JP4594745B2 - 反射防止構造体を有する部材の製造方法 - Google Patents

反射防止構造体を有する部材の製造方法 Download PDF

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Publication number
JP4594745B2
JP4594745B2 JP2005008298A JP2005008298A JP4594745B2 JP 4594745 B2 JP4594745 B2 JP 4594745B2 JP 2005008298 A JP2005008298 A JP 2005008298A JP 2005008298 A JP2005008298 A JP 2005008298A JP 4594745 B2 JP4594745 B2 JP 4594745B2
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Japan
Prior art keywords
ray
substrate
manufacturing
antireflection structure
mask
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Expired - Fee Related
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JP2005008298A
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Japanese (ja)
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JP2006195291A5 (enExample
JP2006195291A (ja
Inventor
隆正 田村
誠 梅谷
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2005008298A priority Critical patent/JP4594745B2/ja
Publication of JP2006195291A publication Critical patent/JP2006195291A/ja
Publication of JP2006195291A5 publication Critical patent/JP2006195291A5/ja
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Publication of JP4594745B2 publication Critical patent/JP4594745B2/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2005008298A 2005-01-14 2005-01-14 反射防止構造体を有する部材の製造方法 Expired - Fee Related JP4594745B2 (ja)

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JP2005008298A JP4594745B2 (ja) 2005-01-14 2005-01-14 反射防止構造体を有する部材の製造方法

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JP2005008298A JP4594745B2 (ja) 2005-01-14 2005-01-14 反射防止構造体を有する部材の製造方法

Publications (3)

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JP2006195291A JP2006195291A (ja) 2006-07-27
JP2006195291A5 JP2006195291A5 (enExample) 2008-03-13
JP4594745B2 true JP4594745B2 (ja) 2010-12-08

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JP2005008298A Expired - Fee Related JP4594745B2 (ja) 2005-01-14 2005-01-14 反射防止構造体を有する部材の製造方法

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5211762B2 (ja) * 2008-03-03 2013-06-12 凸版印刷株式会社 反射防止構造体製造方法、反射防止構造体及び光学部材
JP5420639B2 (ja) * 2009-03-26 2014-02-19 Ｈｏｙａ株式会社 反射型マスクブランク及び反射型マスクブランクの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2696962B2 (ja) * 1988-07-20 1998-01-14 株式会社ニコン 線幅測定方法及び該方法を用いた露光装置の検査方法
JP2000012433A (ja) * 1998-06-23 2000-01-14 Fujitsu Ltd Ｘ線マスク、ｘ線露光装置、ｘ線露光方法、及び、ｘ線転写歪測定方法
JP4428792B2 (ja) * 2000-03-06 2010-03-10 キヤノン株式会社 露光装置
JP2003318595A (ja) * 2002-02-22 2003-11-07 Dainippon Printing Co Ltd 電磁波シールド材及びその製造方法

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