JP4464958B2 - プリフォーム製造のための合成シリカガラス管、鉛直延伸プロセスにおけるその製造方法およびその管の使用 - Google Patents
プリフォーム製造のための合成シリカガラス管、鉛直延伸プロセスにおけるその製造方法およびその管の使用 Download PDFInfo
- Publication number
- JP4464958B2 JP4464958B2 JP2006504744A JP2006504744A JP4464958B2 JP 4464958 B2 JP4464958 B2 JP 4464958B2 JP 2006504744 A JP2006504744 A JP 2006504744A JP 2006504744 A JP2006504744 A JP 2006504744A JP 4464958 B2 JP4464958 B2 JP 4464958B2
- Authority
- JP
- Japan
- Prior art keywords
- tube
- silica glass
- scavenging gas
- glass tube
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 55
- 238000000034 method Methods 0.000 title claims description 55
- 230000008569 process Effects 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 230000002000 scavenging effect Effects 0.000 claims description 55
- 239000002344 surface layer Substances 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 21
- 238000005253 cladding Methods 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000010410 layer Substances 0.000 claims description 13
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 230000009467 reduction Effects 0.000 claims description 5
- 230000002829 reductive effect Effects 0.000 claims description 5
- 230000003746 surface roughness Effects 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000002274 desiccant Substances 0.000 claims description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
- 229910005793 GeO 2 Inorganic materials 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- 229910052805 deuterium Inorganic materials 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 238000000465 moulding Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 52
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 38
- 229910052757 nitrogen Inorganic materials 0.000 description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- 239000000835 fiber Substances 0.000 description 8
- 239000000356 contaminant Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000004886 process control Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000004071 soot Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010348 incorporation Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012369 In process control Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000010965 in-process control Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000012681 fiber drawing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- -1 hydroxyl ions Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01225—Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
- C03B37/0124—Means for reducing the diameter of rods or tubes by drawing, e.g. for preform draw-down
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01884—Means for supporting, rotating and translating tubes or rods being formed, e.g. lathes
- C03B37/01892—Deposition substrates, e.g. tubes, mandrels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10312760 | 2003-03-21 | ||
DE10312543 | 2003-03-22 | ||
PCT/EP2004/002882 WO2004083141A1 (de) | 2003-03-21 | 2004-03-19 | Rohr aus synthetischem quarzglas für die herstellung einer vorform, verfahren für seine herstellung in einem vertikalziehverfahren und verwendung des rohres |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006520738A JP2006520738A (ja) | 2006-09-14 |
JP4464958B2 true JP4464958B2 (ja) | 2010-05-19 |
Family
ID=33030909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006504744A Expired - Lifetime JP4464958B2 (ja) | 2003-03-21 | 2004-03-19 | プリフォーム製造のための合成シリカガラス管、鉛直延伸プロセスにおけるその製造方法およびその管の使用 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20060191294A1 (de) |
JP (1) | JP4464958B2 (de) |
KR (1) | KR101166205B1 (de) |
DE (1) | DE10393680B4 (de) |
WO (1) | WO2004083141A1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10393680B4 (de) * | 2003-03-21 | 2009-03-26 | Heraeus Quarzglas Gmbh & Co. Kg | Rohr aus synthetischem Quarzglas für die Herstellung einer Vorform, Verfahren für seine Herstellung in einem Vertikalziehverfahren und Verwendung des Rohres |
JP4385681B2 (ja) * | 2003-08-11 | 2009-12-16 | 住友電気工業株式会社 | 光ファイバ母材の製造方法及び光ファイバの製造方法 |
JP4929457B2 (ja) * | 2006-07-28 | 2012-05-09 | 独立行政法人国立高等専門学校機構 | シリカガラス材料 |
US7946135B2 (en) * | 2007-01-02 | 2011-05-24 | Draka Comteq, B.V. | Extended-baking process for glass deposition tubes |
JP4995068B2 (ja) * | 2007-12-28 | 2012-08-08 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引上げ用石英ガラスルツボ |
DE102008047736B3 (de) * | 2008-07-07 | 2010-01-21 | Heraeus Quarzglas Gmbh & Co. Kg | Biegeunempfindliche optische Faser, Quarzglasrohr als Halbzeug für seine Herstellung sowie Verfahren zur Herstellung der Faser |
DE102009014418B3 (de) * | 2009-03-26 | 2010-04-15 | Heraeus Quarzglas Gmbh & Co. Kg | Ziehverfahren zur Herstellung zylinderförmiger Bauteile aus Quarzglas |
JP5528488B2 (ja) * | 2012-02-09 | 2014-06-25 | 信越化学工業株式会社 | 光ファイバ母材の延伸方法 |
DE102013107435B4 (de) * | 2013-07-12 | 2015-01-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglas-Großrohres |
EP3088370B1 (de) * | 2015-04-28 | 2018-09-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren und vorrichtung zur herstellung eines rohres aus glas |
EP3112323B1 (de) | 2015-07-03 | 2021-09-01 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines substratrohres aus quarzglas |
NL2015161B1 (en) * | 2015-07-13 | 2017-02-01 | Draka Comteq Bv | A method for preparing a primary preform by etching and collapsing a deposited tube. |
CN110606652A (zh) * | 2018-06-15 | 2019-12-24 | 中天科技精密材料有限公司 | 玻璃基管生产系统及生产方法 |
CN108545924B (zh) * | 2018-06-29 | 2021-02-02 | 成都富通光通信技术有限公司 | 一种制作光纤预制棒的缩棒方法 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
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US3652710A (en) * | 1969-07-01 | 1972-03-28 | Gen Electric | Curable polyaryleneoxide compositions |
FR2220475B1 (de) * | 1973-03-08 | 1977-08-12 | Quartz & Silice | |
US3933454A (en) * | 1974-04-22 | 1976-01-20 | Corning Glass Works | Method of making optical waveguides |
US4165223A (en) * | 1978-03-06 | 1979-08-21 | Corning Glass Works | Method of making dry optical waveguides |
EP0111710B1 (de) * | 1982-11-16 | 1989-08-30 | Schott-Ruhrglas Gmbh | Verfahren zum Herstellen von Rohrfläschchen |
US4685945A (en) * | 1984-02-06 | 1987-08-11 | Friedemann Freund | Method of processing high purity low-OH vitreous silica fibers |
US4632684A (en) * | 1984-07-31 | 1986-12-30 | Itt Corporation | Method of and apparatus for making optical preforms from tubular bodies |
JPS6172644A (ja) * | 1984-09-19 | 1986-04-14 | Sumitomo Electric Ind Ltd | 低損失光フアイバの製造方法 |
US4861650A (en) * | 1986-12-18 | 1989-08-29 | Monsanto Company | Polyimide laminates |
GB8819693D0 (en) * | 1988-08-18 | 1988-09-21 | Tsl Group Plc | Improved vitreous silica articles |
DE3913875C1 (de) * | 1989-04-27 | 1990-08-09 | Heraeus Quarzschmelze Gmbh, 6450 Hanau, De | |
CA2024189A1 (en) * | 1989-10-23 | 1991-04-24 | Kam W. Ho | Bismaleimide resin compositions |
US5438105A (en) * | 1990-04-27 | 1995-08-01 | Toho Rayon Co., Ltd. | Polyamic acid composite, polyimide composite and processes for producing the same |
FR2690611B1 (fr) * | 1992-04-30 | 1996-02-02 | Moulinex Sa | Appareil menager tel qu'un mixeur equipe d'un dispositif de securite. |
JP2000203860A (ja) * | 1992-11-19 | 2000-07-25 | Shinetsu Quartz Prod Co Ltd | 大型石英ガラスプリフォ−ム |
ES2120467T3 (es) | 1992-11-19 | 1998-11-01 | Shinetsu Quartz Prod | Procedimiento para fabricar un tubo de vidrio de cuarzo de gran tamaño, una preforma y una fibra optica. |
JP2980501B2 (ja) * | 1992-11-19 | 1999-11-22 | 信越石英株式会社 | 大型石英ガラス管、大型石英ガラスプリフォ−ムおよびそれらの製造方法 |
DE19505929C1 (de) * | 1995-02-21 | 1996-03-28 | Heraeus Quarzglas | Optisches Bauteil |
US5745631A (en) * | 1996-01-26 | 1998-04-28 | Irvine Sensors Corporation | Self-aligning optical beam system |
JP3527707B2 (ja) * | 1998-06-25 | 2004-05-17 | サムスン エレクトロニクス カンパニー リミテッド | Oh遮断層を具備した光ファイバのプレフォーム及びその製造方法 |
JP2000119034A (ja) * | 1998-10-08 | 2000-04-25 | Shinetsu Quartz Prod Co Ltd | 光ファイバ用石英ガラス母材の製造方法 |
EP1000908B1 (de) * | 1998-10-08 | 2005-12-28 | Heraeus Tenevo GmbH | Verfahren zum Herstellen einer Vorform aus Quarzglas für optische Fasern und das dafür verwendete Quarzglasrohr |
JP4565221B2 (ja) * | 1998-10-09 | 2010-10-20 | 信越石英株式会社 | 光ファイバ用母材 |
DE19852704A1 (de) * | 1998-11-16 | 2000-05-18 | Heraeus Quarzglas | Verfahren zur Herstellung einer Vorform für eine optische Faser und für die Durchführung des Verfahrens geeignetes Substratrohr |
KR100306381B1 (ko) * | 1998-12-10 | 2001-11-30 | 윤종용 | 증착튜브의응축및클로징을위한광섬유모재제조장치및그방법 |
DE19856892C2 (de) * | 1998-12-10 | 2001-03-15 | Heraeus Quarzglas | Verfahren zur Herstellung eines Rohres aus glasigem Werkstoff, insbesondere aus Quarzglas |
NL1015405C2 (nl) * | 2000-06-09 | 2001-12-12 | Draka Fibre Technology Bv | Single mode optische vezel en werkwijze voor het vervaardigen van een single mode optische vezel. |
JP3800930B2 (ja) * | 2000-06-26 | 2006-07-26 | 住友金属工業株式会社 | 石英ガラスシリンダおよび石英ガラス管とその製造方法 |
US6820850B2 (en) * | 2002-04-24 | 2004-11-23 | Clarence Michael Coleman | Support for washer or dryer |
DE10332176B4 (de) * | 2002-07-24 | 2007-04-05 | Schott Ag | Verfahren zur Verminderung der Kontamination mit Alkaliverbindungen der Innenoberfläche von aus Glasrohr hergestellte Hohlkörpern aus Glas und Behälter, sowie dessen Verwendung für medizinische Zwecke |
DE10393680B4 (de) * | 2003-03-21 | 2009-03-26 | Heraeus Quarzglas Gmbh & Co. Kg | Rohr aus synthetischem Quarzglas für die Herstellung einer Vorform, Verfahren für seine Herstellung in einem Vertikalziehverfahren und Verwendung des Rohres |
-
2004
- 2004-03-19 DE DE10393680T patent/DE10393680B4/de not_active Expired - Lifetime
- 2004-03-19 WO PCT/EP2004/002882 patent/WO2004083141A1/de active Application Filing
- 2004-03-19 JP JP2006504744A patent/JP4464958B2/ja not_active Expired - Lifetime
- 2004-03-19 US US10/550,049 patent/US20060191294A1/en not_active Abandoned
- 2004-03-19 KR KR1020057017674A patent/KR101166205B1/ko active IP Right Grant
-
2010
- 2010-06-21 US US12/820,001 patent/US20100260949A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2006520738A (ja) | 2006-09-14 |
KR101166205B1 (ko) | 2012-07-18 |
US20060191294A1 (en) | 2006-08-31 |
DE10393680B4 (de) | 2009-03-26 |
WO2004083141A1 (de) | 2004-09-30 |
US20100260949A1 (en) | 2010-10-14 |
DE10393680D2 (de) | 2005-09-29 |
KR20050110689A (ko) | 2005-11-23 |
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