JP4346899B2 - 静電チャックの製造方法 - Google Patents

静電チャックの製造方法 Download PDF

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Publication number
JP4346899B2
JP4346899B2 JP2002372875A JP2002372875A JP4346899B2 JP 4346899 B2 JP4346899 B2 JP 4346899B2 JP 2002372875 A JP2002372875 A JP 2002372875A JP 2002372875 A JP2002372875 A JP 2002372875A JP 4346899 B2 JP4346899 B2 JP 4346899B2
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Japan
Prior art keywords
aluminum nitride
calcium content
ppm
volume resistivity
electrostatic chuck
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Expired - Lifetime
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Japanese (ja)
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JP2004203647A5 (enrdf_load_stackoverflow
JP2004203647A (ja
Inventor
弘人 松田
和宏 ▲のぼり▼
豊 森
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NGK Insulators Ltd
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NGK Insulators Ltd
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Priority to JP2002372875A priority Critical patent/JP4346899B2/ja
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Publication of JP2004203647A5 publication Critical patent/JP2004203647A5/ja
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  • Ceramic Products (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2002372875A 2002-12-24 2002-12-24 静電チャックの製造方法 Expired - Lifetime JP4346899B2 (ja)

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JP2002372875A JP4346899B2 (ja) 2002-12-24 2002-12-24 静電チャックの製造方法

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Application Number Priority Date Filing Date Title
JP2002372875A JP4346899B2 (ja) 2002-12-24 2002-12-24 静電チャックの製造方法

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JP2004203647A JP2004203647A (ja) 2004-07-22
JP2004203647A5 JP2004203647A5 (enrdf_load_stackoverflow) 2007-01-11
JP4346899B2 true JP4346899B2 (ja) 2009-10-21

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110352182A (zh) * 2018-02-08 2019-10-18 日本碍子株式会社 半导体制造装置用加热器

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4773744B2 (ja) * 2005-03-30 2011-09-14 株式会社トクヤマ 窒化アルミニウム焼結体の製造方法
KR20140017515A (ko) * 2010-12-14 2014-02-11 헥사테크, 인크. 다결정 알루미늄 질화물 소결체들을 위한 열팽창 엔지니어링 및 반도체들의 제조에의 응용
US10566228B2 (en) 2018-02-08 2020-02-18 Ngk Insulators, Ltd. Heater for semiconductor manufacturing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110352182A (zh) * 2018-02-08 2019-10-18 日本碍子株式会社 半导体制造装置用加热器
CN110352182B (zh) * 2018-02-08 2022-02-08 日本碍子株式会社 半导体制造装置用加热器

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JP2004203647A (ja) 2004-07-22

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