JP4361403B2 - 加工用プローブ - Google Patents
加工用プローブ Download PDFInfo
- Publication number
- JP4361403B2 JP4361403B2 JP2004072658A JP2004072658A JP4361403B2 JP 4361403 B2 JP4361403 B2 JP 4361403B2 JP 2004072658 A JP2004072658 A JP 2004072658A JP 2004072658 A JP2004072658 A JP 2004072658A JP 4361403 B2 JP4361403 B2 JP 4361403B2
- Authority
- JP
- Japan
- Prior art keywords
- probe
- cantilever
- processing
- conductive
- conductivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
Description
プローブ顕微鏡は、試料とマイクロマシン技術により製作された微小なプローブ間に働く原子間力等の物理的力を、微小プローブの変形や変位として検知し、試料表面の形状や物性を画像化して観察、計測する装置であることは知られている(例えば、非特許文献2参照)。
これらのプローブも絶縁材からなっている。プローブの材質が絶縁性の場合、フォトマスク材質がガラスであるため、プローブを用いて擦って欠陥部を取り除く手法の場合、摩擦により静電気を生じマスクパターン間に放電を起こし、マスクパターンを破損してしまう恐れがある。
Proceedings of SPIE Vol.5256 〔 P hotomask repair performance of the SiON/Ta-Hf attenuating PSM 〕Masaharu Nishiguchi ,Tauyoshi Amano,Shiho Sasaki,Yasutake Morikawa ,and Naoya Hayashi (Figure2 ページ1201 下、ページ1202 1行目から7行目) 〔走査型プローブ顕微鏡 基礎と未来予測〕 森田清三 編著 丸善 平成12年2月10日 (P21 上7行から24 上12行) 砥粒加工工学会誌 〔原子間力顕微鏡一体型加工評価装置の開発―加工用AFMカンチレバーの開発〕Vol.41 No.7 1997 JUL.276-281 (ページ277 左行 上17行からページ279 左行 上19行)芦田 極、森田 昇、吉田喜太郎、平井聖児
2 ベース
3 導電性コート
4、5、6、14、24 プローブ
20 ガラス基板
21 フォトマスクパターン膜
22 欠陥
Claims (4)
- 試料表面の欠陥部を引っかく、導電性を施したダイヤモンド又はカーボンのいずれかからなるプローブ部と、
一端において前記プローブ部を固定し、他端が装置本体に設けたプローブ保持部材に固定されて前記プローブ部と伝導するように導電性を有したカンチレバー部と、
前記プローブ部の変位を検出する変位検出手段と、を備え、
該プローブ部により試料表面を引っかいた際に発生する静電気を前記プローブ及びカンチレバー部を導電して装置筐体へと逃がすことを特徴とするAFM加工用プローブ。 - 前記カンチレバー部が、短冊状のシリコン異方性エッチングにより形成されたものであって、
該カンチレバー部及び前記プローブ部への導電性が導電性元素の注入によるものである請求項1に記載のAFM加工用プローブ。 - 前記カンチレバー及びプローブ部の導電性が、金属コートによるものである請求項2に記載のAFM加工用プローブ。
- 前記変位検出手段が、前記カンチレバーに設けた歪抵抗による自己検知式のものである請求項1に記載のAFM加工用プローブ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004072658A JP4361403B2 (ja) | 2004-03-15 | 2004-03-15 | 加工用プローブ |
US11/066,063 US7378654B2 (en) | 2004-03-15 | 2005-02-25 | Processing probe |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004072658A JP4361403B2 (ja) | 2004-03-15 | 2004-03-15 | 加工用プローブ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005258285A JP2005258285A (ja) | 2005-09-22 |
JP4361403B2 true JP4361403B2 (ja) | 2009-11-11 |
Family
ID=34918621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004072658A Expired - Fee Related JP4361403B2 (ja) | 2004-03-15 | 2004-03-15 | 加工用プローブ |
Country Status (2)
Country | Link |
---|---|
US (1) | US7378654B2 (ja) |
JP (1) | JP4361403B2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4697708B2 (ja) * | 2006-02-01 | 2011-06-08 | セイコーインスツル株式会社 | 多機能カンチレバー及び走査型プローブ顕微鏡並びに加工対象物の切削方法 |
DE102007055540A1 (de) * | 2006-11-29 | 2008-06-19 | Sii Nano Technology Inc. | Verfahren zum Korrigieren von Photomaskendefekten |
JP5048455B2 (ja) * | 2006-11-29 | 2012-10-17 | エスアイアイ・ナノテクノロジー株式会社 | フォトマスクの欠陥修正装置及び方法 |
KR100968148B1 (ko) * | 2007-06-13 | 2010-07-06 | 주식회사 하이닉스반도체 | 리페어 장치의 팁 및 그 제조방법 |
WO2009060973A1 (ja) * | 2007-11-10 | 2009-05-14 | Namiki Seimitsu Houseki Kabushikikaisha | 針状ダイヤモンド、それを用いたカンチレバー、フォトマスク修正用または細胞操作用探針 |
JP5148302B2 (ja) * | 2008-01-23 | 2013-02-20 | セイコーインスツル株式会社 | 微小加工装置用プローブおよび微小加工装置 |
JP2011158283A (ja) * | 2010-01-29 | 2011-08-18 | Tdk Corp | カンチレバー製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0899538B1 (en) * | 1997-08-27 | 2003-05-14 | IMEC vzw | A probe tip configuration, a method of fabricating probe tips and use thereof |
US6197455B1 (en) * | 1999-01-14 | 2001-03-06 | Advanced Micro Devices, Inc. | Lithographic mask repair using a scanning tunneling microscope |
US6884999B1 (en) * | 2000-10-24 | 2005-04-26 | Advanced Micro Devices, Inc. | Use of scanning probe microscope for defect detection and repair |
-
2004
- 2004-03-15 JP JP2004072658A patent/JP4361403B2/ja not_active Expired - Fee Related
-
2005
- 2005-02-25 US US11/066,063 patent/US7378654B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2005258285A (ja) | 2005-09-22 |
US20050199809A1 (en) | 2005-09-15 |
US7378654B2 (en) | 2008-05-27 |
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