JP4495970B2 - 化学的蒸気浸透による基材の緻密化方法および装置 - Google Patents

化学的蒸気浸透による基材の緻密化方法および装置 Download PDF

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Publication number
JP4495970B2
JP4495970B2 JP2003560261A JP2003560261A JP4495970B2 JP 4495970 B2 JP4495970 B2 JP 4495970B2 JP 2003560261 A JP2003560261 A JP 2003560261A JP 2003560261 A JP2003560261 A JP 2003560261A JP 4495970 B2 JP4495970 B2 JP 4495970B2
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duct
housing
longitudinal end
reaction gas
inlet
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Japanese (ja)
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JP2005514524A5 (https=
JP2005514524A (ja
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ブリューノ・ベルナール
ステファーヌ・グジャール
セバスティアン・ベルトラン
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Safran Ceramics SA
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SNECMA Propulsion Solide SA
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/71—Ceramic products containing macroscopic reinforcing agents
    • C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
    • C04B35/80—Fibres, filaments, whiskers, platelets, or the like
    • C04B35/83—Carbon fibres in a carbon matrix
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/10—Chemical vapor infiltration, i.e. CVI

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Braking Arrangements (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Reinforced Plastic Materials (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
JP2003560261A 2002-01-15 2003-01-14 化学的蒸気浸透による基材の緻密化方法および装置 Expired - Lifetime JP4495970B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0200412A FR2834713B1 (fr) 2002-01-15 2002-01-15 Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur
PCT/FR2003/000097 WO2003060183A1 (fr) 2002-01-15 2003-01-14 Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur

Publications (3)

Publication Number Publication Date
JP2005514524A JP2005514524A (ja) 2005-05-19
JP2005514524A5 JP2005514524A5 (https=) 2006-01-05
JP4495970B2 true JP4495970B2 (ja) 2010-07-07

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JP2003560261A Expired - Lifetime JP4495970B2 (ja) 2002-01-15 2003-01-14 化学的蒸気浸透による基材の緻密化方法および装置

Country Status (13)

Country Link
US (1) US7691440B2 (https=)
EP (1) EP1466031B1 (https=)
JP (1) JP4495970B2 (https=)
KR (1) KR100985377B1 (https=)
CN (1) CN1244714C (https=)
AT (1) ATE488616T1 (https=)
AU (1) AU2003216719A1 (https=)
CA (1) CA2445501A1 (https=)
DE (1) DE60334970D1 (https=)
FR (1) FR2834713B1 (https=)
RU (1) RU2293795C2 (https=)
UA (1) UA76987C2 (https=)
WO (1) WO2003060183A1 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2881145B1 (fr) * 2005-01-24 2007-11-23 Snecma Propulsion Solide Sa Procede d'infiltration chimique en phase gazeuse pour la densification de substrats poreux par du carbone pyrolytique
FR2882064B1 (fr) * 2005-02-17 2007-05-11 Snecma Propulsion Solide Sa Procede de densification de substrats poreux minces par infiltration chimique en phase vapeur et dispositif de chargement de tels substrats
CN1304912C (zh) * 2005-02-21 2007-03-14 西北工业大学 碳/碳复合材料热梯度化学气相渗透过程温度自动控制器
CN101671189B (zh) * 2009-09-23 2012-07-18 北京航空航天大学 国产炭纤维快速定向渗积制备高性能炭基复合材料的方法
CN102953049B (zh) * 2011-08-25 2015-07-08 沈阳金研机床工具有限公司 化学气相沉积法涂层装置
FR2980486B1 (fr) 2011-09-28 2013-10-11 Snecma Propulsion Solide Dispositif de chargement pour la densification par infiltration chimique en phase vapeur en flux dirige de substrats poreux de forme tridimensionnelle
FR2993044B1 (fr) * 2012-07-04 2014-08-08 Herakles Dispositif de chargement et installation pour la densification de preformes poreuses tronconiques et empilables
FR2993555B1 (fr) * 2012-07-19 2015-02-20 Herakles Installation d'infiltration chimique en phase vapeur a haute capacite de chargement
CN102964144B (zh) * 2012-11-19 2014-04-02 西北工业大学 一种提高碳/碳复合材料表面涂层抗氧化性能的方法
FR3004732B1 (fr) * 2013-04-18 2015-05-08 Herakles Outillage de maintien, chargement et installation pour la densification de preformes poreuses de revolution
KR101589965B1 (ko) * 2014-02-26 2016-02-05 (주) 데크카본 밀도화 장비
FR3018526B1 (fr) * 2014-03-14 2021-06-11 Herakles Installation de densification cvi comprenant une zone de prechauffage a forte capacite
US9834842B2 (en) 2015-05-15 2017-12-05 Goodrich Corporation Slotted seal plates and slotted preforms for chemical vapor deposition densification
MY190445A (en) 2015-08-21 2022-04-21 Flisom Ag Homogeneous linear evaporation source
TWI624554B (zh) * 2015-08-21 2018-05-21 弗里松股份有限公司 蒸發源
US10407769B2 (en) 2016-03-18 2019-09-10 Goodrich Corporation Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces
CN108088247B (zh) * 2017-12-28 2019-08-13 德淮半导体有限公司 炉管装置
US10731252B2 (en) * 2018-05-25 2020-08-04 Rolls-Royce High Temperature Composites Apparatus and method for coating specimens
FR3083229B1 (fr) 2018-06-27 2020-09-11 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
FR3084672B1 (fr) 2018-08-03 2020-10-16 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
FR3084892B1 (fr) 2018-08-10 2020-11-06 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaire poreux
FR3095213B1 (fr) * 2019-04-19 2022-12-23 Safran Ceram Installation de densification CVI
FR3129954B1 (fr) * 2021-12-06 2023-12-15 Safran Ceram Installation d’infiltration chimique en phase gazeuse à double chambre de réaction
US12000046B1 (en) * 2021-12-29 2024-06-04 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US11932941B1 (en) 2021-12-29 2024-03-19 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US12078417B1 (en) 2021-12-29 2024-09-03 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
FR3132718A1 (fr) 2022-02-16 2023-08-18 Safran Landing Systems Procédé de densification par infiltration chimique en phase gazeuse avec des plateaux monopiles pour un flux semi-forcé
FR3132717B1 (fr) 2022-02-16 2024-02-16 Safran Landing Systems Outillage des plateaux multipiles pour un flux semi-forcé
US12410520B2 (en) 2022-09-30 2025-09-09 Rtx Corporation Stacking tool fixture for forced flow chemical vapor infiltration
WO2025171270A1 (en) * 2024-02-09 2025-08-14 Rtx Corporation Chemical vapor infiltration gas inlet injector plate

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US2729190A (en) * 1951-10-08 1956-01-03 Pawlyk Peter Apparatus for plating the interior of hollow objects
US4580524A (en) * 1984-09-07 1986-04-08 The United States Of America As Represented By The United States Department Of Energy Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition
RU1580873C (ru) * 1988-05-23 1994-11-30 Колмакова Тамара Павловна Устройство для осаждения слоев из газовой фазы
JP2839621B2 (ja) * 1990-02-13 1998-12-16 株式会社東芝 半導体製造用熱拡散装置
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
US5480678A (en) * 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
EP0832863B1 (en) * 1994-11-16 2002-04-03 The B.F. Goodrich Company Pressure gradient CVI/CVD apparatus, process, and product
FR2733254B1 (fr) * 1995-04-18 1997-07-18 Europ Propulsion Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires
FR2754813B1 (fr) * 1996-10-18 1999-01-15 Europ Propulsion Densification de substrats poreux disposes en piles annulaires par infiltration chimique en phase vapeur a gradient de temperature
KR100360401B1 (ko) * 2000-03-17 2002-11-13 삼성전자 주식회사 슬릿형 공정가스 인입부와 다공구조의 폐가스 배출부를포함하는 공정튜브 및 반도체 소자 제조장치
FR2818291B1 (fr) * 2000-12-19 2003-11-07 Snecma Moteurs Densification de substrats poreux creux par infiltration chimique en phase vapeur
US6953605B2 (en) * 2001-12-26 2005-10-11 Messier-Bugatti Method for densifying porous substrates by chemical vapour infiltration with preheated gas

Also Published As

Publication number Publication date
RU2003131510A (ru) 2005-04-20
EP1466031A1 (fr) 2004-10-13
UA76987C2 (en) 2006-10-16
WO2003060183A1 (fr) 2003-07-24
CN1511198A (zh) 2004-07-07
FR2834713B1 (fr) 2004-04-02
EP1466031B1 (fr) 2010-11-17
US20040237898A1 (en) 2004-12-02
RU2293795C2 (ru) 2007-02-20
CN1244714C (zh) 2006-03-08
DE60334970D1 (de) 2010-12-30
ATE488616T1 (de) 2010-12-15
US7691440B2 (en) 2010-04-06
KR20040095145A (ko) 2004-11-12
AU2003216719A1 (en) 2003-07-30
FR2834713A1 (fr) 2003-07-18
KR100985377B1 (ko) 2010-10-04
JP2005514524A (ja) 2005-05-19
CA2445501A1 (en) 2003-07-24

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