JP4337067B2 - ズーム光学系および該ズーム光学系を備えた露光装置および露光方法 - Google Patents

ズーム光学系および該ズーム光学系を備えた露光装置および露光方法 Download PDF

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Publication number
JP4337067B2
JP4337067B2 JP09073599A JP9073599A JP4337067B2 JP 4337067 B2 JP4337067 B2 JP 4337067B2 JP 09073599 A JP09073599 A JP 09073599A JP 9073599 A JP9073599 A JP 9073599A JP 4337067 B2 JP4337067 B2 JP 4337067B2
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JP
Japan
Prior art keywords
focal length
lens group
optical system
refractive power
lens
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Expired - Fee Related
Application number
JP09073599A
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English (en)
Japanese (ja)
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JP2000284176A5 (enExample
JP2000284176A (ja
Inventor
秀基 小松田
哲男 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP09073599A priority Critical patent/JP4337067B2/ja
Priority to US09/540,874 priority patent/US6563567B1/en
Publication of JP2000284176A publication Critical patent/JP2000284176A/ja
Priority to US10/377,700 priority patent/US20030160949A1/en
Priority to US10/378,816 priority patent/US20030156269A1/en
Priority to US10/378,867 priority patent/US20030156266A1/en
Publication of JP2000284176A5 publication Critical patent/JP2000284176A5/ja
Application granted granted Critical
Publication of JP4337067B2 publication Critical patent/JP4337067B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/144—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only
    • G02B15/1441—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being positive
    • G02B15/144105—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being positive arranged +-+-
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/144—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only
    • G02B15/1445—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being negative
    • G02B15/144511—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having four groups only the first group being negative arranged -+-+
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/145—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having five groups only
    • G02B15/1455—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having five groups only the first group being negative
    • G02B15/145511—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having five groups only the first group being negative arranged -+-+-
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP09073599A 1998-12-17 1999-03-31 ズーム光学系および該ズーム光学系を備えた露光装置および露光方法 Expired - Fee Related JP4337067B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP09073599A JP4337067B2 (ja) 1999-03-31 1999-03-31 ズーム光学系および該ズーム光学系を備えた露光装置および露光方法
US09/540,874 US6563567B1 (en) 1998-12-17 2000-03-31 Method and apparatus for illuminating a surface using a projection imaging apparatus
US10/377,700 US20030160949A1 (en) 1998-12-17 2003-03-04 Method and apparatus for illuminating a surface using a projection imaging apparatus
US10/378,816 US20030156269A1 (en) 1998-12-17 2003-03-05 Method and apparatus for illuminating a surface using a projection imaging apparatus
US10/378,867 US20030156266A1 (en) 1998-12-17 2003-03-05 Method and apparatus for illuminating a surface using a projection imaging apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09073599A JP4337067B2 (ja) 1999-03-31 1999-03-31 ズーム光学系および該ズーム光学系を備えた露光装置および露光方法

Publications (3)

Publication Number Publication Date
JP2000284176A JP2000284176A (ja) 2000-10-13
JP2000284176A5 JP2000284176A5 (enExample) 2008-02-28
JP4337067B2 true JP4337067B2 (ja) 2009-09-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP09073599A Expired - Fee Related JP4337067B2 (ja) 1998-12-17 1999-03-31 ズーム光学系および該ズーム光学系を備えた露光装置および露光方法

Country Status (1)

Country Link
JP (1) JP4337067B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002207167A (ja) * 2001-01-10 2002-07-26 Nikon Corp ズーム光学系および該ズーム光学系を備えた露光装置および露光方法
DE10144246A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
JP2005055496A (ja) * 2003-08-05 2005-03-03 Olympus Corp 変倍光学系
JP4615852B2 (ja) * 2003-12-12 2011-01-19 オリンパス株式会社 変倍光学系及びそれを用いた電子機器
CN100520482C (zh) * 2005-03-11 2009-07-29 索尼株式会社 变焦镜头及摄像装置
CN102736221B (zh) * 2011-03-31 2015-02-11 上海微电子装备有限公司 一种投影光刻物镜
DE102018205315B4 (de) * 2018-04-09 2024-06-20 Clay Paky S.R.L. Optisches System mit Diffusoren und Wabenkondensoren
CN112882208B (zh) * 2019-11-29 2022-08-02 上海微电子装备（集团）股份有限公司 大视场成像物镜
CN110989138B (zh) * 2019-12-23 2021-03-19 中国科学院长春光学精密机械与物理研究所 一种大视场宽光谱无焦光学系统
CN111443471B (zh) * 2020-05-09 2024-10-22 深圳市雷影光电科技有限公司 内合焦式成像镜头
CN115903357A (zh) * 2021-08-20 2023-04-04 巴可伟视(北京)电子有限公司 一种变焦偏振转换系统
CN119343619A (zh) * 2022-06-09 2025-01-21 Lg伊诺特有限公司 光学系统和摄像装置模块
CN117250736B (zh) * 2023-11-17 2024-01-26 南京信息工程大学 一种大像面高分辨率宽光谱星敏感器光学系统
CN118363152B (zh) * 2024-06-19 2024-09-17 长春智灵光电科技有限公司 一种紫外飞秒激光器的镜头

Also Published As

Publication number Publication date
JP2000284176A (ja) 2000-10-13

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