JP4350168B2 - チタニアドープ溶融シリカの製造方法 - Google Patents

チタニアドープ溶融シリカの製造方法 Download PDF

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Publication number
JP4350168B2
JP4350168B2 JP53858998A JP53858998A JP4350168B2 JP 4350168 B2 JP4350168 B2 JP 4350168B2 JP 53858998 A JP53858998 A JP 53858998A JP 53858998 A JP53858998 A JP 53858998A JP 4350168 B2 JP4350168 B2 JP 4350168B2
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JP
Japan
Prior art keywords
titania
titanium
doped
silica
fused silica
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Expired - Lifetime
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JP53858998A
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English (en)
Japanese (ja)
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JP2001513744A (ja
JP2001513744A5 (enExample
Inventor
エル ブラックウェル，ジェフリー
ダッシャー，デイヴィッド
リニー サトン，エイ
エム トゥルースデイル，カールトン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
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Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2001513744A publication Critical patent/JP2001513744A/ja
Publication of JP2001513744A5 publication Critical patent/JP2001513744A5/ja
Application granted granted Critical
Publication of JP4350168B2 publication Critical patent/JP4350168B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10—Coating
    • C03C25/104—Coating to obtain optical fibres
    • C03C25/106—Single coatings
    • C03C25/1061—Inorganic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Chemical Vapour Deposition (AREA)
JP53858998A 1997-03-07 1998-02-25 チタニアドープ溶融シリカの製造方法 Expired - Lifetime JP4350168B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4004897P 1997-03-07 1997-03-07
US60/040,048 1997-03-07
PCT/US1998/003656 WO1998039496A1 (en) 1997-03-07 1998-02-25 Method of making titania-doped fused silica

Publications (3)

Publication Number Publication Date
JP2001513744A JP2001513744A (ja) 2001-09-04
JP2001513744A5 JP2001513744A5 (enExample) 2005-11-10
JP4350168B2 true JP4350168B2 (ja) 2009-10-21

Family

ID=21908805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53858998A Expired - Lifetime JP4350168B2 (ja) 1997-03-07 1998-02-25 チタニアドープ溶融シリカの製造方法

Country Status (5)

Country Link
US (1) US6487879B1 (enExample)
EP (1) EP0973957A4 (enExample)
JP (1) JP4350168B2 (enExample)
KR (1) KR20000076000A (enExample)
WO (1) WO1998039496A1 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8047023B2 (en) 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
JP2003291343A (ja) * 2001-10-26 2003-10-14 Seiko Epson Corp 液体噴射ヘッド及びその製造方法並びに液体噴射装置
WO2003057637A1 (en) 2001-12-21 2003-07-17 Corning Incorporated Fused silica containing aluminum
US6630418B2 (en) 2001-12-21 2003-10-07 Corning Incorporated Fused silica containing aluminum
US6672111B2 (en) * 2001-12-21 2004-01-06 Corning Incorporated Method and apparatus for adding metals to fused silica
US6872506B2 (en) * 2002-06-25 2005-03-29 Brewer Science Inc. Wet-developable anti-reflective compositions
DE10319596A1 (de) * 2003-05-02 2004-11-25 Degussa Ag Mehrkomponentenglas
US6875226B2 (en) * 2003-07-16 2005-04-05 Laser therapy apparatus and laser therapy
JP5368674B2 (ja) * 2003-10-15 2013-12-18 ブルーワー サイエンス アイ エヌ シー． 現像液に可溶な材料および現像液に可溶な材料をビアファーストデュアルダマシン適用において用いる方法
DE102004015766B4 (de) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat
US20050255410A1 (en) 2004-04-29 2005-11-17 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
US7914974B2 (en) 2006-08-18 2011-03-29 Brewer Science Inc. Anti-reflective imaging layer for multiple patterning process
US7361207B1 (en) 2007-02-28 2008-04-22 Corning Incorporated System and method for electrostatically depositing aerosol particles
US7393385B1 (en) 2007-02-28 2008-07-01 Corning Incorporated Apparatus and method for electrostatically depositing aerosol particles
US20080268165A1 (en) * 2007-04-26 2008-10-30 Curtis Robert Fekety Process for making a porous substrate of glass powder formed through flame spray pyrolysis
US20090029064A1 (en) * 2007-07-25 2009-01-29 Carlton Maurice Truesdale Apparatus and method for making nanoparticles using a hot wall reactor
KR101647158B1 (ko) 2008-01-29 2016-08-09 브레우어 사이언스 인코포레이션 다중 다크 필드 노출에 의한, 하드마스크 패턴화를 위한 온-트랙 공정
US20100126227A1 (en) * 2008-11-24 2010-05-27 Curtis Robert Fekety Electrostatically depositing conductive films during glass draw
DE102008060924A1 (de) * 2008-12-06 2010-06-10 Innovent E.V. Verfahren zur Abscheidung einer Schicht auf einem Substrat
US9640396B2 (en) 2009-01-07 2017-05-02 Brewer Science Inc. Spin-on spacer materials for double- and triple-patterning lithography
US7998558B2 (en) * 2009-02-27 2011-08-16 Corning Incorporated Glass sheet with protected edge, edge protector and method for making glass sheet using same
JP6236866B2 (ja) * 2013-05-15 2017-11-29 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
US20150239767A1 (en) 2014-02-26 2015-08-27 Corning Incorporated HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT
EP3274311B1 (en) 2015-03-26 2020-06-17 Corning Incorporated Glass composite for use in extreme ultra-violet lithography
US12286355B2 (en) * 2019-08-01 2025-04-29 Lawrence Livermore National Security, Llc Additive manufacturing of microanalytical reference materials

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2272342A (en) 1934-08-27 1942-02-10 Corning Glass Works Method of making a transparent article of silica
US2239551A (en) 1939-04-22 1941-04-22 Corning Glass Works Method of making sealing glasses and seals for quartz lamps
BE438752A (enExample) 1939-04-22
US3933162A (en) 1973-05-17 1976-01-20 Automatic Revenue Controls (Europa) Ltd. Coin feeding devices
DE2909815C2 (de) 1979-03-13 1984-11-22 Wacker-Chemie GmbH, 8000 München Verfahren zur Herstellung von hochdispersem Siliciumdioxid
DE3016010C2 (de) 1980-04-25 1985-01-10 Degussa Ag, 6000 Frankfurt Verfahren zur pyrogenen Herstellung von Kieselsäure
US4501602A (en) 1982-09-15 1985-02-26 Corning Glass Works Process for making sintered glasses and ceramics
DE3376110D1 (en) 1983-12-22 1988-05-05 Shinetsu Chemical Co A method for the preparation of synthetic quartz glass suitable as a material of optical fibers
JPS60155551A (ja) 1984-01-24 1985-08-15 Toshiba Corp 光フアイバ用被覆ガラス
DE3427064A1 (de) * 1984-06-30 1986-01-23 Dynamit Nobel Ag, 5210 Troisdorf Modifizierte titan(iv)-acetylacetonate
US4877306A (en) 1987-09-30 1989-10-31 Corning Glass Works Coated optical waveguide fibers
US4915988A (en) 1988-06-22 1990-04-10 Georgia Tech Research Corporation Chemical vapor deposition of group IIA metals and precursors therefor
GB8905966D0 (en) 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
US5067975A (en) 1989-12-22 1991-11-26 Corning Incorporated Method of manufacturing optical waveguide fiber with titania-silica outer cladding
US5152819A (en) 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5043002A (en) 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
GB9304575D0 (en) * 1993-03-05 1993-04-21 Glaverbel Coated glass and method of manufacturing same
US5332702A (en) 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process

Also Published As

Publication number Publication date
EP0973957A4 (en) 2004-04-28
US6487879B1 (en) 2002-12-03
WO1998039496A1 (en) 1998-09-11
KR20000076000A (ko) 2000-12-26
EP0973957A1 (en) 2000-01-26
JP2001513744A (ja) 2001-09-04

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