JP4565202B2 - 中性子散乱を用いた構造マッピング法 - Google Patents
中性子散乱を用いた構造マッピング法 Download PDFInfo
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- JP4565202B2 JP4565202B2 JP2004255146A JP2004255146A JP4565202B2 JP 4565202 B2 JP4565202 B2 JP 4565202B2 JP 2004255146 A JP2004255146 A JP 2004255146A JP 2004255146 A JP2004255146 A JP 2004255146A JP 4565202 B2 JP4565202 B2 JP 4565202B2
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M.Strobl,W.Treimer,A.Hilger,「(中性子)電算化トモグラフィ用小角散乱シグナル」Applied PhysicsLetters,2004年7月、85、p.488−490
図1に示すように、比較的大きな試料3に対して、入射コリメーター1及びスリット2を通して入射中性子ビームを0.01から10mmと絞り、試料側をビームに対して正確に3次元的に移動させることで、試料中の特定の箇所にパルス中性子ビームを直線的に通過させる。その状態を、試料と中性子カウンター5との間に置いたコリメーター4により試料の見込み角(試料を見る領域)を絞り、更に必要に応じて中性子カウンター前にスリット6を置くことにより、パルス中性子ビームが通過した線上の特定の箇所のみの散乱中性子をカウントする。
(発明の効果)
以上の説明のとおり、本発明によって、試料中の部分的な構造情報が得られるようになり、アモルファス中の相分離の検出や異なるアモルファス相の分布、又結晶性物質についても、結晶子(グレイン)の方位の分布、同じ組成でも構造が異なる相の分布、磁性体の磁区の分布、超伝導体中の磁束の3次元分布など、今までの中性子ラジオグラフィやトモグラフィでは検出できなかった実空間構造分布に関する情報が得られるようになる。
ア:モノクロメーター、イ:スリット、ウ:試料、エ:アナライザー、オ:中性子カウンター
A:銅、B:鉄
Claims (1)
- パルス中性子源からの中性子ビームを絞り、試料を3次元的に移動させて、試料の特定の箇所にパルス中性子ビームを直線的に通過させ、当該パルス中性子ビームが通過した線上の特定の箇所のみの散乱中性子をカウントして中性子散乱情報を得て、当該中性子散乱情報を予め求めておいた標準試料の測定結果から得られる絶対散乱強度によって規格化した後、フーリエ変換により実空間の相関関数情報を算出して、結晶構造情報の3次元マッピングを行う方法。
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JP2006071449A JP2006071449A (ja) | 2006-03-16 |
JP4565202B2 true JP4565202B2 (ja) | 2010-10-20 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4811862B2 (ja) * | 2006-06-19 | 2011-11-09 | 独立行政法人日本原子力研究開発機構 | 散乱中性子線を利用した3次元動体可視化計測方法及びその装置 |
JP5403728B2 (ja) * | 2007-11-21 | 2014-01-29 | 国立大学法人東北大学 | 中性子回折装置 |
JP5347921B2 (ja) * | 2009-07-27 | 2013-11-20 | 株式会社リコー | トナー挙動可視化装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02118254U (ja) * | 1989-03-07 | 1990-09-21 | ||
JPH0311547A (ja) * | 1989-06-09 | 1991-01-18 | Hitachi Ltd | 表面計測方法および装置 |
JPH0720067A (ja) * | 1993-07-01 | 1995-01-24 | Nec Corp | 結晶構造決定方法 |
JPH0743498A (ja) * | 1993-07-30 | 1995-02-14 | Seiko Seiki Co Ltd | 中性子チョッパのコリメータおよびその製造方法 |
JP2002228604A (ja) * | 2001-01-31 | 2002-08-14 | Rigaku Corp | X線装置 |
JP2003098124A (ja) * | 2001-09-21 | 2003-04-03 | Rikogaku Shinkokai | X線回折方法および中性子線回折方法 |
JP2006010356A (ja) * | 2004-06-22 | 2006-01-12 | Japan Nuclear Cycle Development Inst States Of Projects | パルス中性子透過法による非破壊分析方法及び装置 |
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02118254U (ja) * | 1989-03-07 | 1990-09-21 | ||
JPH0311547A (ja) * | 1989-06-09 | 1991-01-18 | Hitachi Ltd | 表面計測方法および装置 |
JPH0720067A (ja) * | 1993-07-01 | 1995-01-24 | Nec Corp | 結晶構造決定方法 |
JPH0743498A (ja) * | 1993-07-30 | 1995-02-14 | Seiko Seiki Co Ltd | 中性子チョッパのコリメータおよびその製造方法 |
JP2002228604A (ja) * | 2001-01-31 | 2002-08-14 | Rigaku Corp | X線装置 |
JP2003098124A (ja) * | 2001-09-21 | 2003-04-03 | Rikogaku Shinkokai | X線回折方法および中性子線回折方法 |
JP2006010356A (ja) * | 2004-06-22 | 2006-01-12 | Japan Nuclear Cycle Development Inst States Of Projects | パルス中性子透過法による非破壊分析方法及び装置 |
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