JP4339842B2 - リソグラフィ装置及びデバイス製造方法 - Google Patents

リソグラフィ装置及びデバイス製造方法 Download PDF

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JP4339842B2
JP4339842B2 JP2005335740A JP2005335740A JP4339842B2 JP 4339842 B2 JP4339842 B2 JP 4339842B2 JP 2005335740 A JP2005335740 A JP 2005335740A JP 2005335740 A JP2005335740 A JP 2005335740A JP 4339842 B2 JP4339842 B2 JP 4339842B2
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substrate
array
scanning direction
projection system
groups
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JP2006148123A (ja
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ヴィレム ヘルマン デ イェガー ピーター
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005335740A 2004-11-22 2005-11-21 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP4339842B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/994,185 US7061581B1 (en) 2004-11-22 2004-11-22 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

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JP2009139843A Division JP4854765B2 (ja) 2004-11-22 2009-06-11 リソグラフィ装置及びデバイス製造方法

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JP2006148123A JP2006148123A (ja) 2006-06-08
JP4339842B2 true JP4339842B2 (ja) 2009-10-07

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JP2005335740A Expired - Fee Related JP4339842B2 (ja) 2004-11-22 2005-11-21 リソグラフィ装置及びデバイス製造方法
JP2009139843A Expired - Fee Related JP4854765B2 (ja) 2004-11-22 2009-06-11 リソグラフィ装置及びデバイス製造方法

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US (2) US7061581B1 (enExample)
JP (2) JP4339842B2 (enExample)

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JP5704535B2 (ja) * 2011-04-05 2015-04-22 株式会社ブイ・テクノロジー マイクロレンズアレイを使用した露光装置
JP5825470B2 (ja) * 2011-05-16 2015-12-02 株式会社ブイ・テクノロジー 露光装置及び遮光板
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US8670172B2 (en) 2011-08-24 2014-03-11 Palo Alto Research Center Incorporated Variable length imaging method using electronically registered and stitched single-pass imaging
US8872875B2 (en) 2011-08-24 2014-10-28 Palo Alto Research Center Incorporated Single-pass imaging system with anamorphic optical system
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US9630424B2 (en) 2011-08-24 2017-04-25 Palo Alto Research Center Incorporated VCSEL-based variable image optical line generator
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US8477403B2 (en) 2011-08-24 2013-07-02 Palo Alto Research Center Incorporated Variable length imaging apparatus using electronically registered and stitched single-pass imaging systems
US8390917B1 (en) 2011-08-24 2013-03-05 Palo Alto Research Center Incorporated Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics
US8502853B2 (en) 2011-08-24 2013-08-06 Palo Alto Research Center Incorporated Single-pass imaging method with image data scrolling for improved resolution contrast and exposure extent
US8791972B2 (en) 2012-02-13 2014-07-29 Xerox Corporation Reflex-type digital offset printing system with serially arranged single-pass, single-color imaging systems
US9229332B2 (en) * 2013-09-18 2016-01-05 Taiwan Semiconductor Manufacturing Company, Ltd. Systems and methods for high-throughput and small-footprint scanning exposure for lithography
US9354379B2 (en) 2014-09-29 2016-05-31 Palo Alto Research Center Incorporated Light guide based optical system for laser line generator
EP3302985B1 (en) 2015-05-27 2020-12-16 Landa Labs (2012) Ltd. Imaging device
AU2016268513B2 (en) * 2015-05-27 2020-08-27 Landa Labs (2012) Ltd. Printing method and apparatus for coating selected regions of a substrate with a film
GB201509080D0 (en) 2015-05-27 2015-07-08 Landa Labs 2012 Ltd Coating apparatus
US11701684B2 (en) 2015-05-27 2023-07-18 Landa Labs (2012) Ltd. Method for coating a surface with a transferable layer of thermoplastic particles and related apparatus
CN110023092B (zh) 2016-11-30 2021-08-20 兰达实验室（2012）有限公司 热转印打印的改进

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JP4617616B2 (ja) * 2001-07-11 2011-01-26 株式会社ニコン 露光装置及び露光方法
JP3563384B2 (ja) 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
KR100545297B1 (ko) 2002-06-12 2006-01-24 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6870554B2 (en) 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
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JP2004303879A (ja) * 2003-03-31 2004-10-28 Nikon Corp 露光装置、該露光装置における可変パターン生成装置の交換方法及び露光方法
JP4390189B2 (ja) * 2003-04-10 2009-12-24 大日本スクリーン製造株式会社 パターン描画装置
EP1482373A1 (en) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6967711B2 (en) * 2004-03-09 2005-11-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7061581B1 (en) * 2004-11-22 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US20060232758A1 (en) 2006-10-19
JP2006148123A (ja) 2006-06-08
JP4854765B2 (ja) 2012-01-18
US7218380B2 (en) 2007-05-15
US7061581B1 (en) 2006-06-13
US20060109440A1 (en) 2006-05-25
JP2009260362A (ja) 2009-11-05

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