JP4711886B2 - 感光性組成物、感光性フィルム及びプリント基板 - Google Patents

感光性組成物、感光性フィルム及びプリント基板 Download PDF

Info

Publication number
JP4711886B2
JP4711886B2 JP2006147460A JP2006147460A JP4711886B2 JP 4711886 B2 JP4711886 B2 JP 4711886B2 JP 2006147460 A JP2006147460 A JP 2006147460A JP 2006147460 A JP2006147460 A JP 2006147460A JP 4711886 B2 JP4711886 B2 JP 4711886B2
Authority
JP
Japan
Prior art keywords
group
exposure
photosensitive
photosensitive composition
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006147460A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007316451A (ja
Inventor
明徳 藤田
崇 田村
貴美 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2006147460A priority Critical patent/JP4711886B2/ja
Priority to KR1020070051045A priority patent/KR101381187B1/ko
Priority to CN2007101063667A priority patent/CN101315522B/zh
Publication of JP2007316451A publication Critical patent/JP2007316451A/ja
Application granted granted Critical
Publication of JP4711886B2 publication Critical patent/JP4711886B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2006147460A 2006-05-26 2006-05-26 感光性組成物、感光性フィルム及びプリント基板 Expired - Fee Related JP4711886B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006147460A JP4711886B2 (ja) 2006-05-26 2006-05-26 感光性組成物、感光性フィルム及びプリント基板
KR1020070051045A KR101381187B1 (ko) 2006-05-26 2007-05-25 감광성 조성물, 감광성 필름 및 프린트 기판
CN2007101063667A CN101315522B (zh) 2006-05-26 2007-05-28 感光性组合物、感光性薄膜及印刷电路板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006147460A JP4711886B2 (ja) 2006-05-26 2006-05-26 感光性組成物、感光性フィルム及びプリント基板

Publications (2)

Publication Number Publication Date
JP2007316451A JP2007316451A (ja) 2007-12-06
JP4711886B2 true JP4711886B2 (ja) 2011-06-29

Family

ID=38850347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006147460A Expired - Fee Related JP4711886B2 (ja) 2006-05-26 2006-05-26 感光性組成物、感光性フィルム及びプリント基板

Country Status (3)

Country Link
JP (1) JP4711886B2 (ko)
KR (1) KR101381187B1 (ko)
CN (1) CN101315522B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009155521A (ja) * 2007-12-27 2009-07-16 Mitsubishi Rayon Co Ltd 活性エネルギー線硬化性組成物及びその硬化物が被覆された物品
JP2009186510A (ja) * 2008-02-01 2009-08-20 Fujifilm Corp 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP2009192632A (ja) * 2008-02-12 2009-08-27 Fujifilm Corp 絶縁材料用樹脂組成物、感光性フィルム、及び感光性積層体
JP2009217040A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP2010230721A (ja) * 2009-03-25 2010-10-14 Fujifilm Corp 感光性組成物、感光性フィルム、及び、永久パターン形成方法
JP5255504B2 (ja) * 2009-03-31 2013-08-07 富士フイルム株式会社 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP5505066B2 (ja) * 2010-04-28 2014-05-28 Ｊｓｒ株式会社 感放射線性樹脂組成物、表示素子の層間絶縁膜、保護膜及びスペーサーならびにそれらの形成方法
KR101813138B1 (ko) * 2010-05-27 2017-12-28 제이에스알 가부시끼가이샤 경화막 형성용 감방사선성 수지 조성물, 경화막 형성용 감방사선성 수지 조성물의 제조 방법, 경화막, 경화막의 형성 방법 및 표시 소자
JP5765059B2 (ja) * 2010-08-16 2015-08-19 Jsr株式会社 着色組成物、着色組成物の製造方法、着色パターン、カラーフィルタ、カラー表示素子及びカラーフィルタの製造方法
CN102375338A (zh) * 2010-08-16 2012-03-14 Jsr株式会社 着色组合物、着色组合物的制造方法、着色图案、滤色器、彩色显示元件以及滤色器的制造方法
JP5711650B2 (ja) * 2011-08-17 2015-05-07 富士フイルム株式会社 フォトスペーサ用感光性樹脂組成物およびこれを用いたフォトスペーサ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001302871A (ja) * 2000-04-25 2001-10-31 Taiyo Ink Mfg Ltd 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダーレジスト皮膜や樹脂絶縁層を有するプリント配線板
JP2007231000A (ja) * 2006-02-01 2007-09-13 Fujifilm Corp オキシム化合物及びそれを含む感光性組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08157438A (ja) * 1994-11-30 1996-06-18 Tokuyama Corp アセチルオキシム化合物の製造方法
MY121423A (en) * 1998-06-26 2006-01-28 Ciba Sc Holding Ag Photopolymerizable thermosetting resin compositions
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
TWI240149B (en) * 2000-06-22 2005-09-21 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board
DE602005003960T2 (de) * 2004-08-18 2008-10-16 Ciba Holding Inc. Oximester-Photoinitiatoren

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001302871A (ja) * 2000-04-25 2001-10-31 Taiyo Ink Mfg Ltd 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダーレジスト皮膜や樹脂絶縁層を有するプリント配線板
JP2007231000A (ja) * 2006-02-01 2007-09-13 Fujifilm Corp オキシム化合物及びそれを含む感光性組成物

Also Published As

Publication number Publication date
JP2007316451A (ja) 2007-12-06
CN101315522A (zh) 2008-12-03
CN101315522B (zh) 2012-08-29
KR101381187B1 (ko) 2014-04-04
KR20070114052A (ko) 2007-11-29

Similar Documents

Publication Publication Date Title
JP4711886B2 (ja) 感光性組成物、感光性フィルム及びプリント基板
JP5144495B2 (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP4711862B2 (ja) 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
JP4976931B2 (ja) 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
JP2008250074A (ja) 感光性樹脂組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP4708238B2 (ja) 感光性フィルム、永久パターン形成方法、及びプリント基板
JP4783678B2 (ja) 感光性組成物及びその製造方法、感光性フィルム、感光性積層体、並びに、永久パターン形成方法、及びプリント基板
JP2009217040A (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP2009186510A (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP2007310027A (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP4790460B2 (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP2007310025A (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP2007248497A (ja) 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
JP2009192632A (ja) 絶縁材料用樹脂組成物、感光性フィルム、及び感光性積層体
JP5107231B2 (ja) 感光性組成物、及び感光性フィルム、並びに永久パターン形成方法及びプリント基板
JP5179988B2 (ja) 感光性組成物、並びに感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP4651524B2 (ja) パターン形成材料、並びに、パターン形成装置及びパターン形成方法
JP4874767B2 (ja) 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
JP2008076852A (ja) 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
JP4913531B2 (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP4620600B2 (ja) 感光性組成物、感光性フィルム、及び永久パターン形成方法
JP4584164B2 (ja) 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
JP5063764B2 (ja) パターン形成材料、並びに、パターン形成装置及びパターン形成方法
JP2007248846A (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、永久パターン、及びプリント基板
JP2007248843A (ja) 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110214

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110222

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110322

R150 Certificate of patent or registration of utility model

Ref document number: 4711886

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees