JP4522142B2 - 露光装置、露光方法、及び基板製造方法 - Google Patents

露光装置、露光方法、及び基板製造方法 Download PDF

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JP4522142B2
JP4522142B2 JP2004147250A JP2004147250A JP4522142B2 JP 4522142 B2 JP4522142 B2 JP 4522142B2 JP 2004147250 A JP2004147250 A JP 2004147250A JP 2004147250 A JP2004147250 A JP 2004147250A JP 4522142 B2 JP4522142 B2 JP 4522142B2
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substrate
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JP2005331542A (ja
JP2005331542A5 (enExample
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亮二 根本
保彦 原
順一 森
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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JP2004147250A 2004-05-18 2004-05-18 露光装置、露光方法、及び基板製造方法 Expired - Fee Related JP4522142B2 (ja)

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JP2005331542A JP2005331542A (ja) 2005-12-02
JP2005331542A5 JP2005331542A5 (enExample) 2007-05-10
JP4522142B2 true JP4522142B2 (ja) 2010-08-11

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006100590A (ja) * 2004-09-29 2006-04-13 Nsk Ltd 近接露光装置
JP4808676B2 (ja) * 2007-05-30 2011-11-02 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
US8174671B2 (en) 2007-06-21 2012-05-08 Asml Netherlands B.V. Lithographic projection apparatus and method for controlling a support structure
US7804579B2 (en) 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
JP2010276901A (ja) * 2009-05-29 2010-12-09 Hitachi High-Technologies Corp 露光装置、露光装置のチャック位置検出方法、及び表示用パネル基板の製造方法
JP2011124346A (ja) * 2009-12-09 2011-06-23 Canon Inc インプリント装置及び物品の製造方法
JP5574291B2 (ja) * 2010-03-03 2014-08-20 Ｎｓｋテクノロジー株式会社 露光装置
JP5441800B2 (ja) * 2010-04-08 2014-03-12 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の基板位置決め方法、及び表示用パネル基板の製造方法、並びに光学式変位計を用いた微小角度検出方法
JP5748141B2 (ja) * 2011-05-31 2015-07-15 株式会社ブイ・テクノロジー 露光装置
JP5687165B2 (ja) * 2011-09-19 2015-03-18 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の基板位置決め方法、及び表示用パネル基板の製造方法
KR102776950B1 (ko) * 2019-11-20 2025-03-05 캐논 톡키 가부시키가이샤 얼라인먼트 기구, 얼라인먼트 방법, 성막장치 및 성막 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63158404A (ja) * 1987-08-10 1988-07-01 Nikon Corp 転写装置の位置合わせ装置
JPH06267816A (ja) * 1993-03-16 1994-09-22 Dainippon Screen Mfg Co Ltd 近接露光装置のマスクセッティング機構
JPH07253304A (ja) * 1994-03-15 1995-10-03 Nikon Corp 多軸位置決めユニットおよびこれにおける測長方法
JP2000035676A (ja) * 1998-05-15 2000-02-02 Nippon Seiko Kk 分割逐次近接露光装置
JP3936546B2 (ja) * 2001-03-30 2007-06-27 株式会社日立ハイテクノロジーズ 露光装置及びその装置における基板位置決め方法並びにフラットディスプレイパネルの製造方法

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