JP4351556B2 - 気相成長装置 - Google Patents
気相成長装置 Download PDFInfo
- Publication number
- JP4351556B2 JP4351556B2 JP2004044332A JP2004044332A JP4351556B2 JP 4351556 B2 JP4351556 B2 JP 4351556B2 JP 2004044332 A JP2004044332 A JP 2004044332A JP 2004044332 A JP2004044332 A JP 2004044332A JP 4351556 B2 JP4351556 B2 JP 4351556B2
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- chamber
- glove box
- film forming
- vapor phase
- substrate
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Description
Claims (1)
- 気相成長処理を行う成膜室に基板交換用の基板搬送室を連設した気相成長装置において、前記成膜室内に配置される成膜構成部材に付着した付着物を除去するための付着物除去手段とパージ手段とを有する清掃用のグローブボックスを、前記成膜室との間を気密に仕切る仕切手段を介して着脱可能に連設したことを特徴とする気相成長装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004044332A JP4351556B2 (ja) | 2004-02-20 | 2004-02-20 | 気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004044332A JP4351556B2 (ja) | 2004-02-20 | 2004-02-20 | 気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005236093A JP2005236093A (ja) | 2005-09-02 |
JP4351556B2 true JP4351556B2 (ja) | 2009-10-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2004044332A Expired - Fee Related JP4351556B2 (ja) | 2004-02-20 | 2004-02-20 | 気相成長装置 |
Country Status (1)
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JP (1) | JP4351556B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4728757B2 (ja) * | 2005-09-22 | 2011-07-20 | 株式会社東芝 | 半導体製造方法及び半導体製造装置 |
JP5009657B2 (ja) * | 2007-03-20 | 2012-08-22 | 株式会社エアレックス | 作業用隔絶袋体、及びアイソレーター |
JP5337902B2 (ja) * | 2012-09-14 | 2013-11-06 | 大陽日酸株式会社 | 気相成長装置及び方法 |
JP6090183B2 (ja) * | 2014-01-23 | 2017-03-08 | 信越半導体株式会社 | 気相成長装置の清掃又は点検方法及びエピタキシャルウェーハの製造方法 |
CN108787200B (zh) * | 2018-07-16 | 2020-07-31 | 江西龙正科技发展有限公司 | 一种避免涂料浪费的机车喷涂装置 |
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2004
- 2004-02-20 JP JP2004044332A patent/JP4351556B2/ja not_active Expired - Fee Related
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Publication number | Publication date |
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JP2005236093A (ja) | 2005-09-02 |
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