JP2001513744A5 - - Google Patents
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- Publication number
- JP2001513744A5 JP2001513744A5 JP1998538589A JP53858998A JP2001513744A5 JP 2001513744 A5 JP2001513744 A5 JP 2001513744A5 JP 1998538589 A JP1998538589 A JP 1998538589A JP 53858998 A JP53858998 A JP 53858998A JP 2001513744 A5 JP2001513744 A5 JP 2001513744A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Description
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4004897P | 1997-03-07 | 1997-03-07 | |
| US60/040,048 | 1997-03-07 | ||
| PCT/US1998/003656 WO1998039496A1 (en) | 1997-03-07 | 1998-02-25 | Method of making titania-doped fused silica |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001513744A JP2001513744A (ja) | 2001-09-04 |
| JP2001513744A5 true JP2001513744A5 (ja) | 2005-11-10 |
| JP4350168B2 JP4350168B2 (ja) | 2009-10-21 |
Family
ID=21908805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53858998A Expired - Lifetime JP4350168B2 (ja) | 1997-03-07 | 1998-02-25 | チタニアドープ溶融シリカの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6487879B1 (ja) |
| EP (1) | EP0973957A4 (ja) |
| JP (1) | JP4350168B2 (ja) |
| KR (1) | KR20000076000A (ja) |
| WO (1) | WO1998039496A1 (ja) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8047023B2 (en) * | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
| JP2003291343A (ja) * | 2001-10-26 | 2003-10-14 | Seiko Epson Corp | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
| US6630418B2 (en) | 2001-12-21 | 2003-10-07 | Corning Incorporated | Fused silica containing aluminum |
| US6672111B2 (en) * | 2001-12-21 | 2004-01-06 | Corning Incorporated | Method and apparatus for adding metals to fused silica |
| EP1456143A1 (en) | 2001-12-21 | 2004-09-15 | Corning Incorporated | Fused silica containing aluminum |
| US6872506B2 (en) * | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
| DE10319596A1 (de) * | 2003-05-02 | 2004-11-25 | Degussa Ag | Mehrkomponentenglas |
| US6875226B2 (en) * | 2003-07-16 | 2005-04-05 | Laser therapy apparatus and laser therapy | |
| WO2005038878A2 (en) * | 2003-10-15 | 2005-04-28 | Brewer Science Inc. | Developer-soluble materials and methods of using the same in via-first dual damascene applications |
| DE102004015766B4 (de) * | 2004-03-23 | 2016-05-12 | Asahi Glass Co., Ltd. | Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat |
| US20050255410A1 (en) | 2004-04-29 | 2005-11-17 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| US7914974B2 (en) | 2006-08-18 | 2011-03-29 | Brewer Science Inc. | Anti-reflective imaging layer for multiple patterning process |
| US7393385B1 (en) | 2007-02-28 | 2008-07-01 | Corning Incorporated | Apparatus and method for electrostatically depositing aerosol particles |
| US7361207B1 (en) | 2007-02-28 | 2008-04-22 | Corning Incorporated | System and method for electrostatically depositing aerosol particles |
| US20080268165A1 (en) * | 2007-04-26 | 2008-10-30 | Curtis Robert Fekety | Process for making a porous substrate of glass powder formed through flame spray pyrolysis |
| US20090029064A1 (en) * | 2007-07-25 | 2009-01-29 | Carlton Maurice Truesdale | Apparatus and method for making nanoparticles using a hot wall reactor |
| WO2009097436A2 (en) | 2008-01-29 | 2009-08-06 | Brewer Science Inc. | On-track process for patterning hardmask by multiple dark field exposures |
| US20100126227A1 (en) * | 2008-11-24 | 2010-05-27 | Curtis Robert Fekety | Electrostatically depositing conductive films during glass draw |
| DE102008060924A1 (de) * | 2008-12-06 | 2010-06-10 | Innovent E.V. | Verfahren zur Abscheidung einer Schicht auf einem Substrat |
| US9640396B2 (en) | 2009-01-07 | 2017-05-02 | Brewer Science Inc. | Spin-on spacer materials for double- and triple-patterning lithography |
| US7998558B2 (en) * | 2009-02-27 | 2011-08-16 | Corning Incorporated | Glass sheet with protected edge, edge protector and method for making glass sheet using same |
| JP6236866B2 (ja) * | 2013-05-15 | 2017-11-29 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー |
| US9382151B2 (en) | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
| US20150239767A1 (en) | 2014-02-26 | 2015-08-27 | Corning Incorporated | HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT |
| EP3274311B1 (en) | 2015-03-26 | 2020-06-17 | Corning Incorporated | Glass composite for use in extreme ultra-violet lithography |
| US20210032767A1 (en) * | 2019-08-01 | 2021-02-04 | Lawrence Livermore National Security, Llc | Additive manufacturing of microanalytical reference materials |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2272342A (en) | 1934-08-27 | 1942-02-10 | Corning Glass Works | Method of making a transparent article of silica |
| US2239551A (en) | 1939-04-22 | 1941-04-22 | Corning Glass Works | Method of making sealing glasses and seals for quartz lamps |
| BE438752A (ja) | 1939-04-22 | |||
| US3933162A (en) | 1973-05-17 | 1976-01-20 | Automatic Revenue Controls (Europa) Ltd. | Coin feeding devices |
| DE2909815C2 (de) | 1979-03-13 | 1984-11-22 | Wacker-Chemie GmbH, 8000 München | Verfahren zur Herstellung von hochdispersem Siliciumdioxid |
| DE3016010C2 (de) | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
| US4501602A (en) | 1982-09-15 | 1985-02-26 | Corning Glass Works | Process for making sintered glasses and ceramics |
| DE3376110D1 (en) | 1983-12-22 | 1988-05-05 | Shinetsu Chemical Co | A method for the preparation of synthetic quartz glass suitable as a material of optical fibers |
| JPS60155551A (ja) | 1984-01-24 | 1985-08-15 | Toshiba Corp | 光フアイバ用被覆ガラス |
| DE3427064A1 (de) * | 1984-06-30 | 1986-01-23 | Dynamit Nobel Ag, 5210 Troisdorf | Modifizierte titan(iv)-acetylacetonate |
| US4877306A (en) | 1987-09-30 | 1989-10-31 | Corning Glass Works | Coated optical waveguide fibers |
| US4915988A (en) | 1988-06-22 | 1990-04-10 | Georgia Tech Research Corporation | Chemical vapor deposition of group IIA metals and precursors therefor |
| GB8905966D0 (en) | 1989-03-15 | 1989-04-26 | Tsl Group Plc | Improved vitreous silica products |
| US5067975A (en) | 1989-12-22 | 1991-11-26 | Corning Incorporated | Method of manufacturing optical waveguide fiber with titania-silica outer cladding |
| US5043002A (en) | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5152819A (en) | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| US5154744A (en) * | 1991-08-26 | 1992-10-13 | Corning Incorporated | Method of making titania-doped fused silica |
| GB9304575D0 (en) * | 1993-03-05 | 1993-04-21 | Glaverbel | Coated glass and method of manufacturing same |
| US5332702A (en) | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
-
1998
- 1998-02-25 JP JP53858998A patent/JP4350168B2/ja not_active Expired - Lifetime
- 1998-02-25 EP EP98908711A patent/EP0973957A4/en not_active Withdrawn
- 1998-02-25 KR KR1019997008086A patent/KR20000076000A/ko not_active Application Discontinuation
- 1998-02-25 US US09/380,554 patent/US6487879B1/en not_active Expired - Lifetime
- 1998-02-25 WO PCT/US1998/003656 patent/WO1998039496A1/en not_active Application Discontinuation