JP2001513744A - チタニアドープ溶融シリカの製造方法 - Google Patents
チタニアドープ溶融シリカの製造方法Info
- Publication number
- JP2001513744A JP2001513744A JP53858998A JP53858998A JP2001513744A JP 2001513744 A JP2001513744 A JP 2001513744A JP 53858998 A JP53858998 A JP 53858998A JP 53858998 A JP53858998 A JP 53858998A JP 2001513744 A JP2001513744 A JP 2001513744A
- Authority
- JP
- Japan
- Prior art keywords
- titania
- titanium
- silica
- fused silica
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/106—Single coatings
- C03C25/1061—Inorganic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. チタニアをドープした高純度溶融シリカガラス物体を製造する方法であっ て、 (a) 高純度溶融シリカの非晶質粒子を形成し、 (b) この粒子に蒸気形態のチタニアをドープし、 (c) このチタニアドープ非晶質粒子を支持体上に堆積させる各工程を含み、 前記チタニアが、アセチルアセトン酸チタン、アセト酢酸エチルチタン、およ びそれらの組合せからなる群より選択されたチタン含有化合物から製造されるこ とを特徴とする方法。 2. 前記堆積と実質的に同時かまたはその後のいずれかに、前記チタニアドー プ非晶質粒子の堆積物を非多孔質物体に固結させる工程を含むことを特徴とする 請求の範囲第1項記載の方法。 3. 前記チタニアドープ非晶質粒子が、金紅石および鋭錐石の超顕微鏡的結晶 を有し、この金紅石が主結晶相であることにより特徴付けられることを特徴とす る請求の範囲第2項記載の方法。 4. 前記チタン含有化合物がハロゲン化物を含まないことを特徴とする請求の 範囲第1項記載の方法。 5. 前記非多孔質物体が光ファイバであることを特徴とする請求の範囲第2項 記載の方法。 6. 前記支持体が、マンドレルおよびベイト管からなる群より選択されること を特徴とする請求の範囲第4項記載の方法。 7. 前記固結された非多孔質物体を線引きして、導波路ファイバを形成する工 程を含むことを特徴とする請求の範囲第2項記載の方法。 8. 請求の範囲第1項から第4項いずれかに記載の方法により製造された溶融 シリカ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4004897P | 1997-03-07 | 1997-03-07 | |
US60/040,048 | 1997-03-07 | ||
PCT/US1998/003656 WO1998039496A1 (en) | 1997-03-07 | 1998-02-25 | Method of making titania-doped fused silica |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001513744A true JP2001513744A (ja) | 2001-09-04 |
JP2001513744A5 JP2001513744A5 (ja) | 2005-11-10 |
JP4350168B2 JP4350168B2 (ja) | 2009-10-21 |
Family
ID=21908805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53858998A Expired - Lifetime JP4350168B2 (ja) | 1997-03-07 | 1998-02-25 | チタニアドープ溶融シリカの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6487879B1 (ja) |
EP (1) | EP0973957A4 (ja) |
JP (1) | JP4350168B2 (ja) |
KR (1) | KR20000076000A (ja) |
WO (1) | WO1998039496A1 (ja) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8047023B2 (en) | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
JP2003291343A (ja) * | 2001-10-26 | 2003-10-14 | Seiko Epson Corp | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
US6672111B2 (en) * | 2001-12-21 | 2004-01-06 | Corning Incorporated | Method and apparatus for adding metals to fused silica |
US6630418B2 (en) | 2001-12-21 | 2003-10-07 | Corning Incorporated | Fused silica containing aluminum |
JP4323319B2 (ja) | 2001-12-21 | 2009-09-02 | コーニング インコーポレイテッド | アルミニウムを含有する溶融シリカ |
US6872506B2 (en) * | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
DE10319596A1 (de) * | 2003-05-02 | 2004-11-25 | Degussa Ag | Mehrkomponentenglas |
US6875226B2 (en) * | 2003-07-16 | 2005-04-05 | Laser therapy apparatus and laser therapy | |
EP1673801B1 (en) * | 2003-10-15 | 2014-04-09 | Brewer Science, Inc. | Developer-soluble materials and methods of using the same in via-first dual damascene applications |
DE102004015766B4 (de) * | 2004-03-23 | 2016-05-12 | Asahi Glass Co., Ltd. | Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat |
US20050255410A1 (en) | 2004-04-29 | 2005-11-17 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
US7914974B2 (en) | 2006-08-18 | 2011-03-29 | Brewer Science Inc. | Anti-reflective imaging layer for multiple patterning process |
US7361207B1 (en) | 2007-02-28 | 2008-04-22 | Corning Incorporated | System and method for electrostatically depositing aerosol particles |
US7393385B1 (en) | 2007-02-28 | 2008-07-01 | Corning Incorporated | Apparatus and method for electrostatically depositing aerosol particles |
US20080268165A1 (en) * | 2007-04-26 | 2008-10-30 | Curtis Robert Fekety | Process for making a porous substrate of glass powder formed through flame spray pyrolysis |
US20090029064A1 (en) * | 2007-07-25 | 2009-01-29 | Carlton Maurice Truesdale | Apparatus and method for making nanoparticles using a hot wall reactor |
US8133659B2 (en) | 2008-01-29 | 2012-03-13 | Brewer Science Inc. | On-track process for patterning hardmask by multiple dark field exposures |
US20100126227A1 (en) * | 2008-11-24 | 2010-05-27 | Curtis Robert Fekety | Electrostatically depositing conductive films during glass draw |
DE102008060924A1 (de) * | 2008-12-06 | 2010-06-10 | Innovent E.V. | Verfahren zur Abscheidung einer Schicht auf einem Substrat |
US9640396B2 (en) | 2009-01-07 | 2017-05-02 | Brewer Science Inc. | Spin-on spacer materials for double- and triple-patterning lithography |
US7998558B2 (en) * | 2009-02-27 | 2011-08-16 | Corning Incorporated | Glass sheet with protected edge, edge protector and method for making glass sheet using same |
JP6236866B2 (ja) * | 2013-05-15 | 2017-11-29 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー |
US9382151B2 (en) | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
US20150239767A1 (en) | 2014-02-26 | 2015-08-27 | Corning Incorporated | HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT |
JP2018513093A (ja) | 2015-03-26 | 2018-05-24 | コーニング インコーポレイテッド | 極紫外線リソグラフィーに使用するためのガラス複合体 |
US20210032767A1 (en) * | 2019-08-01 | 2021-02-04 | Lawrence Livermore National Security, Llc | Additive manufacturing of microanalytical reference materials |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2272342A (en) | 1934-08-27 | 1942-02-10 | Corning Glass Works | Method of making a transparent article of silica |
US2239551A (en) | 1939-04-22 | 1941-04-22 | Corning Glass Works | Method of making sealing glasses and seals for quartz lamps |
BE438752A (ja) | 1939-04-22 | |||
US3933162A (en) | 1973-05-17 | 1976-01-20 | Automatic Revenue Controls (Europa) Ltd. | Coin feeding devices |
DE2909815C2 (de) | 1979-03-13 | 1984-11-22 | Wacker-Chemie GmbH, 8000 München | Verfahren zur Herstellung von hochdispersem Siliciumdioxid |
DE3016010C2 (de) | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
US4501602A (en) | 1982-09-15 | 1985-02-26 | Corning Glass Works | Process for making sintered glasses and ceramics |
EP0146659B1 (en) | 1983-12-22 | 1988-03-30 | Shin-Etsu Chemical Co., Ltd. | A method for the preparation of synthetic quartz glass suitable as a material of optical fibers |
JPS60155551A (ja) | 1984-01-24 | 1985-08-15 | Toshiba Corp | 光フアイバ用被覆ガラス |
DE3427064A1 (de) * | 1984-06-30 | 1986-01-23 | Dynamit Nobel Ag, 5210 Troisdorf | Modifizierte titan(iv)-acetylacetonate |
US4877306A (en) | 1987-09-30 | 1989-10-31 | Corning Glass Works | Coated optical waveguide fibers |
US4915988A (en) | 1988-06-22 | 1990-04-10 | Georgia Tech Research Corporation | Chemical vapor deposition of group IIA metals and precursors therefor |
GB8905966D0 (en) | 1989-03-15 | 1989-04-26 | Tsl Group Plc | Improved vitreous silica products |
US5067975A (en) | 1989-12-22 | 1991-11-26 | Corning Incorporated | Method of manufacturing optical waveguide fiber with titania-silica outer cladding |
US5043002A (en) | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
US5152819A (en) | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
US5154744A (en) * | 1991-08-26 | 1992-10-13 | Corning Incorporated | Method of making titania-doped fused silica |
GB9304575D0 (en) * | 1993-03-05 | 1993-04-21 | Glaverbel | Coated glass and method of manufacturing same |
US5332702A (en) | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
-
1998
- 1998-02-25 US US09/380,554 patent/US6487879B1/en not_active Expired - Lifetime
- 1998-02-25 EP EP98908711A patent/EP0973957A4/en not_active Withdrawn
- 1998-02-25 KR KR1019997008086A patent/KR20000076000A/ko not_active Application Discontinuation
- 1998-02-25 JP JP53858998A patent/JP4350168B2/ja not_active Expired - Lifetime
- 1998-02-25 WO PCT/US1998/003656 patent/WO1998039496A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO1998039496A1 (en) | 1998-09-11 |
EP0973957A1 (en) | 2000-01-26 |
US6487879B1 (en) | 2002-12-03 |
EP0973957A4 (en) | 2004-04-28 |
JP4350168B2 (ja) | 2009-10-21 |
KR20000076000A (ko) | 2000-12-26 |
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