JP4393899B2 - アトムプローブ装置用試料及びその加工方法 - Google Patents
アトムプローブ装置用試料及びその加工方法 Download PDFInfo
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- JP4393899B2 JP4393899B2 JP2004075873A JP2004075873A JP4393899B2 JP 4393899 B2 JP4393899 B2 JP 4393899B2 JP 2004075873 A JP2004075873 A JP 2004075873A JP 2004075873 A JP2004075873 A JP 2004075873A JP 4393899 B2 JP4393899 B2 JP 4393899B2
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- Prior art keywords
- sample
- fib
- layer
- processing
- needle
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/32—Polishing; Etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3109—Cutting
Description
2 試料固定基板 3 プローブ
4,4a,4b 保護膜 5 仮固定部
6 本固定部
Claims (5)
- 所望観察部位を含む試料をFIBによりブロック状に切り出し、該試料を試料基板上に固定し、前記試料をFIBエッチング加工によって針先形状に加工するアトムプローブ装置用試料の加工方法において、
前記試料を前記試料基板上に固定する工程は、
FIB−CVDによって仮接着するステップと、
前記試料の基部と前記試料基板とにかけてFIBエッチングにより切り込みを入れるステップと、
該切り込み部分にFIB−CVDにより前記試料基板と前記試料とを接着固定するステップとを有するアトムプローブ装置用試料の加工方法。 - 前記試料をFIBエッチング加工によって針先形状に加工する仕上加工は、加速電圧10kV以下のFIBで行い、ダメージ層を浅くすることを特徴とする請求項1に記載のアトムプローブ装置用試料の加工方法。
- 前記仕上加工を加速電圧10kV以下のFIBで行った後、さらに低加速Arイオンミリングで前記ダメージ層を除去する請求項2に記載のアトムプローブ装置用試料の加工方法。
- 針先形状に加工された試料は多層構造の各層の界面の方向が針の長手方向に平行となるように形成されていることを特徴とするアトムプローブ装置用試料。
- FIB装置を用いて所望観察部位を含む試料をブロック状に切り出し、該試料を試料基板上に移送して固定し、前記試料をFIBエッチング加工によって針先形状に加工するアトムプローブ装置用試料の加工方法において、
前記試料の多層構造の各層の界面の方向が針の長手方向に平行となる針先形状にFIBエッチング加工することを特徴とするアトムプローブ装置用試料の加工方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004075873A JP4393899B2 (ja) | 2004-03-17 | 2004-03-17 | アトムプローブ装置用試料及びその加工方法 |
US10/592,844 US7550723B2 (en) | 2004-03-17 | 2005-03-02 | Atom probe apparatus and method for working sample preliminary for the same |
EP05719810.3A EP1731894B1 (en) | 2004-03-17 | 2005-03-02 | Method for a preliminary processing of a sample for an atom probe apparatus and sample and sample substrate prepared by said method |
PCT/JP2005/003495 WO2005090941A1 (ja) | 2004-03-17 | 2005-03-02 | アトムプローブ装置及びその試料予備加工方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004075873A JP4393899B2 (ja) | 2004-03-17 | 2004-03-17 | アトムプローブ装置用試料及びその加工方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009220844A Division JP4902712B2 (ja) | 2009-09-25 | 2009-09-25 | アトムプローブ分析方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005265516A JP2005265516A (ja) | 2005-09-29 |
JP4393899B2 true JP4393899B2 (ja) | 2010-01-06 |
Family
ID=34993819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004075873A Expired - Fee Related JP4393899B2 (ja) | 2004-03-17 | 2004-03-17 | アトムプローブ装置用試料及びその加工方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7550723B2 (ja) |
EP (1) | EP1731894B1 (ja) |
JP (1) | JP4393899B2 (ja) |
WO (1) | WO2005090941A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100799014B1 (ko) * | 2000-11-29 | 2008-01-28 | 에스아이아이 나노 테크놀로지 가부시키가이샤 | 초 미세 입체구조의 제조 방법 및 그 장치 |
WO2007016299A2 (en) * | 2005-07-28 | 2007-02-08 | Imago Scientific Instruments Corporation | Atom probe evaporation processes |
JP4784888B2 (ja) | 2006-11-09 | 2011-10-05 | エスアイアイ・ナノテクノロジー株式会社 | Fibによるアトムプローブ分析用試料の作製方法とそれを実施する装置 |
FR2938963B1 (fr) * | 2008-11-21 | 2010-11-12 | Cameca | Sonde atomique tomographique comportant un generateur electro-optique d'impulsions electriques haute tension. |
JP5281525B2 (ja) * | 2009-09-11 | 2013-09-04 | 一般財団法人電力中央研究所 | 試料作製方法 |
JP4902712B2 (ja) * | 2009-09-25 | 2012-03-21 | エスアイアイ・ナノテクノロジー株式会社 | アトムプローブ分析方法 |
US20130050431A1 (en) * | 2011-08-29 | 2013-02-28 | Shiseido Company, Ltd. | Method of observing cross-section of cosmetic material |
CN103197087B (zh) * | 2012-01-09 | 2014-03-19 | 北京瑞利分析仪器有限公司 | 用于强酸性溶液的自动进样器采样针 |
JP6271189B2 (ja) * | 2013-09-02 | 2018-01-31 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
JP6274079B2 (ja) * | 2014-11-04 | 2018-02-07 | 日本軽金属株式会社 | ペリクル用支持枠および製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05312696A (ja) * | 1992-05-15 | 1993-11-22 | Sumitomo Metal Ind Ltd | 微小析出物観察用試料の調整方法 |
JP3633325B2 (ja) | 1998-11-25 | 2005-03-30 | 株式会社日立製作所 | 試料作製装置および試料作製方法 |
JP2000230891A (ja) * | 1999-02-09 | 2000-08-22 | Fuji Electric Co Ltd | 透過型電子顕微鏡用試料の作製方法 |
JP4323655B2 (ja) * | 2000-01-25 | 2009-09-02 | 新日本製鐵株式会社 | 電界イオン顕微鏡観察用針状試料作製方法 |
JP2002042715A (ja) * | 2000-07-25 | 2002-02-08 | Kanazawa Inst Of Technology | 組成分布立体表示アトムプローブおよび走査型組成分布立体表示アトムプローブ |
EP1376650A4 (en) * | 2001-03-26 | 2008-05-21 | Kanazawa Inst Of Technology | SCANNING ATOMIC PROBE AND ANALYSIS PROCEDURE WITH THE SCANNING ATOMIC PROBE |
JP2003007241A (ja) * | 2001-06-19 | 2003-01-10 | Nippon Steel Corp | 走査型電子顕微鏡と集束イオンビーム装置との共用試料ホルダー及び透過型電子顕微鏡用の試料作製方法 |
JP3902925B2 (ja) * | 2001-07-31 | 2007-04-11 | エスアイアイ・ナノテクノロジー株式会社 | 走査型アトムプローブ |
WO2004013603A2 (en) * | 2002-08-05 | 2004-02-12 | California Institute Of Technology | A method of sample preparation for atom probes and source of specimens |
-
2004
- 2004-03-17 JP JP2004075873A patent/JP4393899B2/ja not_active Expired - Fee Related
-
2005
- 2005-03-02 EP EP05719810.3A patent/EP1731894B1/en not_active Expired - Fee Related
- 2005-03-02 WO PCT/JP2005/003495 patent/WO2005090941A1/ja active Application Filing
- 2005-03-02 US US10/592,844 patent/US7550723B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP1731894A4 (en) | 2008-06-04 |
EP1731894B1 (en) | 2013-04-24 |
EP1731894A1 (en) | 2006-12-13 |
US20070176099A1 (en) | 2007-08-02 |
US7550723B2 (en) | 2009-06-23 |
WO2005090941A1 (ja) | 2005-09-29 |
JP2005265516A (ja) | 2005-09-29 |
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