JP4390119B2 - 回折光学素子の製造方法 - Google Patents

回折光学素子の製造方法 Download PDF

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Publication number
JP4390119B2
JP4390119B2 JP2000113012A JP2000113012A JP4390119B2 JP 4390119 B2 JP4390119 B2 JP 4390119B2 JP 2000113012 A JP2000113012 A JP 2000113012A JP 2000113012 A JP2000113012 A JP 2000113012A JP 4390119 B2 JP4390119 B2 JP 4390119B2
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etching
optical element
step portion
diffractive optical
substrate
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Expired - Fee Related
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Japanese (ja)
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JP2001296416A5 (enExample
JP2001296416A (ja
Inventor
裕一 岩崎
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Canon Inc
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Canon Inc
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Priority to JP2000113012A priority Critical patent/JP4390119B2/ja
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Publication of JP2001296416A5 publication Critical patent/JP2001296416A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2000113012A 2000-04-14 2000-04-14 回折光学素子の製造方法 Expired - Fee Related JP4390119B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000113012A JP4390119B2 (ja) 2000-04-14 2000-04-14 回折光学素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000113012A JP4390119B2 (ja) 2000-04-14 2000-04-14 回折光学素子の製造方法

Publications (3)

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JP2001296416A JP2001296416A (ja) 2001-10-26
JP2001296416A5 JP2001296416A5 (enExample) 2007-06-07
JP4390119B2 true JP4390119B2 (ja) 2009-12-24

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JP2000113012A Expired - Fee Related JP4390119B2 (ja) 2000-04-14 2000-04-14 回折光学素子の製造方法

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4668666B2 (ja) * 2005-04-12 2011-04-13 株式会社リコー 光情報記憶媒体用原盤の製造方法、光情報記憶媒体用スタンパの製造方法、スタンパ、光情報記憶媒体用成形基板の製造方法及び光情報記憶媒体用成形基板
FR2981460B1 (fr) * 2011-10-18 2016-06-24 Commissariat Energie Atomique Procede de realisation d'un dispositif optique refractif ou diffractif
CN104090376A (zh) * 2014-06-20 2014-10-08 温州大学 高数值孔径短焦距台阶相位型厚fzp的设计方法
CN104330840B (zh) * 2014-07-07 2016-05-04 中国空空导弹研究院 一种多台阶微透镜制作方法以及光学元件台阶制作方法
CN104237983B (zh) * 2014-09-30 2016-09-28 中国空空导弹研究院 高效制作高精度多台阶微透镜阵列的方法
CN104237984B (zh) * 2014-09-30 2016-11-16 中国空空导弹研究院 高精度多台阶微透镜阵列的制作方法
KR102585150B1 (ko) * 2018-03-06 2023-10-06 어플라이드 머티어리얼스, 인코포레이티드 3d 기능성 광학 물질 적층 구조를 구축하는 방법
KR102249518B1 (ko) * 2019-08-29 2021-05-07 한국광기술원 마스터 금형, 마스터 금형 제조 장치 및 방법
WO2021224450A1 (en) * 2020-05-08 2021-11-11 Nil Technology Aps Multi-level structures and methods for manufacturing the same

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Publication number Publication date
JP2001296416A (ja) 2001-10-26

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