JP4722416B2 - 半導体製造装置及び基板搬送方法並びに半導体装置の製造方法 - Google Patents

半導体製造装置及び基板搬送方法並びに半導体装置の製造方法 Download PDF

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Publication number
JP4722416B2
JP4722416B2 JP2004178471A JP2004178471A JP4722416B2 JP 4722416 B2 JP4722416 B2 JP 4722416B2 JP 2004178471 A JP2004178471 A JP 2004178471A JP 2004178471 A JP2004178471 A JP 2004178471A JP 4722416 B2 JP4722416 B2 JP 4722416B2
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substrate
chamber
atmospheric
wafer
pressure
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JP2004178471A
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Japanese (ja)
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JP2006005086A5 (enExample
JP2006005086A (ja
Inventor
正則 奥野
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Kokusai Denki Electric Inc
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Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
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JP2004178471A 2004-06-16 2004-06-16 半導体製造装置及び基板搬送方法並びに半導体装置の製造方法 Expired - Fee Related JP4722416B2 (ja)

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JP2004178471A JP4722416B2 (ja) 2004-06-16 2004-06-16 半導体製造装置及び基板搬送方法並びに半導体装置の製造方法

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JP2004178471A JP4722416B2 (ja) 2004-06-16 2004-06-16 半導体製造装置及び基板搬送方法並びに半導体装置の製造方法

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JP2006005086A JP2006005086A (ja) 2006-01-05
JP2006005086A5 JP2006005086A5 (enExample) 2007-07-26
JP4722416B2 true JP4722416B2 (ja) 2011-07-13

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5369233B2 (ja) * 2010-03-19 2013-12-18 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
JP5550600B2 (ja) * 2011-04-13 2014-07-16 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
CN105742201B (zh) * 2011-08-16 2018-07-27 应用材料公司 用于在腔室内感测基板的方法及设备
WO2014129421A1 (ja) 2013-02-20 2014-08-28 独立行政法人産業技術総合研究所 小型製造装置及びこれを用いた製造システム
CN118116854B (zh) * 2024-04-25 2024-08-02 浙江求是创芯半导体设备有限公司 一种晶圆调度方法、装置、设备及存储介质

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2641922B2 (ja) * 1988-10-26 1997-08-20 東京エレクトロン株式会社 処理装置
JPH0427140A (ja) * 1990-05-22 1992-01-30 Tokyo Electron Ltd 被処理体の検知装置
JPH05294405A (ja) * 1992-04-20 1993-11-09 Tel Varian Ltd 基板検出装置
JPH1145929A (ja) * 1997-05-30 1999-02-16 Sharp Corp プラズマ処理装置
JP3468056B2 (ja) * 1997-09-23 2003-11-17 東京エレクトロン株式会社 基板検出装置
JPH11195695A (ja) * 1997-12-26 1999-07-21 Advanced Display Inc 電子デバイス製造装置
JP4256551B2 (ja) * 1998-12-25 2009-04-22 東京エレクトロン株式会社 真空処理システム
JP2002237507A (ja) * 2000-12-08 2002-08-23 Tokyo Electron Ltd 処理システム及び処理システムの被処理体の搬送方法

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