JP4378769B2 - ガラス基板 - Google Patents
ガラス基板 Download PDFInfo
- Publication number
- JP4378769B2 JP4378769B2 JP2003325954A JP2003325954A JP4378769B2 JP 4378769 B2 JP4378769 B2 JP 4378769B2 JP 2003325954 A JP2003325954 A JP 2003325954A JP 2003325954 A JP2003325954 A JP 2003325954A JP 4378769 B2 JP4378769 B2 JP 4378769B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- glass substrate
- less
- volume resistivity
- alkali
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000011521 glass Substances 0.000 title claims description 151
- 239000000758 substrate Substances 0.000 title claims description 80
- 239000004973 liquid crystal related substance Substances 0.000 claims description 17
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims description 10
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 9
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 5
- 238000007500 overflow downdraw method Methods 0.000 claims description 5
- 239000010408 film Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 21
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 16
- 239000000126 substance Substances 0.000 description 15
- 238000004031 devitrification Methods 0.000 description 14
- 230000001105 regulatory effect Effects 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- 239000003513 alkali Substances 0.000 description 11
- 239000002994 raw material Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 238000007496 glass forming Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 229910017665 NH4HF2 Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- -1 alkalis Substances 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052661 anorthite Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000006063 cullet Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Description
X:スペクトル測定時のガラス基板の板厚(mm)
T1:参照波長3850cm-1付近における透過率(%)
T2:水酸基吸収波長3500cm-1付近における最小透過率(%)
X:スペクトル測定時のガラス基板の板厚(mm)
T1:参照波長3850cm-1付近における透過率(%)
T2:水酸基吸収波長3500cm-1付近における最小透過率(%)
Claims (7)
- 質量百分率で、SiO 2 50〜80%、Al 2 O 3 10〜25%、B 2 O 3 5〜18%、MgO 0〜5%、CaO 0〜10%、SrO 0〜10%、BaO 0〜10%、ZnO 0〜5%、TiO 2 0〜5%を含有し、SiO 2 +Al 2 O 3 +B 2 O 3 が80%以上であり、Li 2 Oが5〜200ppm、アルカリ金属酸化物の総量が700ppm以下であり、且つ、体積抵抗率が、350℃において1011.3Ω・cm以下であることを特徴とするガラス基板。
- 体積抵抗率が、350℃において1011.0Ω・cm以下であることを特徴とする請求項1記載のガラス基板。
- Li2Oを10〜200ppm含有することを特徴とする請求項1又は2に記載のガラス基板。
- β−OHが0.2/mm以上であることを特徴とする請求項1〜3のいずれかに記載のガラス基板。
- MgO+CaO+SrO+BaOが5〜15質量%であることを特徴とする請求項1〜4のいずれかに記載のガラス基板。
- オーバーフローダウンドロー法によって成形されてなることを特徴とする請求項1〜5のいずれかに記載のガラス基板。
- 液晶ディスプレイに使用されることを特徴とする請求項1〜6のいずれかに記載のガラス基板。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003325954A JP4378769B2 (ja) | 2003-09-18 | 2003-09-18 | ガラス基板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003325954A JP4378769B2 (ja) | 2003-09-18 | 2003-09-18 | ガラス基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005089259A JP2005089259A (ja) | 2005-04-07 |
JP4378769B2 true JP4378769B2 (ja) | 2009-12-09 |
Family
ID=34456267
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003325954A Expired - Lifetime JP4378769B2 (ja) | 2003-09-18 | 2003-09-18 | ガラス基板 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4378769B2 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5348598B2 (ja) * | 2005-05-10 | 2013-11-20 | 日本電気硝子株式会社 | 半導体素子用ガラス基板およびそれを用いたチップスケールパッケージ |
WO2007020825A1 (ja) | 2005-08-15 | 2007-02-22 | Nippon Sheet Glass Company, Limited | ガラス組成物 |
WO2007020824A1 (ja) * | 2005-08-15 | 2007-02-22 | Nippon Sheet Glass Company, Limited | ガラス組成物およびガラス組成物の製造方法 |
JP5224096B2 (ja) * | 2007-01-29 | 2013-07-03 | 日本電気硝子株式会社 | ディスプレイ用ガラス基板の製造方法 |
JP5808069B2 (ja) * | 2007-02-16 | 2015-11-10 | 日本電気硝子株式会社 | 太陽電池用ガラス基板 |
JP5483821B2 (ja) | 2007-02-27 | 2014-05-07 | AvanStrate株式会社 | 表示装置用ガラス基板および表示装置 |
KR101606600B1 (ko) | 2008-02-26 | 2016-03-25 | 코닝 인코포레이티드 | 실리케이트 유리용 청징제 |
JP5622069B2 (ja) | 2009-01-21 | 2014-11-12 | 日本電気硝子株式会社 | 強化ガラス、強化用ガラス及び強化ガラスの製造方法 |
FR2948356B1 (fr) * | 2009-07-22 | 2011-08-19 | Saint Gobain | Dispositif electrochrome |
JP5821188B2 (ja) * | 2010-12-27 | 2015-11-24 | 旭硝子株式会社 | 情報記録媒体用ガラス基板の製造方法 |
KR101463672B1 (ko) * | 2011-09-30 | 2014-11-19 | 아반스트레이트 가부시키가이샤 | 플랫 패널 디스플레이용 유리 기판 |
JP5954690B2 (ja) * | 2012-06-18 | 2016-07-20 | 日本電気硝子株式会社 | 非接触給電用支持部材 |
KR101583114B1 (ko) * | 2012-10-02 | 2016-01-07 | 아반스트레이트 가부시키가이샤 | 유리 기판의 제조 방법 및 제조 장치 |
JP5797222B2 (ja) * | 2012-10-02 | 2015-10-21 | AvanStrate株式会社 | ガラス基板の製造方法および製造装置 |
KR102419729B1 (ko) * | 2015-03-10 | 2022-07-12 | 니폰 덴키 가라스 가부시키가이샤 | 반도체용 지지 유리 기판 및 이것을 사용한 적층 기판 |
KR102597824B1 (ko) * | 2015-10-15 | 2023-11-03 | 에이지씨 가부시키가이샤 | 디스플레이용 유리 기판 및 그의 제조 방법 |
JP6953944B2 (ja) * | 2017-09-21 | 2021-10-27 | Agc株式会社 | ホウケイ酸ガラスおよびその製造方法 |
CN108793735B (zh) * | 2018-07-02 | 2021-08-24 | 芜湖东旭光电装备技术有限公司 | 一种玻璃组合物以及耐油污玻璃及其制备方法与应用 |
JP2021031307A (ja) * | 2019-08-14 | 2021-03-01 | 日本電気硝子株式会社 | ガラス基板 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6483538A (en) * | 1987-09-28 | 1989-03-29 | Nippon Sheet Glass Co Ltd | Glass substrate for electronic apparatus |
JPH01287595A (ja) * | 1988-05-14 | 1989-11-20 | Toshiba Corp | ディスプレイ装置の帯電防止構造 |
US5824127A (en) * | 1996-07-19 | 1998-10-20 | Corning Incorporated | Arsenic-free glasses |
JP4000500B2 (ja) * | 1999-08-02 | 2007-10-31 | 日本電気硝子株式会社 | Li2O−Al2O3−SiO2系結晶化ガラス及び結晶性ガラス |
JP2001114534A (ja) * | 1999-10-20 | 2001-04-24 | Nippon Sheet Glass Co Ltd | 金属酸化物膜付きガラス板およびその製造方法、ならびにこれを用いた複層ガラス |
JP2002201029A (ja) * | 2000-12-28 | 2002-07-16 | Sumitomo Metal Mining Co Ltd | 光吸収性透明導電膜およびスパッタリングターゲット |
JP2002343276A (ja) * | 2001-05-10 | 2002-11-29 | Nippon Electric Glass Co Ltd | 電界放射型ディスプレイ用ガラス基板 |
JP2003026442A (ja) * | 2001-07-13 | 2003-01-29 | Nippon Electric Glass Co Ltd | 電界放射型ディスプレイ用ガラス基板 |
JP4017466B2 (ja) * | 2001-12-04 | 2007-12-05 | 岡本硝子株式会社 | 耐熱性ガラス |
JP2003238174A (ja) * | 2002-02-15 | 2003-08-27 | Asahi Glass Co Ltd | フロートガラスの製造方法 |
-
2003
- 2003-09-18 JP JP2003325954A patent/JP4378769B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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JP2005089259A (ja) | 2005-04-07 |
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