JP4738563B2 - 半導体製造装置およびデバイス製造方法 - Google Patents

半導体製造装置およびデバイス製造方法 Download PDF

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Publication number
JP4738563B2
JP4738563B2 JP2000121110A JP2000121110A JP4738563B2 JP 4738563 B2 JP4738563 B2 JP 4738563B2 JP 2000121110 A JP2000121110 A JP 2000121110A JP 2000121110 A JP2000121110 A JP 2000121110A JP 4738563 B2 JP4738563 B2 JP 4738563B2
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Japan
Prior art keywords
lot
processing
wafer
processed
semiconductor manufacturing
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Expired - Fee Related
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JP2000121110A
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Japanese (ja)
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JP2001307972A (ja
JP2001307972A5 (enExample
Inventor
淳 川島
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Canon Inc
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Canon Inc
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Priority to JP2000121110A priority Critical patent/JP4738563B2/ja
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Publication of JP2001307972A5 publication Critical patent/JP2001307972A5/ja
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Multi-Process Working Machines And Systems (AREA)
  • General Factory Administration (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2000121110A 2000-04-21 2000-04-21 半導体製造装置およびデバイス製造方法 Expired - Fee Related JP4738563B2 (ja)

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JP2000121110A JP4738563B2 (ja) 2000-04-21 2000-04-21 半導体製造装置およびデバイス製造方法

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JP2000121110A JP4738563B2 (ja) 2000-04-21 2000-04-21 半導体製造装置およびデバイス製造方法

Publications (3)

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JP2001307972A JP2001307972A (ja) 2001-11-02
JP2001307972A5 JP2001307972A5 (enExample) 2007-06-14
JP4738563B2 true JP4738563B2 (ja) 2011-08-03

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JP2000121110A Expired - Fee Related JP4738563B2 (ja) 2000-04-21 2000-04-21 半導体製造装置およびデバイス製造方法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1292699C (zh) 2001-10-03 2007-01-03 花王株式会社 清扫用具
JP2005294473A (ja) 2004-03-31 2005-10-20 Canon Inc 露光装置、デバイス製造方法及びデバイス
JP2009071194A (ja) * 2007-09-14 2009-04-02 Canon Inc 半導体製造装置、半導体製造方法及びデバイス製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2869826B2 (ja) * 1991-08-28 1999-03-10 キヤノン株式会社 半導体製造方法
JPH1074675A (ja) * 1996-08-29 1998-03-17 Nikon Corp 露光装置のロット処理方法及びその装置
JPH1098086A (ja) * 1996-09-20 1998-04-14 Canon Inc 半導体製造装置および露光制御方法

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JP2001307972A (ja) 2001-11-02

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