JP4390413B2 - マスクのたわみ補正機能を備えたマスク保持装置 - Google Patents

マスクのたわみ補正機能を備えたマスク保持装置 Download PDF

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Publication number
JP4390413B2
JP4390413B2 JP2001323403A JP2001323403A JP4390413B2 JP 4390413 B2 JP4390413 B2 JP 4390413B2 JP 2001323403 A JP2001323403 A JP 2001323403A JP 2001323403 A JP2001323403 A JP 2001323403A JP 4390413 B2 JP4390413 B2 JP 4390413B2
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Japan
Prior art keywords
mask
air
suction
path
holding device
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Expired - Fee Related
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JP2001323403A
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Japanese (ja)
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JP2003131388A5 (enExample
JP2003131388A (ja
Inventor
昌之 新井
順一 森
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2001323403A priority Critical patent/JP4390413B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001323403A 2001-10-22 2001-10-22 マスクのたわみ補正機能を備えたマスク保持装置 Expired - Fee Related JP4390413B2 (ja)

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Application Number Priority Date Filing Date Title
JP2001323403A JP4390413B2 (ja) 2001-10-22 2001-10-22 マスクのたわみ補正機能を備えたマスク保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001323403A JP4390413B2 (ja) 2001-10-22 2001-10-22 マスクのたわみ補正機能を備えたマスク保持装置

Publications (3)

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JP2003131388A JP2003131388A (ja) 2003-05-09
JP2003131388A5 JP2003131388A5 (enExample) 2005-06-30
JP4390413B2 true JP4390413B2 (ja) 2009-12-24

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JP2001323403A Expired - Fee Related JP4390413B2 (ja) 2001-10-22 2001-10-22 マスクのたわみ補正機能を備えたマスク保持装置

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100693161B1 (ko) * 2005-05-02 2007-03-13 엘지전자 주식회사 노광기의 마스크 홀더장치
JP2008015272A (ja) 2006-07-06 2008-01-24 Fujitsu Hitachi Plasma Display Ltd パターニング用ガラスマスク及びその製造方法
JP4794471B2 (ja) * 2007-02-05 2011-10-19 株式会社日立ハイテクノロジーズ 露光装置、及び露光装置の負圧室の天板を交換する方法
JP2008276040A (ja) * 2007-05-02 2008-11-13 Ushio Inc マスクステージ
JP4879112B2 (ja) * 2007-07-31 2012-02-22 株式会社日立ハイテクノロジーズ 露光装置
KR101015751B1 (ko) * 2008-04-03 2011-02-22 천호식 액정기판 노광장치의 노광용 마스크기구
JP5190034B2 (ja) * 2009-07-03 2013-04-24 株式会社日立ハイテクノロジーズ 露光装置
JP6142214B2 (ja) * 2011-08-10 2017-06-07 株式会社ブイ・テクノロジー 近接露光装置及び近接露光方法
KR101589618B1 (ko) 2014-09-18 2016-01-29 주식회사 필옵틱스 노광장치의 워크 테이블과 이를 이용한 마스크 처짐량 교정 방법
KR101721189B1 (ko) 2014-09-18 2017-03-31 주식회사 필옵틱스 광각 보정 장치와 이를 사용하는 노광 장치 및 광각 보정 방법
KR101652985B1 (ko) 2014-09-18 2016-09-02 주식회사 필옵틱스 노광장치와 이것의 워크 테이블

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