JP4738573B2 - 投影露光装置及びデバイス製造方法 - Google Patents

投影露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4738573B2
JP4738573B2 JP2000231126A JP2000231126A JP4738573B2 JP 4738573 B2 JP4738573 B2 JP 4738573B2 JP 2000231126 A JP2000231126 A JP 2000231126A JP 2000231126 A JP2000231126 A JP 2000231126A JP 4738573 B2 JP4738573 B2 JP 4738573B2
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reticle
plate
dust
optical system
thickness
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JP2002050558A (ja
JP2002050558A5 (enExample
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道生 河野
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000231126A 2000-07-31 2000-07-31 投影露光装置及びデバイス製造方法 Expired - Fee Related JP4738573B2 (ja)

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JP2000231126A JP4738573B2 (ja) 2000-07-31 2000-07-31 投影露光装置及びデバイス製造方法

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JP2000231126A JP4738573B2 (ja) 2000-07-31 2000-07-31 投影露光装置及びデバイス製造方法

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JP2002050558A JP2002050558A (ja) 2002-02-15
JP2002050558A5 JP2002050558A5 (enExample) 2007-09-06
JP4738573B2 true JP4738573B2 (ja) 2011-08-03

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG102718A1 (en) * 2002-07-29 2004-03-26 Asml Holding Nv Lithography tool having a vacuum reticle library coupled to a vacuum chamber
JP2005191278A (ja) * 2003-12-25 2005-07-14 Semiconductor Leading Edge Technologies Inc 投影露光装置及び投影露光方法
JP2011003723A (ja) * 2009-06-18 2011-01-06 Nikon Corp マスク搬送装置、露光装置、マスク搬送方法、及びデバイスの製造方法
CN117651911A (zh) * 2021-07-05 2024-03-05 株式会社尼康 曝光装置以及器件制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60107834A (ja) * 1983-11-16 1985-06-13 Hitachi Ltd 露光装置
JP3064367B2 (ja) * 1990-09-21 2000-07-12 株式会社ニコン 投影光学装置、露光方法、および回路製造方法
JP3391409B2 (ja) * 1993-07-14 2003-03-31 株式会社ニコン 投影露光方法及び装置、並びに素子製造方法
JP3414476B2 (ja) * 1994-03-02 2003-06-09 株式会社ニコン 投影露光装置
JP3303758B2 (ja) * 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JPH10289871A (ja) * 1997-04-14 1998-10-27 Nikon Corp 投影露光装置
WO1999049366A1 (en) * 1998-03-20 1999-09-30 Nikon Corporation Photomask and projection exposure system

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