JP2000314955A5 - - Google Patents

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Publication number
JP2000314955A5
JP2000314955A5 JP1999124529A JP12452999A JP2000314955A5 JP 2000314955 A5 JP2000314955 A5 JP 2000314955A5 JP 1999124529 A JP1999124529 A JP 1999124529A JP 12452999 A JP12452999 A JP 12452999A JP 2000314955 A5 JP2000314955 A5 JP 2000314955A5
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JP
Japan
Prior art keywords
exposure
light
mask
pattern
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999124529A
Other languages
English (en)
Japanese (ja)
Other versions
JP4323616B2 (ja
JP2000314955A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP12452999A priority Critical patent/JP4323616B2/ja
Priority claimed from JP12452999A external-priority patent/JP4323616B2/ja
Publication of JP2000314955A publication Critical patent/JP2000314955A/ja
Publication of JP2000314955A5 publication Critical patent/JP2000314955A5/ja
Application granted granted Critical
Publication of JP4323616B2 publication Critical patent/JP4323616B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP12452999A 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置 Expired - Fee Related JP4323616B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12452999A JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12452999A JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Publications (3)

Publication Number Publication Date
JP2000314955A JP2000314955A (ja) 2000-11-14
JP2000314955A5 true JP2000314955A5 (enExample) 2006-06-15
JP4323616B2 JP4323616B2 (ja) 2009-09-02

Family

ID=14887742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12452999A Expired - Fee Related JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Country Status (1)

Country Link
JP (1) JP4323616B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3334685B2 (ja) 1999-06-30 2002-10-15 日本電気株式会社 露光方法
JP3715973B2 (ja) 2002-05-07 2005-11-16 キヤノン株式会社 近接場光露光用のフォトマスク、該フォトマスクを用いたパターン作製方法およびパターン作製装置
US20060021666A1 (en) * 2002-11-01 2006-02-02 Waseda University Microsystem, microopening film, and system and method for analizing interaction between biomolecules
CN113238454B (zh) * 2021-03-30 2024-07-19 上海华力微电子有限公司 光掩模结构和光刻设备

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