JP4654066B2 - 高分子薄膜の製造方法 - Google Patents
高分子薄膜の製造方法 Download PDFInfo
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- JP4654066B2 JP4654066B2 JP2005136532A JP2005136532A JP4654066B2 JP 4654066 B2 JP4654066 B2 JP 4654066B2 JP 2005136532 A JP2005136532 A JP 2005136532A JP 2005136532 A JP2005136532 A JP 2005136532A JP 4654066 B2 JP4654066 B2 JP 4654066B2
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- thin film
- solvent
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Description
第3:低溶解性溶媒が、炭化水素である。
第4:光照射により重合反応させる。
Claims (4)
- 表面にOH基を有する固体表面に対して水素結合で組織化可能なアクリル酸、アクリル酸エステル、アクリル酸アミド、アクリル酸ニトリル、メタクリル酸、メタクリル酸エステル、メタクリル酸アミド、及びメタクリル酸ニトリルからなる群より選ばれる少なくとも1種の重合性モノマーとそれを溶解する極性溶媒のハロゲン化炭化水素との溶液を固体表面に接触させ、固体表面に前記重合性モノマーの分子マクロクラスターを形成し、次いで前記極性溶媒のハロゲン化炭化水素よりも前記重合性モノマーの溶解性が低い低溶解性の溶媒に前記重合性モノマーを溶解した溶液を接触させて重合反応させることを特徴とする高分子薄膜の製造方法。
- 低溶解性の溶媒が、非極性溶媒であることを特徴とする請求項1に記載の高分子薄膜の製造方法。
- 低溶解性の溶媒が、炭化水素であることを特徴とする請求項1に記載の高分子薄膜の製造方法。
- 光照射により重合反応させることを特徴とする請求項1から3のいずれか一項に記載の高分子薄膜の製造方法。
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JP2005136532A JP4654066B2 (ja) | 2005-05-09 | 2005-05-09 | 高分子薄膜の製造方法 |
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JP2005136532A JP4654066B2 (ja) | 2005-05-09 | 2005-05-09 | 高分子薄膜の製造方法 |
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JP2006312698A JP2006312698A (ja) | 2006-11-16 |
JP4654066B2 true JP4654066B2 (ja) | 2011-03-16 |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000143705A (ja) * | 1998-11-11 | 2000-05-26 | Japan Science & Technology Corp | 高分子薄膜とその製造方法 |
JP2002080512A (ja) * | 2000-09-06 | 2002-03-19 | Matsushita Electric Ind Co Ltd | 有機薄膜とその製造方法、ならびに液晶配向膜及びそれを用いた液晶表示装置とその製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2000143705A (ja) * | 1998-11-11 | 2000-05-26 | Japan Science & Technology Corp | 高分子薄膜とその製造方法 |
JP2002080512A (ja) * | 2000-09-06 | 2002-03-19 | Matsushita Electric Ind Co Ltd | 有機薄膜とその製造方法、ならびに液晶配向膜及びそれを用いた液晶表示装置とその製造方法 |
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