JP4320312B2 - 相変化膜を含む記録媒体の製造方法 - Google Patents

相変化膜を含む記録媒体の製造方法 Download PDF

Info

Publication number
JP4320312B2
JP4320312B2 JP2005162513A JP2005162513A JP4320312B2 JP 4320312 B2 JP4320312 B2 JP 4320312B2 JP 2005162513 A JP2005162513 A JP 2005162513A JP 2005162513 A JP2005162513 A JP 2005162513A JP 4320312 B2 JP4320312 B2 JP 4320312B2
Authority
JP
Japan
Prior art keywords
phase change
film
amorphous
change film
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005162513A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006338787A5 (https=
JP2006338787A (ja
Inventor
由美子 安齋
俊通 新谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2005162513A priority Critical patent/JP4320312B2/ja
Priority to US11/209,649 priority patent/US20060275712A1/en
Publication of JP2006338787A publication Critical patent/JP2006338787A/ja
Publication of JP2006338787A5 publication Critical patent/JP2006338787A5/ja
Application granted granted Critical
Publication of JP4320312B2 publication Critical patent/JP4320312B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266Sputtering or spin-coating layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/0045Recording
    • G11B7/00454Recording involving phase-change effects

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP2005162513A 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法 Expired - Fee Related JP4320312B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005162513A JP4320312B2 (ja) 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法
US11/209,649 US20060275712A1 (en) 2005-06-02 2005-08-24 Method for fabrication of physical patterns and the method for fabrication of device using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005162513A JP4320312B2 (ja) 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法

Publications (3)

Publication Number Publication Date
JP2006338787A JP2006338787A (ja) 2006-12-14
JP2006338787A5 JP2006338787A5 (https=) 2008-05-08
JP4320312B2 true JP4320312B2 (ja) 2009-08-26

Family

ID=37494528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005162513A Expired - Fee Related JP4320312B2 (ja) 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法

Country Status (2)

Country Link
US (1) US20060275712A1 (https=)
JP (1) JP4320312B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6788963B2 (en) * 2002-08-08 2004-09-07 Flarion Technologies, Inc. Methods and apparatus for operating mobile nodes in multiple a states
JP4685754B2 (ja) 2006-12-28 2011-05-18 株式会社日立製作所 トラッキング方法
JP4903081B2 (ja) * 2007-05-17 2012-03-21 株式会社日立製作所 光ディスク媒体及びトラッキング方法
SG156564A1 (en) * 2008-04-09 2009-11-26 Asml Holding Nv Lithographic apparatus and device manufacturing method
EP2345932A4 (en) * 2008-10-14 2012-06-13 Asahi Kasei Corp HEAT-RESISTANT RESISTANT MATERIAL, LAMINATED BODY FOR THERMAL LITHOGRAPHY WITH THE MATERIAL AND MOLDING PROCESS WITH THE MATERIAL AND LAMINATE BODY
CN114512150B (zh) 2020-11-16 2025-02-18 华为技术有限公司 一种光存储介质、光存储介质制备方法以及系统

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4423138A (en) * 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
US5051340A (en) * 1989-06-23 1991-09-24 Eastman Kodak Company Master for optical element replication
JPH086256A (ja) * 1994-06-24 1996-01-12 Mitsubishi Electric Corp レジストパターンの形成方法および該方法に用いられる酸性の水溶性材料組成物
US5935733A (en) * 1996-04-05 1999-08-10 Intel Corporation Photolithography mask and method of fabrication
US6030556A (en) * 1997-07-08 2000-02-29 Imation Corp. Optical disc stampers and methods/systems for manufacturing the same
US6964804B2 (en) * 2001-02-14 2005-11-15 Shipley Company, L.L.C. Micromachined structures made by combined wet and dry etching
US6780766B2 (en) * 2001-04-06 2004-08-24 Micron Technology, Inc. Methods of forming regions of differing composition over a substrate
US6511896B2 (en) * 2001-04-06 2003-01-28 Micron Technology, Inc. Method of etching a substantially amorphous TA2O5 comprising layer
US6969472B2 (en) * 2001-04-19 2005-11-29 Lsi Logic Corporation Method of fabricating sub-micron hemispherical and hemicylidrical structures from non-spherically shaped templates
JP4120268B2 (ja) * 2002-05-27 2008-07-16 株式会社日立製作所 情報記録媒体および情報記録方法
US6831019B1 (en) * 2002-08-29 2004-12-14 Micron Technology, Inc. Plasma etching methods and methods of forming memory devices comprising a chalcogenide comprising layer received operably proximate conductive electrodes
EP1482494A3 (en) * 2003-05-28 2007-08-29 Matsushita Electric Industrial Co., Ltd. Method for producing master for optical information recording media
TW200504746A (en) * 2003-06-23 2005-02-01 Matsushita Electric Industrial Co Ltd Method for producing stamper for optical information recording medium

Also Published As

Publication number Publication date
US20060275712A1 (en) 2006-12-07
JP2006338787A (ja) 2006-12-14

Similar Documents

Publication Publication Date Title
CN1288500C (zh) 抗蚀剂材料和微加工方法
EP1551020B1 (en) Method of producing optical disk-use original and method of producing optical disk
JP4320312B2 (ja) 相変化膜を含む記録媒体の製造方法
JP2005100526A (ja) デバイスの製造方法及び観察方法
KR20040104371A (ko) 광 정보 기록매체의 원반 제조방법
US7223505B2 (en) Method for forming micropatterns
JP3879726B2 (ja) 光ディスク用原盤の製造方法及び光ディスクの製造方法
CN1981336A (zh) 多值只读存储器盘的冲压器的制造方法及其制造设备和所制造的盘
JP4101736B2 (ja) 原盤、スタンパ、光記録媒体及びromディスクの製造方法
KR20050024195A (ko) 광정보 기록매체용 스탬퍼의 제조방법, 광정보 기록매체용스탬퍼 및 그 원반, 광정보 기록매체
US20040256762A1 (en) Method for producing stamper for optical information recording medium
CN100582936C (zh) 抗蚀剂材料和微加工方法
JP4678325B2 (ja) 光ディスク原盤の製造方法
JP4397884B2 (ja) 微細パターンの形成方法及び光メモリ素子用原盤の製造方法、並びに光メモリ素子用原盤、光メモリ素子用スタンパ及び光メモリ素子
JP4554401B2 (ja) 微細構造形成方法、光加工装置および光記録媒体
JP4463224B2 (ja) 凸構造基体とその製造方法、凸構造基体からなる記録媒体用原盤とその製造方法
JP2007018569A (ja) デバイス及びその製造方法
JP2008135090A (ja) レジスト、これを用いた光ディスク用スタンパの製造方法、及び光ディスク用スタンパ
JP2009507316A (ja) 高密度凹凸構造を複製するスタンパの製造方法
JP4092305B2 (ja) 光情報記録媒体のスタンパの製造方法
JP2008527590A (ja) マスタリング方法及びマスタリング基板
TW200919550A (en) A method of generating a pattern on a substrate
JP2010146688A (ja) 微細加工体および微細構造体の製造方法、ならびに光記録媒体の製造方法
JP2000113520A (ja) 光ディスク原盤の製造方法
JP4081981B2 (ja) 光ディスク媒体の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080319

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080319

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090302

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090310

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090501

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090526

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090601

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120605

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120605

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120605

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130605

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees