JP4489443B2 - 液晶表示装置の作製方法 - Google Patents
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
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- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
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- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
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- OYQCBJZGELKKPM-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O-2].[Zn+2].[O-2].[In+3] OYQCBJZGELKKPM-UHFFFAOYSA-N 0.000 description 1
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Description
減圧下で液晶または液晶を含む液滴を画素電極に向けて複数噴射し、前記液晶を前記画素電極上に付着させて液晶層を形成することを特徴とする液晶表示装置の作製方法である。
一対の基板と、前記一対の基板間に保持された液晶とを備えた液晶表示装置の作製方法であって、
第1の基板上に設けられた画素部を囲むシール材を形成する工程と、
減圧下で前記シール材で囲まれた領域のみに液晶または液晶を含む液滴を複数噴射する工程と、
前記第1の基板と第2の基板とを貼りあわせる工程と、
貼りあわせた一対の基板を分断する工程と、を有することを特徴とする液晶表示装置の作製方法である。
一対の基板と、前記一対の基板間に保持された液晶とを備えた液晶表示装置の作製方法であって、
減圧下で第1の基板に設けられた画素部のみに液晶または液晶を含む液滴を複数噴射する工程と、
シール材が描画された第2の基板を前記第1の基板に貼りあわせる工程と、
貼りあわせた基板を分断する工程と、を有することを特徴とする液晶表示装置の作製方法である。
一対の基板と、前記一対の基板間に保持された液晶とを備えた液晶表示装置の作製方法であって、
第1の基板または第2の基板にシールを描画する工程と、
減圧下で前記第1の基板に対して液晶または液晶を含む液滴を選択的に複数噴射して第1の液晶層を形成する工程と、
減圧下で前記第2の基板に対して液晶または液晶を含む液滴を選択的に複数噴射して第2の液晶層を形成する工程と、
前記第1の液晶層と前記第2の液晶層とが接して重なるように一対の基板を貼りあわせることを特徴とする液晶表示装置の作製方法である。
一対の基板と、前記一対の基板間に保持された液晶とを備えた液晶表示装置であって、
一対の基板は、画素部を囲む第1のシール材と、該第1のシール材を囲む第2のシール材とで貼り合わされており、
前記第1のシール材で囲まれた領域に液晶が保持され、前記第1のシール材と前記第2のシール材との間には充填材が充填されていることを特徴とする液晶表示装置である。
ここでは、大面積基板を用い、パネル4枚取りの作製例を図1〜図4に示す。
ここでは、実施の形態1と異なるパネルの作製方法を図5に示す。
Claims (8)
- 画素部を設けた第1の基板と、第2の基板とからなる一対の基板の間に液晶を保持した液晶表示装置の作製方法であって、
前記第1の基板上に前記画素部を囲むシール材を形成し、
減圧下で前記シール材で囲まれた領域に液晶または液晶を含む液滴を複数噴射し、
前記第1の基板と前記第2の基板とを貼りあわせ、
前記貼りあわせた一対の基板を分断することを特徴とする液晶表示装置の作製方法。 - 請求項1において、
前記液晶または液晶を含む液滴を複数噴射する工程は、インクジェット装置を用いて行われることを特徴とする液晶表示装置の作製方法。 - 請求項1または請求項2において、
前記貼りあわせる工程は、減圧下で行われることを特徴とする液晶表示装置の作製方法。 - 請求項1乃至請求項3のいずれか一において、
前記減圧下とは、1×102〜2×104Paの不活性雰囲気中であることを特徴とする液晶表示装置の作製方法。 - 請求項1乃至請求項3のいずれか一において、
前記減圧下とは、1〜5×104Paの真空中であることを特徴とする液晶表示装置の作製方法。 - 請求項1乃至請求項5のいずれか一において、
前記液晶または液晶を含む液滴を間欠的に付着させることを特徴とする液晶表示装置の作製方法。 - 請求項1乃至請求項5のいずれか一において、
前記液晶または液晶を含む液滴を連続的に付着させることを特徴とする液晶表示装置の作製方法。 - 請求項1乃至請求項7のいずれか一において、
前記液晶に光硬化材料または熱硬化材料を混合させることを特徴とする液晶表示装置の作製方法。
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JP2004007446A JP4489443B2 (ja) | 2003-01-16 | 2004-01-15 | 液晶表示装置の作製方法 |
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JP2004007446A JP4489443B2 (ja) | 2003-01-16 | 2004-01-15 | 液晶表示装置の作製方法 |
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JP2009184277A Division JP2009258762A (ja) | 2003-01-16 | 2009-08-07 | 液晶表示装置およびその作製方法 |
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JP2004240418A JP2004240418A (ja) | 2004-08-26 |
JP2004240418A5 JP2004240418A5 (ja) | 2007-03-01 |
JP4489443B2 true JP4489443B2 (ja) | 2010-06-23 |
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Families Citing this family (4)
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JP4508787B2 (ja) * | 2004-08-31 | 2010-07-21 | 株式会社日立プラントテクノロジー | 液晶パネルの生産設備 |
JP2007294696A (ja) * | 2006-04-25 | 2007-11-08 | Sony Chemical & Information Device Corp | 電気化学セルの製造方法 |
KR100949126B1 (ko) * | 2008-01-22 | 2010-03-25 | 주식회사 탑 엔지니어링 | 액정 디스플레이 패널의 액정 도포 방법 및 액정 도포 장치 |
JP2009251444A (ja) * | 2008-04-09 | 2009-10-29 | Dainippon Printing Co Ltd | 液晶表示素子の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001117105A (ja) * | 1999-10-18 | 2001-04-27 | Toshiba Corp | 液晶表示装置の製造方法 |
JP2002318378A (ja) * | 2001-04-22 | 2002-10-31 | Mikuni Denshi Kk | 液晶表示装置の組み立て方法とその装置 |
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JP3978241B2 (ja) * | 1995-07-10 | 2007-09-19 | シャープ株式会社 | 液晶表示パネル及びその製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2001117105A (ja) * | 1999-10-18 | 2001-04-27 | Toshiba Corp | 液晶表示装置の製造方法 |
JP2002318378A (ja) * | 2001-04-22 | 2002-10-31 | Mikuni Denshi Kk | 液晶表示装置の組み立て方法とその装置 |
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