JP4593662B2 - キャップメタル形成方法 - Google Patents
キャップメタル形成方法 Download PDFInfo
- Publication number
- JP4593662B2 JP4593662B2 JP2008242755A JP2008242755A JP4593662B2 JP 4593662 B2 JP4593662 B2 JP 4593662B2 JP 2008242755 A JP2008242755 A JP 2008242755A JP 2008242755 A JP2008242755 A JP 2008242755A JP 4593662 B2 JP4593662 B2 JP 4593662B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- plating
- stirring member
- unit
- plating solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1619—Apparatus for electroless plating
- C23C18/1628—Specific elements or parts of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1664—Process features with additional means during the plating process
- C23C18/1669—Agitation, e.g. air introduction
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
- H01L21/76849—Barrier, adhesion or liner layers formed in openings in a dielectric the layer being positioned on top of the main fill metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Description
Claims (4)
- 基板の被処理面に形成された銅配線上にキャップメタルを形成する方法であって、
前記基板を回転可能に保持するステップと、
前記保持された前記基板を前記基板の被処理面に沿った向きで回転させるステップと、
前記基板の周縁部の前記被処理面上に、該被処理面から一定間隔で対向して親水性材料で形成された撹拌部材の端部を配置するステップと、
前記被処理面にめっき処理液を供給するステップと、
前記めっき処理液の供給を停止するとともに前記撹拌部材を移動して該撹拌部材の端部を前記基板の被処理面から離間させるステップと
を有するキャップメタル形成方法。 - 前記撹拌部材の端部は、前記基板端部から略10mm以下の位置に配置されることを特徴とする請求項1に記載のキャップメタル形成方法。
- 前記撹拌部材の端部は、前記基板の被処理面から、前記被処理面に供給されためっき処理液の液面に接触する程度よりも小さい間隔で配置することを特徴とする請求項1または2記載のキャップメタル形成方法。
- 前記撹拌部材の端部は、直径2mm以上の円形状断面を有することを特徴とする請求項1ないし3のいずれか1項に記載のキャップメタル形成方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008242755A JP4593662B2 (ja) | 2008-09-22 | 2008-09-22 | キャップメタル形成方法 |
US12/405,597 US8206785B2 (en) | 2008-09-22 | 2009-03-17 | Cap metal forming method |
KR1020090022548A KR101123703B1 (ko) | 2008-09-22 | 2009-03-17 | 캡 메탈 형성 방법 |
TW098109153A TWI391522B (zh) | 2008-09-22 | 2009-03-20 | 帽蓋金屬形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008242755A JP4593662B2 (ja) | 2008-09-22 | 2008-09-22 | キャップメタル形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010070832A JP2010070832A (ja) | 2010-04-02 |
JP4593662B2 true JP4593662B2 (ja) | 2010-12-08 |
Family
ID=42037928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008242755A Expired - Fee Related JP4593662B2 (ja) | 2008-09-22 | 2008-09-22 | キャップメタル形成方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8206785B2 (ja) |
JP (1) | JP4593662B2 (ja) |
KR (1) | KR101123703B1 (ja) |
TW (1) | TWI391522B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013002096A1 (ja) * | 2011-06-29 | 2013-01-03 | 東京エレクトロン株式会社 | めっき処理方法、めっき処理装置および記憶媒体 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10772212B1 (en) * | 2019-12-13 | 2020-09-08 | U-Pro Machines Co., Ltd. | Electrochemical or chemical treatment device for high aspect ratio circuit board with through hole |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005008911A (ja) * | 2003-06-16 | 2005-01-13 | Ebara Corp | めっき用処理液の撹拌方法及びめっき用処理装置 |
JP2005200701A (ja) * | 2004-01-15 | 2005-07-28 | Toyota Motor Corp | メッキ方法及び該方法によりメッキされた電子部品 |
JP2007154298A (ja) * | 2005-12-08 | 2007-06-21 | Tokyo Electron Ltd | 無電解めっき装置および無電解めっき方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3718115A (en) * | 1971-01-27 | 1973-02-27 | Int Paper Co | Adhesive application system |
US20030232126A1 (en) * | 2002-06-14 | 2003-12-18 | Yang Michael W. | Method for dispersing spacer on the substrate of a liquid crystal display element and apparatus for dispersion therewith |
KR20080039412A (ko) * | 2006-06-26 | 2008-05-07 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 방법 및 기판 처리 장치 |
-
2008
- 2008-09-22 JP JP2008242755A patent/JP4593662B2/ja not_active Expired - Fee Related
-
2009
- 2009-03-17 US US12/405,597 patent/US8206785B2/en not_active Expired - Fee Related
- 2009-03-17 KR KR1020090022548A patent/KR101123703B1/ko not_active IP Right Cessation
- 2009-03-20 TW TW098109153A patent/TWI391522B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005008911A (ja) * | 2003-06-16 | 2005-01-13 | Ebara Corp | めっき用処理液の撹拌方法及びめっき用処理装置 |
JP2005200701A (ja) * | 2004-01-15 | 2005-07-28 | Toyota Motor Corp | メッキ方法及び該方法によりメッキされた電子部品 |
JP2007154298A (ja) * | 2005-12-08 | 2007-06-21 | Tokyo Electron Ltd | 無電解めっき装置および無電解めっき方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013002096A1 (ja) * | 2011-06-29 | 2013-01-03 | 東京エレクトロン株式会社 | めっき処理方法、めっき処理装置および記憶媒体 |
US9725810B2 (en) | 2011-06-29 | 2017-08-08 | Tokyo Electron Limited | Plating method, plating apparatus and storage medium |
Also Published As
Publication number | Publication date |
---|---|
TWI391522B (zh) | 2013-04-01 |
KR20100033915A (ko) | 2010-03-31 |
TW201012965A (en) | 2010-04-01 |
US8206785B2 (en) | 2012-06-26 |
US20100075027A1 (en) | 2010-03-25 |
KR101123703B1 (ko) | 2012-03-16 |
JP2010070832A (ja) | 2010-04-02 |
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