FR2981460B1 - Procede de realisation d'un dispositif optique refractif ou diffractif - Google Patents

Procede de realisation d'un dispositif optique refractif ou diffractif

Info

Publication number
FR2981460B1
FR2981460B1 FR1159382A FR1159382A FR2981460B1 FR 2981460 B1 FR2981460 B1 FR 2981460B1 FR 1159382 A FR1159382 A FR 1159382A FR 1159382 A FR1159382 A FR 1159382A FR 2981460 B1 FR2981460 B1 FR 2981460B1
Authority
FR
France
Prior art keywords
refractive
producing
optical device
diffractive optical
diffractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1159382A
Other languages
English (en)
Other versions
FR2981460A1 (fr
Inventor
Michel Heitzmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR1159382A priority Critical patent/FR2981460B1/fr
Priority to JP2014536219A priority patent/JP2015504237A/ja
Priority to EP12775238.4A priority patent/EP2769249A1/fr
Priority to PCT/EP2012/070593 priority patent/WO2013057152A1/fr
Priority to US14/352,426 priority patent/US9529127B2/en
Publication of FR2981460A1 publication Critical patent/FR2981460A1/fr
Application granted granted Critical
Publication of FR2981460B1 publication Critical patent/FR2981460B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B2003/0093—Simple or compound lenses characterised by the shape

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Micromachines (AREA)
  • Drying Of Semiconductors (AREA)
FR1159382A 2011-10-18 2011-10-18 Procede de realisation d'un dispositif optique refractif ou diffractif Expired - Fee Related FR2981460B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR1159382A FR2981460B1 (fr) 2011-10-18 2011-10-18 Procede de realisation d'un dispositif optique refractif ou diffractif
JP2014536219A JP2015504237A (ja) 2011-10-18 2012-10-17 屈折性または回折性光学装置を製造するための方法
EP12775238.4A EP2769249A1 (fr) 2011-10-18 2012-10-17 Procede de realisation d'un dispositif optique refractif ou diffractif
PCT/EP2012/070593 WO2013057152A1 (fr) 2011-10-18 2012-10-17 Procede de realisation d'un dispositif optique refractif ou diffractif
US14/352,426 US9529127B2 (en) 2011-10-18 2012-10-17 Method for producing a refractive or diffractive optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1159382A FR2981460B1 (fr) 2011-10-18 2011-10-18 Procede de realisation d'un dispositif optique refractif ou diffractif

Publications (2)

Publication Number Publication Date
FR2981460A1 FR2981460A1 (fr) 2013-04-19
FR2981460B1 true FR2981460B1 (fr) 2016-06-24

Family

ID=47046605

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1159382A Expired - Fee Related FR2981460B1 (fr) 2011-10-18 2011-10-18 Procede de realisation d'un dispositif optique refractif ou diffractif

Country Status (5)

Country Link
US (1) US9529127B2 (fr)
EP (1) EP2769249A1 (fr)
JP (1) JP2015504237A (fr)
FR (1) FR2981460B1 (fr)
WO (1) WO2013057152A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101749598B1 (ko) 2016-04-19 2017-06-22 (주)유티아이 노출패턴이 구현된 카메라 윈도우의 제조방법 및 그에 의해 제조된 노출패턴이 구현된 카메라 윈도우
JP6994025B2 (ja) 2016-09-21 2022-01-14 モレキュラー インプリンツ， インコーポレイテッド 構造のマイクロリソグラフィ加工
KR101919067B1 (ko) 2017-04-27 2018-11-19 세종공업 주식회사 저수차 렌즈 제조방법
US10802185B2 (en) * 2017-08-16 2020-10-13 Lumentum Operations Llc Multi-level diffractive optical element thin film coating
CN114185179A (zh) * 2017-11-06 2022-03-15 奇跃公司 利用阴影掩模实现可调梯度图案化的方法和系统
KR102585150B1 (ko) * 2018-03-06 2023-10-06 어플라이드 머티어리얼스, 인코포레이티드 3d 기능성 광학 물질 적층 구조를 구축하는 방법
US11487058B2 (en) * 2020-08-13 2022-11-01 Applied Materials, Inc. Method for manufacturing optical device structures

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5672450A (en) 1994-05-11 1997-09-30 Micron Technology, Inc. Method of phase shift mask fabrication comprising a tapered edge and phase conflict resolution
JP3287236B2 (ja) 1996-10-03 2002-06-04 キヤノン株式会社 回折光学素子の製作方法
US6475704B1 (en) * 1997-09-12 2002-11-05 Canon Kabushiki Kaisha Method for forming fine structure
JP2000098116A (ja) * 1998-09-18 2000-04-07 Canon Inc 素子又は素子作製用モールド型の作製方法
US20010026399A1 (en) 1998-09-24 2001-10-04 Masaaki Nakabayashi Diffractive optical element and method of manufacture of the same
JP3442004B2 (ja) * 1999-07-30 2003-09-02 キヤノン株式会社 光学素子の製造方法
JP4390119B2 (ja) * 2000-04-14 2009-12-24 キヤノン株式会社 回折光学素子の製造方法
JP2002350623A (ja) * 2001-05-23 2002-12-04 Dainippon Printing Co Ltd 回折光学素子の製造方法
JP2003337216A (ja) * 2002-05-20 2003-11-28 Matsushita Electric Ind Co Ltd 回折素子
JP2005140893A (ja) * 2003-11-05 2005-06-02 Dainippon Printing Co Ltd 回折光学素子及びその製造方法
JP4356515B2 (ja) * 2004-05-21 2009-11-04 日本ビクター株式会社 回折光学格子の形成方法
JP4443376B2 (ja) * 2004-10-19 2010-03-31 Ｏｋｉセミコンダクタ株式会社 光学素子の作成方法
CN100523879C (zh) * 2005-05-02 2009-08-05 冲电气工业株式会社 衍射光学元件的制造方法

Also Published As

Publication number Publication date
EP2769249A1 (fr) 2014-08-27
FR2981460A1 (fr) 2013-04-19
US20140285891A1 (en) 2014-09-25
WO2013057152A1 (fr) 2013-04-25
JP2015504237A (ja) 2015-02-05
US9529127B2 (en) 2016-12-27

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