JP4566475B2 - 発光装置の作製方法 - Google Patents
発光装置の作製方法 Download PDFInfo
- Publication number
- JP4566475B2 JP4566475B2 JP2001236793A JP2001236793A JP4566475B2 JP 4566475 B2 JP4566475 B2 JP 4566475B2 JP 2001236793 A JP2001236793 A JP 2001236793A JP 2001236793 A JP2001236793 A JP 2001236793A JP 4566475 B2 JP4566475 B2 JP 4566475B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- light
- insulating film
- emitting device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001236793A JP4566475B2 (ja) | 2000-08-04 | 2001-08-03 | 発光装置の作製方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000236881 | 2000-08-04 | ||
JP2000-236881 | 2000-08-04 | ||
JP2001236793A JP4566475B2 (ja) | 2000-08-04 | 2001-08-03 | 発光装置の作製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002117971A JP2002117971A (ja) | 2002-04-19 |
JP2002117971A5 JP2002117971A5 (enrdf_load_stackoverflow) | 2008-07-10 |
JP4566475B2 true JP4566475B2 (ja) | 2010-10-20 |
Family
ID=26597372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001236793A Expired - Fee Related JP4566475B2 (ja) | 2000-08-04 | 2001-08-03 | 発光装置の作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4566475B2 (enrdf_load_stackoverflow) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6956324B2 (en) | 2000-08-04 | 2005-10-18 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method therefor |
JP4583568B2 (ja) * | 2000-09-19 | 2010-11-17 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
TWI272556B (en) | 2002-05-13 | 2007-02-01 | Semiconductor Energy Lab | Display device |
US7164155B2 (en) | 2002-05-15 | 2007-01-16 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
JP4123832B2 (ja) | 2002-05-31 | 2008-07-23 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
JP2004014227A (ja) * | 2002-06-05 | 2004-01-15 | Hitachi Ltd | 有機エレクトロルミネセンス表示装置 |
JP4841816B2 (ja) * | 2004-08-03 | 2011-12-21 | 富士フイルム株式会社 | 遮光膜付基板、及び該遮光膜付基板を用いたエレクトロルミネッセンス表示装置 |
KR100683715B1 (ko) | 2004-11-29 | 2007-02-20 | 삼성에스디아이 주식회사 | 평판 표시장치 및 그 제조방법 |
KR100719553B1 (ko) | 2005-06-29 | 2007-05-17 | 삼성에스디아이 주식회사 | 평판 표시장치 및 이의 제조방법 및 박막 트랜지스터 기판 |
KR100719554B1 (ko) | 2005-07-06 | 2007-05-17 | 삼성에스디아이 주식회사 | 평판 디스플레이 장치 및 그 제조방법 |
KR100688359B1 (ko) | 2005-11-29 | 2007-03-02 | 삼성에스디아이 주식회사 | 유기 발광 표시 장치 |
KR100748309B1 (ko) | 2006-02-10 | 2007-08-09 | 삼성에스디아이 주식회사 | 유기전계발광 표시장치 및 그 제조방법 |
JP5090658B2 (ja) | 2006-04-06 | 2012-12-05 | 三菱電機株式会社 | 薄膜トランジスタ、及びその製造方法、並びにアクティブマトリクス型表示装置 |
KR100767680B1 (ko) * | 2006-10-24 | 2007-10-17 | 엘지전자 주식회사 | 전계 발광 소자와 그 기판 및 그 제조방법 |
JP5223341B2 (ja) * | 2008-01-09 | 2013-06-26 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
JP5907722B2 (ja) | 2011-12-23 | 2016-04-26 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
JP6228735B2 (ja) * | 2013-02-21 | 2017-11-08 | 株式会社ジャパンディスプレイ | 表示装置 |
TWI559064B (zh) | 2012-10-19 | 2016-11-21 | Japan Display Inc | Display device |
JP6659094B2 (ja) * | 2014-08-11 | 2020-03-04 | キヤノン株式会社 | 発光装置 |
JP2016136529A (ja) * | 2016-03-22 | 2016-07-28 | 株式会社半導体エネルギー研究所 | 発光装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63259994A (ja) * | 1987-04-15 | 1988-10-27 | 株式会社リコー | 薄膜発光素子 |
JPH08124679A (ja) * | 1994-10-25 | 1996-05-17 | Ibm Japan Ltd | エレクトロ・ルミネッセンス装置 |
JP3524711B2 (ja) * | 1997-03-18 | 2004-05-10 | 三洋電機株式会社 | 有機エレクトロルミネッセンス素子及びその製造方法 |
JPH10321369A (ja) * | 1997-03-19 | 1998-12-04 | Fuji Photo Film Co Ltd | エレクトロルミネツセンスデバイス |
JP3290375B2 (ja) * | 1997-05-12 | 2002-06-10 | 松下電器産業株式会社 | 有機電界発光素子 |
JP2000098930A (ja) * | 1998-06-10 | 2000-04-07 | Matsushita Electric Ind Co Ltd | ディスプレイデバイス |
JP2000113976A (ja) * | 1998-10-07 | 2000-04-21 | Tdk Corp | 有機el素子 |
JP2000180893A (ja) * | 1998-12-18 | 2000-06-30 | Sony Corp | 電気光学装置、電気光学装置用の駆動基板、及びこれらの製造方法 |
-
2001
- 2001-08-03 JP JP2001236793A patent/JP4566475B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2002117971A (ja) | 2002-04-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6956324B2 (en) | Semiconductor device and manufacturing method therefor | |
JP4566475B2 (ja) | 発光装置の作製方法 | |
JP6549272B2 (ja) | 半導体装置の作製方法 | |
JP4027740B2 (ja) | 半導体装置の作製方法 | |
JP4166455B2 (ja) | 偏光フィルム及び発光装置 | |
US7534700B2 (en) | Method of fabricating a semiconductor device having a film in contact with a debonded layer | |
JP5277263B2 (ja) | 発光装置の作製方法 | |
US6963084B2 (en) | Semiconductor device having a storage capacitor | |
JP4527068B2 (ja) | 剥離方法、半導体装置の作製方法、及び電子書籍の作製方法 | |
JP5127103B2 (ja) | 発光装置及び電子機器 | |
JP4567282B2 (ja) | 発光装置の作製方法 | |
JP4754677B2 (ja) | 半導体装置の作製方法 | |
JP4267394B2 (ja) | 剥離方法、及び半導体装置の作製方法 | |
JP4986351B2 (ja) | 半導体装置 | |
JP4079655B2 (ja) | 半導体装置およびその作製方法 | |
JP4602035B2 (ja) | 半導体装置の作製方法 | |
JP4593256B2 (ja) | 半導体装置の作製方法 | |
JP5202673B2 (ja) | 半導体装置の作製方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080522 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080522 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100706 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100714 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100803 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100804 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130813 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130813 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |