JP4628544B2 - 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法 - Google Patents

微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法 Download PDF

Info

Publication number
JP4628544B2
JP4628544B2 JP2000559049A JP2000559049A JP4628544B2 JP 4628544 B2 JP4628544 B2 JP 4628544B2 JP 2000559049 A JP2000559049 A JP 2000559049A JP 2000559049 A JP2000559049 A JP 2000559049A JP 4628544 B2 JP4628544 B2 JP 4628544B2
Authority
JP
Japan
Prior art keywords
dispersion
particles
silica
particle size
inorganic oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000559049A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004513049A (ja
JP2004513049A5 (zh
Inventor
プリオアー，ジェームズ・ニール
チャップマン，デーヴィッド・モンロー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co Conn
Original Assignee
WR Grace and Co Conn
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/343,842 external-priority patent/US6380265B1/en
Application filed by WR Grace and Co Conn filed Critical WR Grace and Co Conn
Publication of JP2004513049A publication Critical patent/JP2004513049A/ja
Publication of JP2004513049A5 publication Critical patent/JP2004513049A5/ja
Application granted granted Critical
Publication of JP4628544B2 publication Critical patent/JP4628544B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Paper (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP2000559049A 1998-07-09 1999-07-07 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法 Expired - Lifetime JP4628544B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11241698A 1998-07-09 1998-07-09
US09/343,842 US6380265B1 (en) 1998-07-09 1999-06-30 Dispersion of fine porous inorganic oxide particles and processes for preparing same
PCT/US1999/015301 WO2000002814A1 (en) 1998-07-09 1999-07-07 Dispersion of fine porous inorganic oxide particles and processes for preparing same

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2010189801A Division JP5525385B2 (ja) 1998-07-09 2010-08-26 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法
JP2010189802A Division JP2011016717A (ja) 1998-07-09 2010-08-26 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法

Publications (3)

Publication Number Publication Date
JP2004513049A JP2004513049A (ja) 2004-04-30
JP2004513049A5 JP2004513049A5 (zh) 2006-08-31
JP4628544B2 true JP4628544B2 (ja) 2011-02-09

Family

ID=26809928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000559049A Expired - Lifetime JP4628544B2 (ja) 1998-07-09 1999-07-07 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法

Country Status (10)

Country Link
JP (1) JP4628544B2 (zh)
CN (1) CN1217857C (zh)
AU (1) AU773624B2 (zh)
BR (1) BR9911919B1 (zh)
CA (1) CA2337195C (zh)
CZ (1) CZ2001110A3 (zh)
EA (1) EA003200B1 (zh)
PL (1) PL202088B1 (zh)
TR (1) TR200100018T2 (zh)
TW (1) TW593143B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6380265B1 (en) * 1998-07-09 2002-04-30 W. R. Grace & Co.-Conn. Dispersion of fine porous inorganic oxide particles and processes for preparing same
US7985400B2 (en) * 2004-01-26 2011-07-26 Lummus Technology Inc. Method for making mesoporous or combined mesoporous and microporous inorganic oxides
DE102004006113A1 (de) * 2004-02-06 2005-08-25 Basell Polyolefine Gmbh Verfahren zur Herstellung von Trägern für Katalysatoren
EP2341526B1 (en) 2005-05-31 2012-05-23 Panasonic Corporation Fluorescent lamp and process for producing the same, and lighting system
CA2874951C (en) * 2012-06-05 2020-04-28 Dow Global Technologies Llc Aqueous coating composition with improved stability
JP6596880B2 (ja) * 2015-03-31 2019-10-30 大日本印刷株式会社 内装用塗料
KR102649105B1 (ko) * 2016-02-02 2024-03-19 엠. 테크닉 가부시키가이샤 미립자 분산액의 정밀 개질 방법
GB201913817D0 (en) * 2019-09-25 2019-11-06 Johnson Matthey Plc Process

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2816574C2 (de) * 1978-04-17 1988-09-29 Merck Patent Gmbh, 6100 Darmstadt Fluoreszenz-Indikatoren zur Verwendung in der Chromatographie und diese enthaltende Sorptionsmittel
JPH05170424A (ja) * 1991-12-24 1993-07-09 Nittetsu Mining Co Ltd シリカゾルの製造方法
JP3454554B2 (ja) * 1993-12-28 2003-10-06 水澤化学工業株式会社 非晶質シリカ粒状体及びその製法
JP3719686B2 (ja) * 1995-07-13 2005-11-24 東ソー・シリカ株式会社 濾過剤用シリカゲル

Also Published As

Publication number Publication date
AU773624B2 (en) 2004-05-27
CA2337195A1 (en) 2000-01-20
CN1217857C (zh) 2005-09-07
JP2004513049A (ja) 2004-04-30
TR200100018T2 (tr) 2002-01-21
AU5208699A (en) 2000-02-01
EA003200B1 (ru) 2003-02-27
BR9911919B1 (pt) 2009-01-13
TW593143B (en) 2004-06-21
EA200100123A1 (ru) 2001-08-27
CA2337195C (en) 2009-09-08
CZ2001110A3 (cs) 2002-05-15
BR9911919A (pt) 2001-12-11
PL346122A1 (en) 2002-01-28
CN1323277A (zh) 2001-11-21
PL202088B1 (pl) 2009-05-29

Similar Documents

Publication Publication Date Title
JP5525385B2 (ja) 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法
TW467832B (en) Formulation suitable for ink receptive coatings
EP1118584B1 (en) Dispersion of silica particle agglomerates and process for producing the same
JP4628544B2 (ja) 微細な多孔質無機酸化物粒子の分散液および同分散液の製造方法
JP6258131B2 (ja) 疎水性エアロゲル粉体、その製造方法、および、それを用いた充填剤
JP2001354408A (ja) シリカ微粒子分散液及びその製造方法
JP2002145609A (ja) シリカ微粒子分散液の製造方法
RU2393114C2 (ru) Размол диоксидов кремния с использованием химических способов
US9139736B2 (en) Surface-modified silicic acid semi-gels
CN100572456C (zh) 纳米内核夹心式结构二氧化硅消光剂及其制备方法
JP2004075459A (ja) 変性シリカ分散液及びその製造方法
JP4279228B2 (ja) インクジェット記録紙用塗工液の製造方法
JPH1149992A (ja) 塗料用艶消し剤、および塗料用艶消し剤の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060707

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060707

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090703

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091005

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091013

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091102

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091110

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091203

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091210

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100104

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100426

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100826

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20100901

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101012

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101110

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131119

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4628544

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term