JP2004363571A5 - - Google Patents

Download PDF

Info

Publication number
JP2004363571A5
JP2004363571A5 JP2004141240A JP2004141240A JP2004363571A5 JP 2004363571 A5 JP2004363571 A5 JP 2004363571A5 JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004141240 A JP2004141240 A JP 2004141240A JP 2004363571 A5 JP2004363571 A5 JP 2004363571A5
Authority
JP
Japan
Prior art keywords
mirror
plane
projected
mirror holding
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004141240A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004363571A (ja
JP4590205B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004141240A priority Critical patent/JP4590205B2/ja
Priority claimed from JP2004141240A external-priority patent/JP4590205B2/ja
Publication of JP2004363571A publication Critical patent/JP2004363571A/ja
Publication of JP2004363571A5 publication Critical patent/JP2004363571A5/ja
Application granted granted Critical
Publication of JP4590205B2 publication Critical patent/JP4590205B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004141240A 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法 Expired - Fee Related JP4590205B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004141240A JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003135931 2003-05-14
JP2004141240A JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004363571A JP2004363571A (ja) 2004-12-24
JP2004363571A5 true JP2004363571A5 (enrdf_load_stackoverflow) 2007-06-21
JP4590205B2 JP4590205B2 (ja) 2010-12-01

Family

ID=34067226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004141240A Expired - Fee Related JP4590205B2 (ja) 2003-05-14 2004-05-11 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4590205B2 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006245374A (ja) * 2005-03-04 2006-09-14 Nikon Corp Ｅｕｖ露光装置の調整方法
WO2007010011A2 (en) * 2005-07-19 2007-01-25 Carl Zeiss Smt Ag Optical element module
TWI446365B (zh) * 2006-03-10 2014-07-21 尼康股份有限公司 投影光學系統、曝光裝置以及半導體元件的製造方法
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
WO2011029467A1 (en) * 2009-09-08 2011-03-17 Carl Zeiss Smt Gmbh Optical element with low surface figure deformation
CN115629462B (zh) * 2022-12-07 2023-03-17 山西汉威激光科技股份有限公司 一种半自动化镜片安装调节结构及其方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19807094A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system

Similar Documents

Publication Publication Date Title
JP2012168543A5 (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP6098847B2 (ja) 露光装置、およびデバイス製造方法
JP2012155330A5 (ja) 露光装置、露光方法、およびデバイス製造方法
JP2003114387A5 (enrdf_load_stackoverflow)
JP2010020017A5 (enrdf_load_stackoverflow)
TW200903189A (en) Exposure apparatus and exposing method
JP2016001308A5 (ja) 露光装置、およびデバイス製造方法
JP2006215476A5 (enrdf_load_stackoverflow)
JP2006222222A5 (enrdf_load_stackoverflow)
EP1860477A4 (en) OPTICAL PROJECTION SYSTEM, EXPOSURE EQUIPMENT, AND DEVICE MANUFACTURING METHOD
TW200528927A (en) Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
JP2005141158A5 (enrdf_load_stackoverflow)
JP6494259B2 (ja) 照明光学装置、およびデバイス製造方法
JP2004363571A5 (enrdf_load_stackoverflow)
WO1999025009A1 (fr) Dispositif d'insolation
JP2005093693A5 (enrdf_load_stackoverflow)
JP2008286888A5 (enrdf_load_stackoverflow)
JP2004158786A5 (enrdf_load_stackoverflow)
TW200406593A (en) Projection optical system and exposure device equipped with the projection optical system
JP2009531734A (ja) ナノパターン形成方法およびこれによって形成されたパターンを有する基板
TW200931198A (en) Reflective projection optical system, exposure apparatus, device manufacturing method, projection method, and exposure method
JP2007019194A5 (enrdf_load_stackoverflow)
JP2009117556A5 (enrdf_load_stackoverflow)
JP2009038152A5 (enrdf_load_stackoverflow)
CN105446089B (zh) 数字微镜设备与多面棱镜结合的多光束干涉光刻方法