JP4402195B2 - フォトマスク、パターン形成方法及びデバイス製造方法 - Google Patents

フォトマスク、パターン形成方法及びデバイス製造方法 Download PDF

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Publication number
JP4402195B2
JP4402195B2 JP11493999A JP11493999A JP4402195B2 JP 4402195 B2 JP4402195 B2 JP 4402195B2 JP 11493999 A JP11493999 A JP 11493999A JP 11493999 A JP11493999 A JP 11493999A JP 4402195 B2 JP4402195 B2 JP 4402195B2
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Japan
Prior art keywords
pattern
photomask
wafer
regions
forming
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Expired - Fee Related
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JP11493999A
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Japanese (ja)
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JP2000305247A5 (enExample
JP2000305247A (ja
Inventor
靖行 吽野
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Canon Inc
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Canon Inc
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Priority to JP11493999A priority Critical patent/JP4402195B2/ja
Publication of JP2000305247A publication Critical patent/JP2000305247A/ja
Publication of JP2000305247A5 publication Critical patent/JP2000305247A5/ja
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Publication of JP4402195B2 publication Critical patent/JP4402195B2/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11493999A 1999-04-22 1999-04-22 フォトマスク、パターン形成方法及びデバイス製造方法 Expired - Fee Related JP4402195B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11493999A JP4402195B2 (ja) 1999-04-22 1999-04-22 フォトマスク、パターン形成方法及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11493999A JP4402195B2 (ja) 1999-04-22 1999-04-22 フォトマスク、パターン形成方法及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2000305247A JP2000305247A (ja) 2000-11-02
JP2000305247A5 JP2000305247A5 (enExample) 2006-06-01
JP4402195B2 true JP4402195B2 (ja) 2010-01-20

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JP11493999A Expired - Fee Related JP4402195B2 (ja) 1999-04-22 1999-04-22 フォトマスク、パターン形成方法及びデバイス製造方法

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JP (1) JP4402195B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4950411B2 (ja) * 2003-07-01 2012-06-13 大日本印刷株式会社 光学リソグラフィー用ボルテックス位相シフトマスク
US7560197B2 (en) 2004-02-23 2009-07-14 Kabushiki Kaisha Toshiba Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
TW200636820A (en) 2005-04-04 2006-10-16 Adv Lcd Tech Dev Ct Co Ltd Thin film transistor, integrated circuit, liquid crystal display, method of producing thin film transistor, and method of exposure using attenuated type mask
JP2007103108A (ja) * 2005-10-03 2007-04-19 Sii Nanotechnology Inc 集束イオンビームによる加工方法
JP2010102354A (ja) * 2009-12-24 2010-05-06 Dainippon Printing Co Ltd 光学リソグラフィー用ボルテックス位相シフトマスク
WO2012066489A2 (en) * 2010-11-16 2012-05-24 Eulitha A.G. Method and apparatus for printing high-resolution two-dimensional periodic patterns
US20120237858A1 (en) * 2011-03-18 2012-09-20 Nanya Technology Corporation Photomask and a method for determining a pattern of a photomask
JP5757413B2 (ja) * 2011-06-29 2015-07-29 大日本印刷株式会社 位相変調マスク、露光装置および露光方法
JP5838622B2 (ja) * 2011-07-05 2016-01-06 大日本印刷株式会社 露光装置および露光方法

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JP2000305247A (ja) 2000-11-02

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