JP4369054B2 - 使用済グリコール系スラリーの分離、再生および再使用法 - Google Patents
使用済グリコール系スラリーの分離、再生および再使用法 Download PDFInfo
- Publication number
- JP4369054B2 JP4369054B2 JP2000557946A JP2000557946A JP4369054B2 JP 4369054 B2 JP4369054 B2 JP 4369054B2 JP 2000557946 A JP2000557946 A JP 2000557946A JP 2000557946 A JP2000557946 A JP 2000557946A JP 4369054 B2 JP4369054 B2 JP 4369054B2
- Authority
- JP
- Japan
- Prior art keywords
- slurry
- solid
- abrasive component
- liquid
- consumable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002002 slurry Substances 0.000 title claims description 112
- 238000000926 separation method Methods 0.000 title claims description 23
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 title description 7
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 title description 4
- 230000008929 regeneration Effects 0.000 title description 2
- 238000011069 regeneration method Methods 0.000 title description 2
- 239000007787 solid Substances 0.000 claims description 59
- 238000000034 method Methods 0.000 claims description 58
- 239000007788 liquid Substances 0.000 claims description 52
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 35
- 229910052710 silicon Inorganic materials 0.000 claims description 35
- 239000010703 silicon Substances 0.000 claims description 35
- 239000011856 silicon-based particle Substances 0.000 claims description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 18
- 230000001050 lubricating effect Effects 0.000 claims description 15
- 239000002699 waste material Substances 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 9
- 239000002202 Polyethylene glycol Substances 0.000 claims description 6
- 239000000314 lubricant Substances 0.000 claims description 6
- 229920001223 polyethylene glycol Polymers 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 5
- 239000006061 abrasive grain Substances 0.000 description 42
- 239000000725 suspension Substances 0.000 description 19
- 235000012431 wafers Nutrition 0.000 description 18
- 239000000110 cooling liquid Substances 0.000 description 11
- 239000002245 particle Substances 0.000 description 10
- 238000005461 lubrication Methods 0.000 description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 7
- 229910010271 silicon carbide Inorganic materials 0.000 description 7
- 239000002826 coolant Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 238000003828 vacuum filtration Methods 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/52—Mechanical processing of waste for the recovery of materials, e.g. crushing, shredding, separation or disassembly
Landscapes
- Separation Of Solids By Using Liquids Or Pneumatic Power (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US1999/014978 WO2000001519A1 (en) | 1998-07-01 | 1999-07-01 | Method for the separation, regeneration and reuse of an exhausted glycol-based slurry |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002519209A JP2002519209A (ja) | 2002-07-02 |
| JP2002519209A5 JP2002519209A5 (enrdf_load_stackoverflow) | 2006-08-03 |
| JP4369054B2 true JP4369054B2 (ja) | 2009-11-18 |
Family
ID=22273110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000557946A Expired - Fee Related JP4369054B2 (ja) | 1999-07-01 | 1999-07-01 | 使用済グリコール系スラリーの分離、再生および再使用法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4369054B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009054076B8 (de) * | 2009-11-20 | 2012-07-05 | Erwin Junker Maschinenfabrik Gmbh | Verfahren zum Abtrennen von Schleiföl aus Schleifschlämmen; Trennstation zur Durchführung des Verfahrens und verfahrenstechnische Anlage |
| JP5640260B2 (ja) * | 2010-06-25 | 2014-12-17 | 日本碍子株式会社 | クーラント回収方法 |
| JP5611748B2 (ja) * | 2010-09-30 | 2014-10-22 | 株式会社Ｉｈｉ回転機械 | ワイヤソースラリ廃液の処理方法及び装置 |
| JP6172030B2 (ja) | 2014-04-03 | 2017-08-02 | 信越半導体株式会社 | ワークの切断方法及び加工液 |
| JP5850192B1 (ja) * | 2015-03-19 | 2016-02-03 | コニカミノルタ株式会社 | 研磨材の回収方法 |
-
1999
- 1999-07-01 JP JP2000557946A patent/JP4369054B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002519209A (ja) | 2002-07-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6231628B1 (en) | Method for the separation, regeneration and reuse of an exhausted glycol-based slurry | |
| WO2000001519A1 (en) | Method for the separation, regeneration and reuse of an exhausted glycol-based slurry | |
| US7223344B2 (en) | Method for treating an exhausted glycol-based slurry | |
| US8940174B2 (en) | Method for treating spent abrasive slurry | |
| JP2001278612A (ja) | シリコンの回収方法 | |
| WO2009084068A1 (en) | Process for separating and recovering the suspending fluids contained in exhausted slurries from the machining of silicon | |
| EP2094441B1 (en) | Process and apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component | |
| CN103347654B (zh) | 冷却剂再生方法 | |
| JP4369054B2 (ja) | 使用済グリコール系スラリーの分離、再生および再使用法 | |
| JP5244500B2 (ja) | シリコン精製方法およびシリコン精製装置 | |
| KR100625283B1 (ko) | 반도체 웨이퍼 제조시 발생하는 폐슬러지의 재생 장치 및방법 | |
| JP2010221337A (ja) | 使用済み研削液の再利用方法 | |
| JP2005313030A (ja) | スラリ再生方法 | |
| JP6085500B2 (ja) | ワイヤソースラリのクーラント回収装置 | |
| JPH11172236A (ja) | 研削懸濁液を再生利用する方法 | |
| PL196128B1 (pl) | Sposób frakcjonowania zawiesiny skrawającej | |
| JP2008188683A (ja) | シリコンインゴット切削方法および切削装置 | |
| JP3187466U (ja) | スラリー再生装置 | |
| JPH07251373A (ja) | 切削粒子の回収方法 | |
| JP2005349507A (ja) | クーラント再生装置及び廃スラリー再生システム、並びに、廃クーラントの再生方法及び廃スラリーの再生方法 | |
| KR100636335B1 (ko) | 반도체 웨이퍼 제조시 발생하는 폐슬러지의 재생 장치 | |
| JPH0839430A (ja) | シリコン切断廃液からの砥粒回収方法 | |
| KR101331446B1 (ko) | 폐절삭연마혼합액 재생방법 | |
| WO2018216721A4 (ja) | 超音波加工装置における砥粒回収システム | |
| KR20050096329A (ko) | 유분 함유 폐슬러지의 재생장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20041020 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20041020 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060615 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060615 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090421 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090716 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090811 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090827 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120904 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130904 Year of fee payment: 4 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |