layer stacked on the first insulating layer is provided on the stacked substrate, and is exposed on the surface of the first insulating layer or the end surface of the second insulating layer. A circuit board, wherein a surface conductor layer is formed so as to cover a part of the inner conductor layer.
第2の絶縁層の端面と同一面上に露出する内層導体層の端面を覆うように表面導体層が形成されることを特徴とする請求項1記載の回路基板。   2. The circuit board according to claim 1, wherein the surface conductor layer is formed so as to cover the end face of the inner conductor layer exposed on the same plane as the end face of the second insulating layer. 第1の絶縁層表面に沿って第2の絶縁層端面より突出する内層導体層の前記一部を覆うように表面導体層が形成されることを特徴とする請求項1記載の回路基板。   2. The circuit board according to claim 1, wherein the surface conductor layer is formed so as to cover the part of the inner conductor layer protruding from the end face of the second insulating layer along the surface of the first insulating layer. 第2の絶縁層上に積層されている第3の絶縁層は、第2の絶縁層端面より突出し且つ内層導体層の前記一部を挟んで積層方向に対して第1の絶縁層と対向することを特徴とする請求項3記載の回路基板。   The third insulating layer stacked on the second insulating layer protrudes from the end surface of the second insulating layer and faces the first insulating layer with respect to the stacking direction with the part of the inner conductor layer interposed therebetween. The circuit board according to claim 3. 複数の内層導体層同士を電気的に接続するビアホールが第1の絶縁層表面に露出し、当該ビアホールの端面を覆うように表面導体層が形成されたことを特徴とする請求項1記載の回路基板 2. The circuit according to claim 1, wherein a via hole for electrically connecting a plurality of inner layer conductor layers is exposed on a surface of the first insulating layer, and a surface conductor layer is formed so as to cover an end face of the via hole. Board .
JP2007254846A 2007-09-28 2007-09-28 Circuit board Expired - Fee Related JP4741563B2 (en)

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PCT/JP2008/067281 WO2009041484A1 (en) 2007-09-28 2008-09-25 Circuit substrate manufacturing method, and circuit substrate
TW97137059A TW200930198A (en) 2007-09-28 2008-09-26 A manufacturing method of a circuit substract and the circuit substract

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003133690A (en) * 2001-10-26 2003-05-09 Matsushita Electric Works Ltd Method for forming circuit by using ultra short pulse laser
JP2004349564A (en) * 2003-05-23 2004-12-09 Kyocera Corp Multipiece wiring board
JP2006024878A (en) * 2004-06-11 2006-01-26 Ngk Spark Plug Co Ltd Wiring board of multiple allocation and its manufacturing method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3912153B2 (en) * 2002-03-20 2007-05-09 株式会社村田製作所 Manufacturing method of ceramic multilayer substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003133690A (en) * 2001-10-26 2003-05-09 Matsushita Electric Works Ltd Method for forming circuit by using ultra short pulse laser
JP2004349564A (en) * 2003-05-23 2004-12-09 Kyocera Corp Multipiece wiring board
JP2006024878A (en) * 2004-06-11 2006-01-26 Ngk Spark Plug Co Ltd Wiring board of multiple allocation and its manufacturing method

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