JP4721017B2 - 半導体デバイスの製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 84
- 238000004519 manufacturing process Methods 0.000 title claims description 50
- 239000000758 substrate Substances 0.000 claims description 95
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 35
- 238000005530 etching Methods 0.000 claims description 32
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 12
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 11
- 230000001681 protective effect Effects 0.000 claims description 10
- 229910052785 arsenic Inorganic materials 0.000 claims description 7
- 229910052738 indium Inorganic materials 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 347
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 126
- 230000007547 defect Effects 0.000 description 27
- 230000005540 biological transmission Effects 0.000 description 20
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 18
- 238000010586 diagram Methods 0.000 description 16
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 11
- 239000002356 single layer Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 238000005253 cladding Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- 230000002542 deteriorative effect Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- -1 indium aluminum arsenic Chemical compound 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
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- H01L29/66234—Bipolar junction transistors [BJT]
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- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
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- H01L21/02392—Phosphides
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Description
(A1)InP基板上に犠牲層を形成したのち、犠牲層上にデバイス層を形成する形成工程
(A2)犠牲層を、フッ酸を用いてエッチングすることによりInP基板とデバイス層とを分離する分離工程
本発明の第1の半導体デバイスの製造方法において、犠牲層およびデバイス層は、以下の(B1)〜(B5)に記載の特徴を備えている。
(B1)犠牲層は、少なくともIn、AlおよびAsを含むInAlAs層を有すること
(B2)犠牲層に含まれるInAlAs層のIn組成比は、0より大きく0.2以下であること
(B3)デバイス層は、複数の半導体層からなること
(B4)デバイス層は、InAlAs層、InGaAs層、InGaAlAs層またはInGaAlAs層を含むこと
(B5)複数の半導体層のうちInを含む層のIn組成比は、0.50以上0.56以下であること
(C1)InPとの格子不整合がGaAsとInPとの格子不整合よりも小さなメタモルフィックバッファ層がGaAs基板の表面に形成されたメタモルフィック基板のメタモルフィックバッファ層上に犠牲層を形成したのち、犠牲層上にデバイス層を形成する形成工程
(C2)犠牲層を、フッ酸を用いてエッチングすることによりメタモルフィック基板とデバイス層とを分離する分離工程
本発明の第2の半導体デバイスの製造方法において、犠牲層およびデバイス層は、以下の(D1)〜(D5)に記載の特徴を備えている。
(D1)犠牲層は、少なくともIn、AlおよびAsを含むInAlAs層を有すること
(D2)犠牲層に含まれるInAlAs層のIn組成比は、0より大きく0.2以下であること
(D3)デバイス層は、複数の半導体層からなること
(D4)デバイス層は、InAlAs層、InGaAs層、InGaAlAs層またはInGaAlAs層を含むこと
(D5)複数の半導体層のうちInを含む層のIn組成比は、0.50以上0.56以下であること
上記実施の形態では、本発明の半導体デバイスの製造方法をDHBTの製造方法に適用した場合について説明したが、他のデバイス、例えば、SHBT、HEMT、LED、LD、PDなどに適用させることが可能である。
上記実施の形態では、取出電極34と電極11とを互いに接合することにより、デバイス層21を支持基板10に固定していたが、例えば、以下のようにして、デバイス層21を支持基板10に固定することも可能である。例えば、保護膜35に、孔39や、エミッタ電極33、ベース電極32、コレクタ電極31を形成する前に、保護膜35の平坦面35Aと、電極11の形成されていない平坦な支持基板10とを互いに貼り合わせることにより、デバイス層21を支持基板に固定してもよい。このとき、平坦面35Aと支持基板10との間に接着性の樹脂層を設けてもよい。
次に、図18を参照して、上記実施の形態に係る半導体デバイス1を搭載した電子機器の構成の一例について説明する。図18は、電子機器のブロック構成を表している。
Claims (7)
- InP基板上に犠牲層を形成したのち、前記犠牲層上にデバイス層を形成する形成工程と、
前記犠牲層を、フッ酸を用いてエッチングすることにより前記InP基板と前記デバイス層とを分離する分離工程と
を含み、
前記犠牲層は、少なくともIn、AlおよびAsを含むInAlAs層を有し、
前記犠牲層に含まれるInAlAs層のIn組成比は、0より大きく0.2以下であり、
前記デバイス層は、複数の半導体層からなり、
前記デバイス層は、InAlAs層、InGaAs層、またはInGaAlAs層を含み、
前記複数の半導体層のうちInを含む層のIn組成比は、0.50以上0.56以下である
半導体デバイスの製造方法。 - 前記InAlAs層のIn組成比は、前記デバイス層側に向かって連続的または階段状に大きくなっている
請求項1に記載の半導体デバイスの製造方法。 - 前記InAlAs層の厚さは、3nmより大きく以上5nm以下である
請求項1に記載の半導体デバイスの製造方法。 - 前記InAlAs層の厚さは、3nmより大きく4nm以下である
請求項1に記載の半導体デバイスの製造方法。 - 前記犠牲層は、AlAs層および前記InAlAs層を前記InP基板側から順に積層してなる積層構造を有する
請求項1に記載の半導体デバイスの製造方法。 - 前記分離工程において、前記犠牲層のエッチングの際に前記デバイス層がエッチングされるのを防ぐ保護膜で前記デバイス層を覆ったのち、前記犠牲層をエッチングすることにより前記InP基板を前記デバイス層から剥離する
請求項1に記載の半導体デバイスの製造方法。 - InPとの格子不整合がGaAsとInPとの格子不整合よりも小さなメタモルフィックバッファ層がGaAs基板の表面に形成されたメタモルフィック基板の前記メタモルフィックバッファ層上に犠牲層を形成したのち、前記犠牲層上にデバイス層を形成する形成工程と、
前記犠牲層を、フッ酸を用いてエッチングすることにより前記メタモルフィック基板と前記デバイス層とを分離する分離工程と
を含み、
前記犠牲層は、少なくともIn、AlおよびAsを含むInAlAs層を有し、
前記犠牲層に含まれるInAlAs層のIn組成比は、0より大きく0.2以下であり、
前記デバイス層は、複数の半導体層からなり、
前記デバイス層は、InAlAs層、InGaAs層、またはInGaAlAs層を含み、
前記複数の半導体層のうちInを含む層のIn組成比は、0.50以上0.56以下である
半導体デバイスの製造方法。
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JP4721017B2 (ja) * | 2008-04-07 | 2011-07-13 | ソニー株式会社 | 半導体デバイスの製造方法 |
KR101168685B1 (ko) * | 2010-03-31 | 2012-07-30 | (주)에스엔텍 | 소자 또는 패턴의 박리방법 |
DE102010052727B4 (de) * | 2010-11-26 | 2019-01-31 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Halbleiterchips und derartiger Halbleiterchip |
WO2013049614A1 (en) * | 2011-09-30 | 2013-04-04 | Microlink Devices, Inc. | Light emitting diode fabricated by epitaxial lift-off |
EP2645429A1 (en) * | 2012-03-28 | 2013-10-02 | Soitec | Manufacture of multijunction solar cell devices |
JPWO2014017063A1 (ja) * | 2012-07-24 | 2016-07-07 | 住友化学株式会社 | 半導体基板、半導体基板の製造方法及び複合基板の製造方法 |
WO2015152817A1 (en) * | 2014-03-31 | 2015-10-08 | Nanyang Technological University | Methods of recycling substrates and carrier substrates |
US20150308013A1 (en) * | 2014-04-29 | 2015-10-29 | Rubicon Technology, Inc. | Method of producing free-standing net-shape sapphire |
JP6248897B2 (ja) * | 2014-10-31 | 2017-12-20 | 三菱電機株式会社 | 半導体装置の製造方法 |
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KR102634586B1 (ko) | 2018-06-11 | 2024-02-07 | 삼성디스플레이 주식회사 | 발광 소자, 그 제조방법 및 발광 소자를 포함하는 표시 장치 |
KR102590984B1 (ko) | 2018-10-30 | 2023-10-18 | 삼성디스플레이 주식회사 | 발광 소자 구조물 및 발광 소자의 제조방법 |
KR102322540B1 (ko) * | 2021-06-17 | 2021-11-09 | 한국과학기술원 | InP 기판을 이용한 소자 제조 방법 |
Citations (4)
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JPS61110470A (ja) * | 1984-11-05 | 1986-05-28 | Nippon Telegr & Teleph Corp <Ntt> | InP太陽電池の製策方法 |
JPH01241166A (ja) * | 1988-03-23 | 1989-09-26 | Hitachi Ltd | バイポーラトランジスタの製造方法 |
JPH07135194A (ja) * | 1993-11-11 | 1995-05-23 | Nec Corp | ドライエッチング用マスクの形成方法 |
JP2001068783A (ja) * | 1999-08-25 | 2001-03-16 | Fujitsu Ltd | 面発光レーザ及びその製造方法 |
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US5641381A (en) * | 1995-03-27 | 1997-06-24 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Preferentially etched epitaxial liftoff of InP material |
US7508857B2 (en) * | 2004-12-14 | 2009-03-24 | Electronics And Telecommunications Research Institute | Semiconductor laser diode and method of manufacturing the same |
JP2008258563A (ja) * | 2007-03-12 | 2008-10-23 | Sony Corp | 半導体装置の製造方法、半導体装置および電子機器 |
JP4721017B2 (ja) * | 2008-04-07 | 2011-07-13 | ソニー株式会社 | 半導体デバイスの製造方法 |
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2008
- 2008-04-07 JP JP2008099242A patent/JP4721017B2/ja active Active
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61110470A (ja) * | 1984-11-05 | 1986-05-28 | Nippon Telegr & Teleph Corp <Ntt> | InP太陽電池の製策方法 |
JPH01241166A (ja) * | 1988-03-23 | 1989-09-26 | Hitachi Ltd | バイポーラトランジスタの製造方法 |
JPH07135194A (ja) * | 1993-11-11 | 1995-05-23 | Nec Corp | ドライエッチング用マスクの形成方法 |
JP2001068783A (ja) * | 1999-08-25 | 2001-03-16 | Fujitsu Ltd | 面発光レーザ及びその製造方法 |
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US20120149179A1 (en) | 2012-06-14 |
US8148238B2 (en) | 2012-04-03 |
US8288247B2 (en) | 2012-10-16 |
JP2009253022A (ja) | 2009-10-29 |
US20090253249A1 (en) | 2009-10-08 |
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