JP4393226B2 - 光学系及びそれを用いた露光装置、デバイスの製造方法 - Google Patents

光学系及びそれを用いた露光装置、デバイスの製造方法 Download PDF

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Publication number
JP4393226B2
JP4393226B2 JP2004053238A JP2004053238A JP4393226B2 JP 4393226 B2 JP4393226 B2 JP 4393226B2 JP 2004053238 A JP2004053238 A JP 2004053238A JP 2004053238 A JP2004053238 A JP 2004053238A JP 4393226 B2 JP4393226 B2 JP 4393226B2
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Japan
Prior art keywords
temperature
mirror
optical system
linear expansion
expansion coefficient
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Expired - Fee Related
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JP2004053238A
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Japanese (ja)
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JP2005244012A5 (enExample
JP2005244012A (ja
Inventor
雅之 鈴木
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Canon Inc
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Canon Inc
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Priority to JP2004053238A priority Critical patent/JP4393226B2/ja
Priority to US11/067,072 priority patent/US7295284B2/en
Priority to EP05251193A priority patent/EP1569036B1/en
Publication of JP2005244012A publication Critical patent/JP2005244012A/ja
Publication of JP2005244012A5 publication Critical patent/JP2005244012A5/ja
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Publication of JP4393226B2 publication Critical patent/JP4393226B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004053238A 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法 Expired - Fee Related JP4393226B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004053238A JP4393226B2 (ja) 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法
US11/067,072 US7295284B2 (en) 2004-02-27 2005-02-25 Optical system, exposure apparatus using the same and device manufacturing method
EP05251193A EP1569036B1 (en) 2004-02-27 2005-02-28 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004053238A JP4393226B2 (ja) 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法

Publications (3)

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JP2005244012A JP2005244012A (ja) 2005-09-08
JP2005244012A5 JP2005244012A5 (enExample) 2009-11-05
JP4393226B2 true JP4393226B2 (ja) 2010-01-06

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JP2004053238A Expired - Fee Related JP4393226B2 (ja) 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法

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JP (1) JP4393226B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008002403A1 (de) * 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
KR102002269B1 (ko) 2010-07-30 2019-07-19 칼 짜이스 에스엠티 게엠베하 Euv 노광 장치
DE102012213671A1 (de) * 2012-08-02 2014-02-06 Carl Zeiss Smt Gmbh Spiegelanordnung für eine EUV-Lithographieanlage und Verfahren zur Herstellung derselben

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JP2005244012A (ja) 2005-09-08

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