JP4544459B2 - パーティクル検出方法及びパーティクル検出プログラム - Google Patents

パーティクル検出方法及びパーティクル検出プログラム Download PDF

Info

Publication number
JP4544459B2
JP4544459B2 JP2004347000A JP2004347000A JP4544459B2 JP 4544459 B2 JP4544459 B2 JP 4544459B2 JP 2004347000 A JP2004347000 A JP 2004347000A JP 2004347000 A JP2004347000 A JP 2004347000A JP 4544459 B2 JP4544459 B2 JP 4544459B2
Authority
JP
Japan
Prior art keywords
scattered light
particle
light intensity
measurement
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004347000A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006153745A (ja
Inventor
進 斉藤
久 磯崎
隆司 柿沼
範剛 西岡
啓 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Topcon Corp
Original Assignee
Tokyo Electron Ltd
Topcon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Topcon Corp filed Critical Tokyo Electron Ltd
Priority to JP2004347000A priority Critical patent/JP4544459B2/ja
Priority to KR1020050115491A priority patent/KR100737219B1/ko
Priority to CN2005101258558A priority patent/CN1789971B/zh
Priority to TW094142123A priority patent/TWI291020B/zh
Priority to US11/289,688 priority patent/US7352461B2/en
Publication of JP2006153745A publication Critical patent/JP2006153745A/ja
Application granted granted Critical
Publication of JP4544459B2 publication Critical patent/JP4544459B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N15/1456—Optical investigation techniques, e.g. flow cytometry without spatial resolution of the texture or inner structure of the particle, e.g. processing of pulse signals
    • G01N15/1459—Optical investigation techniques, e.g. flow cytometry without spatial resolution of the texture or inner structure of the particle, e.g. processing of pulse signals the analysis being performed on a sample stream
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N2015/1486—Counting the particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2004347000A 2004-11-30 2004-11-30 パーティクル検出方法及びパーティクル検出プログラム Expired - Fee Related JP4544459B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004347000A JP4544459B2 (ja) 2004-11-30 2004-11-30 パーティクル検出方法及びパーティクル検出プログラム
KR1020050115491A KR100737219B1 (ko) 2004-11-30 2005-11-30 입자 검출 방법 및 그 방법을 구현하는 프로그램을저장하는 저장 매체
CN2005101258558A CN1789971B (zh) 2004-11-30 2005-11-30 粒子检测方法以及粒子检测设备
TW094142123A TWI291020B (en) 2004-11-30 2005-11-30 Particle detecting method and storage medium storing program for implementing the method
US11/289,688 US7352461B2 (en) 2004-11-30 2005-11-30 Particle detecting method and storage medium storing program for implementing the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004347000A JP4544459B2 (ja) 2004-11-30 2004-11-30 パーティクル検出方法及びパーティクル検出プログラム

Publications (2)

Publication Number Publication Date
JP2006153745A JP2006153745A (ja) 2006-06-15
JP4544459B2 true JP4544459B2 (ja) 2010-09-15

Family

ID=36632223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004347000A Expired - Fee Related JP4544459B2 (ja) 2004-11-30 2004-11-30 パーティクル検出方法及びパーティクル検出プログラム

Country Status (4)

Country Link
JP (1) JP4544459B2 (zh)
KR (1) KR100737219B1 (zh)
CN (1) CN1789971B (zh)
TW (1) TWI291020B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8083862B2 (en) * 2007-03-09 2011-12-27 Tokyo Electron Limited Method and system for monitoring contamination on a substrate
TWI600893B (zh) * 2008-09-05 2017-10-01 愛克斯崔里斯科技有限公司 粒子檢測系統及超音波流體感知器
JP5474609B2 (ja) * 2010-03-02 2014-04-16 東京エレクトロン株式会社 パーティクル数計測方法
FI20105645A0 (fi) * 2010-06-07 2010-06-07 Environics Oy Laite ja menetelmä biologisen materiaalin havaitsemiseksi
JP5876248B2 (ja) * 2011-08-09 2016-03-02 東京エレクトロン株式会社 パーティクルモニタ方法、パーティクルモニタ装置
CN107850527A (zh) * 2015-07-30 2018-03-27 皇家飞利浦有限公司 用于颗粒密度检测的激光传感器
JP6742435B2 (ja) * 2016-12-08 2020-08-19 東京エレクトロン株式会社 信号処理方法及びプログラム
TWI769514B (zh) * 2020-09-01 2022-07-01 家登精密工業股份有限公司 光罩盒潔淨設備

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000146819A (ja) * 1998-11-09 2000-05-26 Mitsubishi Electric Corp 光学式ほこりセンサ光学系

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654288B2 (ja) * 1985-06-17 1994-07-20 富士電機株式会社 微粒子検出装置
JPH03200049A (ja) * 1989-12-28 1991-09-02 Hitachi Electron Eng Co Ltd 走査型微粒子検出装置
US5451787A (en) * 1993-05-04 1995-09-19 Westinghouse Electric Corporation Hazardous air pollutants monitor
US5561515A (en) * 1994-10-07 1996-10-01 Tsi Incorporated Apparatus for measuring particle sizes and velocities
US5701172A (en) * 1995-06-07 1997-12-23 Gas Research Institute Optical flowmeter
DE19628156A1 (de) * 1996-07-12 1998-01-15 Palas Gmbh Vorrichtung und Verfahren zum Messen eines Teilchenstromes in einem Fluid
US5943130A (en) * 1996-10-21 1999-08-24 Insitec, Inc. In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment
JP4320924B2 (ja) * 1999-06-15 2009-08-26 東京エレクトロン株式会社 パーティクル計測装置及び処理装置
US6794671B2 (en) * 2002-07-17 2004-09-21 Particle Sizing Systems, Inc. Sensors and methods for high-sensitivity optical particle counting and sizing
CN2570775Y (zh) * 2002-08-08 2003-09-03 上海市激光技术研究所 液体粒子计数器
CN1216283C (zh) * 2003-01-10 2005-08-24 东南大学 激光散射式粉尘浓度在线测量方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000146819A (ja) * 1998-11-09 2000-05-26 Mitsubishi Electric Corp 光学式ほこりセンサ光学系

Also Published As

Publication number Publication date
KR20060060627A (ko) 2006-06-05
JP2006153745A (ja) 2006-06-15
TW200632302A (en) 2006-09-16
KR100737219B1 (ko) 2007-07-09
CN1789971A (zh) 2006-06-21
CN1789971B (zh) 2010-05-12
TWI291020B (en) 2007-12-11

Similar Documents

Publication Publication Date Title
TWI291020B (en) Particle detecting method and storage medium storing program for implementing the method
KR100853575B1 (ko) 기판 처리 장치, 기판 흡착 방법 및 기억 매체
KR20110025142A (ko) 챔버 내 클리닝 방법
JP2008243937A (ja) 基板処理装置及び基板処理方法
JP2008227063A (ja) プラズマ処理装置及びプラズマ分布補正方法
JP5461759B2 (ja) プラズマ処理装置、プラズマ処理方法及び記憶媒体
US8531664B2 (en) Particle number measurement method
US7231321B2 (en) Method of resetting substrate processing apparatus, storage medium storing program for implementing the method, and substrate processing apparatus
US8231732B2 (en) Cleaning method and substrate processing apparatus
US20080216959A1 (en) Plasma processing apparatus
JP2006145347A (ja) 気中粒子監視装置および真空処理装置
TWI358768B (zh)
JP2011233713A (ja) プラズマ処理方法及びプラズマ処理装置
JP4972277B2 (ja) 基板処理装置の復帰方法、該装置の復帰プログラム、及び基板処理装置
US7352461B2 (en) Particle detecting method and storage medium storing program for implementing the method
TWI652479B (zh) 基板處理裝置及臭氧氣體濃度之異常偵測方法
JP2007103465A (ja) プラズマ処理室
JP2009212293A (ja) 基板処理装置用の部品及び基板処理装置
KR101163913B1 (ko) 처리 개시 가부 판정 방법 및 기억 매체
US7637143B2 (en) Substrate processing apparatus and analysis method therefor
US20240079222A1 (en) Surface modifying apparatus and bonding strength determination method
JP5638682B2 (ja) プラズマ処理装置、プラズマ処理方法及び記憶媒体
JP5497091B2 (ja) 基板処理方法
JP4885585B2 (ja) プラズマ処理装置、プラズマ処理方法及び記憶媒体
JP2006210461A (ja) プロセス装置の洗浄方法、該方法を実行するためのプログラム、及び記憶媒体

Legal Events

Date Code Title Description
RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20060427

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071127

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071227

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20071227

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100601

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100607

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100623

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130709

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130709

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130709

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees