JP2006312698A - 高分子薄膜の製造方法 - Google Patents
高分子薄膜の製造方法 Download PDFInfo
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- JP2006312698A JP2006312698A JP2005136532A JP2005136532A JP2006312698A JP 2006312698 A JP2006312698 A JP 2006312698A JP 2005136532 A JP2005136532 A JP 2005136532A JP 2005136532 A JP2005136532 A JP 2005136532A JP 2006312698 A JP2006312698 A JP 2006312698A
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Abstract
【解決手段】 固体基板に対して水素結合で組織化可能な重合性モノマーとその高溶解性の溶媒との溶液を固体基板に接触させ、固体基板の表面に前記重合性モノマーの分子マクロクラスターを形成し、次いで前記重合性モノマーの低溶解性の溶媒溶液を接触させて重合反応させる。
【選択図】なし
Description
Claims (4)
- 固体基板に対して水素結合で組織化可能な重合性モノマーとその高溶解性の溶媒との溶液を固体基板に接触させ、固体基板の表面に前記重合性モノマーの分子マクロクラスターを形成し、次いで前記重合性モノマーの低溶解性の溶媒溶液を接触させて重合反応させることを特徴とする高分子薄膜の製造方法。
- 重合性モノマーは、炭素・炭素不飽和結合の存在によって重合可能とされていることを特徴とする請求項1の高分子薄膜の製造方法。
- 高溶解性の溶媒は、極性溶媒もしくは高極性の溶媒であって、低溶解性の溶媒は非極性もしくは低極性の溶媒であることを特徴とする請求項1または2の高分子薄膜の製造方法。
- 光照射により重合反応させることを特徴とする請求項1から3のうちのいずれかの高分子薄膜の製造方法。
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JP2006312698A true JP2006312698A (ja) | 2006-11-16 |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000143705A (ja) * | 1998-11-11 | 2000-05-26 | Japan Science & Technology Corp | 高分子薄膜とその製造方法 |
JP2002080512A (ja) * | 2000-09-06 | 2002-03-19 | Matsushita Electric Ind Co Ltd | 有機薄膜とその製造方法、ならびに液晶配向膜及びそれを用いた液晶表示装置とその製造方法 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000143705A (ja) * | 1998-11-11 | 2000-05-26 | Japan Science & Technology Corp | 高分子薄膜とその製造方法 |
JP2002080512A (ja) * | 2000-09-06 | 2002-03-19 | Matsushita Electric Ind Co Ltd | 有機薄膜とその製造方法、ならびに液晶配向膜及びそれを用いた液晶表示装置とその製造方法 |
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