JP4323616B2 - エバネッセント光露光マスク及びエバネッセント光露光装置 - Google Patents

エバネッセント光露光マスク及びエバネッセント光露光装置 Download PDF

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Publication number
JP4323616B2
JP4323616B2 JP12452999A JP12452999A JP4323616B2 JP 4323616 B2 JP4323616 B2 JP 4323616B2 JP 12452999 A JP12452999 A JP 12452999A JP 12452999 A JP12452999 A JP 12452999A JP 4323616 B2 JP4323616 B2 JP 4323616B2
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Prior art keywords
exposure
mask
light
evanescent light
thin film
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Expired - Fee Related
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JP12452999A
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Japanese (ja)
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JP2000314955A (ja
JP2000314955A5 (enExample
Inventor
亮 黒田
貴子 山口
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Canon Inc
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Canon Inc
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Priority to JP12452999A priority Critical patent/JP4323616B2/ja
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Publication of JP2000314955A5 publication Critical patent/JP2000314955A5/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12452999A 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置 Expired - Fee Related JP4323616B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12452999A JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12452999A JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Publications (3)

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JP2000314955A JP2000314955A (ja) 2000-11-14
JP2000314955A5 JP2000314955A5 (enExample) 2006-06-15
JP4323616B2 true JP4323616B2 (ja) 2009-09-02

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JP12452999A Expired - Fee Related JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

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JP (1) JP4323616B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3334685B2 (ja) 1999-06-30 2002-10-15 日本電気株式会社 露光方法
JP3715973B2 (ja) 2002-05-07 2005-11-16 キヤノン株式会社 近接場光露光用のフォトマスク、該フォトマスクを用いたパターン作製方法およびパターン作製装置
US20060021666A1 (en) * 2002-11-01 2006-02-02 Waseda University Microsystem, microopening film, and system and method for analizing interaction between biomolecules
CN113238454B (zh) * 2021-03-30 2024-07-19 上海华力微电子有限公司 光掩模结构和光刻设备

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Publication number Publication date
JP2000314955A (ja) 2000-11-14

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