JP4426302B2 - 化学的蒸気浸透によって多孔質基材を緻密化するための方法と装置 - Google Patents
化学的蒸気浸透によって多孔質基材を緻密化するための方法と装置 Download PDFInfo
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- JP4426302B2 JP4426302B2 JP2003556573A JP2003556573A JP4426302B2 JP 4426302 B2 JP4426302 B2 JP 4426302B2 JP 2003556573 A JP2003556573 A JP 2003556573A JP 2003556573 A JP2003556573 A JP 2003556573A JP 4426302 B2 JP4426302 B2 JP 4426302B2
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/71—Ceramic products containing macroscopic reinforcing agents
- C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
- C04B35/83—Carbon fibres in a carbon matrix
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/4557—Heated nozzles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/10—Chemical vapor infiltration, i.e. CVI
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- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Furnace Details (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Tunnel Furnaces (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Carbon And Carbon Compounds (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Description
緻密化のための基材を炉の装填ゾーンに装填する段階と;
反応ガスに含有された1つまたは複数の前駆体ガスから所望のマトリックス材料が形成される温度まで、炉内の基材を温度上昇させるように加熱する段階と;
反応ガスを炉の一方の端部に入れる段階と;
炉内の反応ガスの流動方向における装填ゾーンの上流に位置するガス加熱ゾーンを反応ガスに通過させることによって、反応ガスが炉内に入った後に反応ガスを加熱する段階と;を含む方法によって達成され、
本発明によれば、その方法において:
反応ガスが炉内に入ったときに、反応ガスが、周囲温度と、基材が加熱される温度との間の中間温度に到達するように、反応ガスは炉内に入る前に予熱される。
本発明によれば、当該装置において、
反応ガスが炉に入る前に反応ガスを予熱するように、炉の外側に位置して、炉の少なくとも1つの反応ガス入口で炉に接続された少なくとも1つのガス予熱装置が、設けられる。
Claims (11)
- マトリックス材料用の少なくとも1つのガス状前駆体を含有する反応ガスを使用して、化学的蒸気浸透によって獲得されるマトリックス用の多孔質基材を緻密化する方法であって:
緻密化のための基材を炉の装填ゾーンに装填する段階と;
反応ガスに含有される1つまたは複数の前駆体ガスから所望のマトリックス材料が形成される温度に基材を温度上昇させるように、炉内の基材を加熱する段階と;
反応ガスを炉の一方の端部に入れる段階と;
炉内の反応ガスの流動方向において装填ゾーンの上流の炉内に位置するガス加熱ゾーンを反応ガスに通過させることによって、反応ガスが炉の中に入った後に反応ガスを加熱する段階と;を含み、
反応ガスが炉内に入るときに、周囲温度と、基材が加熱される温度との間の中間温度へ反応ガスが到達するように、反応ガスが炉の中に入る前に予熱される多孔質基材を緻密化する方法において:
多孔質基材が900℃よりも高い温度に高められ、また炉の入口に供給される反応ガスが200℃以上800℃以下の温度にあるように予熱されることを特徴とする多孔質基材を緻密化する方法。 - 炉の入口に供給される反応ガスが200℃以上600℃以下の温度にあるように予熱されることを特徴とする、請求項1に記載の多孔質基材を緻密化する方法。
- 反応ガスが、熱交換器を通過することによって炉の外側で予熱されることを特徴とする、請求項1または2に記載の多孔質基材を緻密化する方法。
- 反応ガスが、炉の内部に存在する圧力にほぼ等しい圧力で炉の外側で予熱されることを特徴とする、請求項1〜3のいずれか一項に記載の多孔質基材を緻密化する方法。
- 反応ガスが、炉の内部に存在する圧力よりも高い圧力で炉の外側で予熱されて、炉の中に入る前に膨張されることを特徴とする、請求項1〜3のいずれか一項に記載の多孔質基材を緻密化する方法。
- 炭素/炭素複合材料から製造されるブレーキディスク用の多孔質環状基材を緻密化するための、請求項1〜5のいずれか一項に記載の多孔質基材を緻密化する方法。
- 基材が1つ以上の環状スタックの形で炉内に装填されて、ガス加熱ゾーンからの反応ガスが、1つまたは複数の環状スタック内部の1つまたは複数の容積と、1つまたは複数の環状スタックの外側の装填ゾーンの容積とによって構成された2つの容積の一方に導かれて、流出ガスが2つの容積の他方から取り出されて炉から排出されることを特徴とする、請求項6に記載の多孔質基材を緻密化する方法。
- 基材がそれらの間に漏洩通路を残すように積み重ねられて、前記2つの容積が互いに連通させられることを特徴とする、請求項7に記載の多孔質基材を緻密化する方法。
- 基材がそれらの間に漏洩通路を残すことなく積み重ねられ、その結果、反応ガスが、基材の気孔を通過することによってのみ前記2つの容積の一方から他方に通過できることを特徴とする、請求項7に記載の多孔質基材を緻密化する方法。
- 炉の壁部を通したそれぞれの通路を介して、反応ガスが環状スタックに個別に送給されることを特徴とする、請求項7〜9のいずれか一項に記載の多孔質基材を緻密化する方法。
- 基材のスタックに送給される反応ガスの予熱温度が、各スタックのために個別に調整されることを特徴とする、請求項10に記載の多孔質基材を緻密化する方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/034,848 US6953605B2 (en) | 2001-12-26 | 2001-12-26 | Method for densifying porous substrates by chemical vapour infiltration with preheated gas |
PCT/FR2002/004554 WO2003056059A1 (fr) | 2001-12-26 | 2002-12-24 | Procede et installation de densification de substrats poreux par infiltration chimique en phase gazeuse |
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JP2005512940A JP2005512940A (ja) | 2005-05-12 |
JP4426302B2 true JP4426302B2 (ja) | 2010-03-03 |
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JP2003556573A Expired - Fee Related JP4426302B2 (ja) | 2001-12-26 | 2002-12-24 | 化学的蒸気浸透によって多孔質基材を緻密化するための方法と装置 |
Country Status (17)
Country | Link |
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US (2) | US6953605B2 (ja) |
EP (1) | EP1458902B1 (ja) |
JP (1) | JP4426302B2 (ja) |
KR (1) | KR100896854B1 (ja) |
CN (1) | CN100371493C (ja) |
AT (1) | ATE340880T1 (ja) |
AU (1) | AU2002364339B2 (ja) |
BR (1) | BR0215313B1 (ja) |
CA (1) | CA2471672C (ja) |
DE (1) | DE60215048T2 (ja) |
ES (1) | ES2274121T3 (ja) |
HU (1) | HUP0402078A2 (ja) |
IL (1) | IL162659A0 (ja) |
MX (1) | MXPA04006329A (ja) |
RU (1) | RU2319682C2 (ja) |
UA (1) | UA78733C2 (ja) |
WO (1) | WO2003056059A1 (ja) |
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2001
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2002
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- 2002-12-24 CA CA2471672A patent/CA2471672C/en not_active Expired - Fee Related
- 2002-12-24 UA UA20040605015A patent/UA78733C2/uk unknown
- 2002-12-24 DE DE60215048T patent/DE60215048T2/de not_active Expired - Lifetime
- 2002-12-24 WO PCT/FR2002/004554 patent/WO2003056059A1/fr active IP Right Grant
- 2002-12-24 HU HU0402078A patent/HUP0402078A2/hu unknown
- 2002-12-24 BR BRPI0215313-0A patent/BR0215313B1/pt not_active IP Right Cessation
- 2002-12-24 AU AU2002364339A patent/AU2002364339B2/en not_active Ceased
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Also Published As
Publication number | Publication date |
---|---|
IL162659A0 (en) | 2005-11-20 |
UA78733C2 (en) | 2007-04-25 |
ES2274121T3 (es) | 2007-05-16 |
BR0215313A (pt) | 2004-10-19 |
DE60215048T2 (de) | 2007-05-10 |
CA2471672A1 (en) | 2003-07-10 |
HUP0402078A2 (hu) | 2005-01-28 |
US6953605B2 (en) | 2005-10-11 |
RU2319682C2 (ru) | 2008-03-20 |
EP1458902A1 (fr) | 2004-09-22 |
RU2004118418A (ru) | 2005-06-10 |
BR0215313B1 (pt) | 2011-11-29 |
EP1458902B1 (fr) | 2006-09-27 |
MXPA04006329A (es) | 2004-10-04 |
CN1608142A (zh) | 2005-04-20 |
ATE340880T1 (de) | 2006-10-15 |
JP2005512940A (ja) | 2005-05-12 |
AU2002364339B2 (en) | 2008-09-04 |
CA2471672C (en) | 2011-03-22 |
WO2003056059A1 (fr) | 2003-07-10 |
US20030118728A1 (en) | 2003-06-26 |
AU2002364339A1 (en) | 2003-07-15 |
US20030205203A1 (en) | 2003-11-06 |
KR100896854B1 (ko) | 2009-05-12 |
KR20040071754A (ko) | 2004-08-12 |
DE60215048D1 (de) | 2006-11-09 |
CN100371493C (zh) | 2008-02-27 |
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