JP4590205B2 - ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 - Google Patents

ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 Download PDF

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Publication number
JP4590205B2
JP4590205B2 JP2004141240A JP2004141240A JP4590205B2 JP 4590205 B2 JP4590205 B2 JP 4590205B2 JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004141240 A JP2004141240 A JP 2004141240A JP 4590205 B2 JP4590205 B2 JP 4590205B2
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Prior art keywords
mirror
plane
light irradiation
center
mirror holding
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JP2004141240A
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Japanese (ja)
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JP2004363571A (ja
JP2004363571A5 (enrdf_load_stackoverflow
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永 難波
英治 坂本
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Canon Inc
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Canon Inc
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  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004141240A 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 Expired - Fee Related JP4590205B2 (ja)

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JP2004141240A JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

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JP2003135931 2003-05-14
JP2004141240A JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

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JP2004363571A JP2004363571A (ja) 2004-12-24
JP2004363571A5 JP2004363571A5 (enrdf_load_stackoverflow) 2007-06-21
JP4590205B2 true JP4590205B2 (ja) 2010-12-01

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006245374A (ja) * 2005-03-04 2006-09-14 Nikon Corp Ｅｕｖ露光装置の調整方法
WO2007010011A2 (en) * 2005-07-19 2007-01-25 Carl Zeiss Smt Ag Optical element module
TWI446365B (zh) * 2006-03-10 2014-07-21 尼康股份有限公司 投影光學系統、曝光裝置以及半導體元件的製造方法
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
WO2011029467A1 (en) * 2009-09-08 2011-03-17 Carl Zeiss Smt Gmbh Optical element with low surface figure deformation
CN115629462B (zh) * 2022-12-07 2023-03-17 山西汉威激光科技股份有限公司 一种半自动化镜片安装调节结构及其方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19807094A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system

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JP2004363571A (ja) 2004-12-24

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