JP2006338787A5 - - Google Patents

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Publication number
JP2006338787A5
JP2006338787A5 JP2005162513A JP2005162513A JP2006338787A5 JP 2006338787 A5 JP2006338787 A5 JP 2006338787A5 JP 2005162513 A JP2005162513 A JP 2005162513A JP 2005162513 A JP2005162513 A JP 2005162513A JP 2006338787 A5 JP2006338787 A5 JP 2006338787A5
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JP
Japan
Prior art keywords
recording medium
manufacturing
phase change
region
change film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005162513A
Other languages
English (en)
Japanese (ja)
Other versions
JP4320312B2 (ja
JP2006338787A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005162513A priority Critical patent/JP4320312B2/ja
Priority claimed from JP2005162513A external-priority patent/JP4320312B2/ja
Priority to US11/209,649 priority patent/US20060275712A1/en
Publication of JP2006338787A publication Critical patent/JP2006338787A/ja
Publication of JP2006338787A5 publication Critical patent/JP2006338787A5/ja
Application granted granted Critical
Publication of JP4320312B2 publication Critical patent/JP4320312B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005162513A 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法 Expired - Fee Related JP4320312B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005162513A JP4320312B2 (ja) 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法
US11/209,649 US20060275712A1 (en) 2005-06-02 2005-08-24 Method for fabrication of physical patterns and the method for fabrication of device using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005162513A JP4320312B2 (ja) 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法

Publications (3)

Publication Number Publication Date
JP2006338787A JP2006338787A (ja) 2006-12-14
JP2006338787A5 true JP2006338787A5 (https=) 2008-05-08
JP4320312B2 JP4320312B2 (ja) 2009-08-26

Family

ID=37494528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005162513A Expired - Fee Related JP4320312B2 (ja) 2005-06-02 2005-06-02 相変化膜を含む記録媒体の製造方法

Country Status (2)

Country Link
US (1) US20060275712A1 (https=)
JP (1) JP4320312B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6788963B2 (en) * 2002-08-08 2004-09-07 Flarion Technologies, Inc. Methods and apparatus for operating mobile nodes in multiple a states
JP4685754B2 (ja) 2006-12-28 2011-05-18 株式会社日立製作所 トラッキング方法
JP4903081B2 (ja) * 2007-05-17 2012-03-21 株式会社日立製作所 光ディスク媒体及びトラッキング方法
SG156564A1 (en) * 2008-04-09 2009-11-26 Asml Holding Nv Lithographic apparatus and device manufacturing method
EP2345932A4 (en) * 2008-10-14 2012-06-13 Asahi Kasei Corp HEAT-RESISTANT RESISTANT MATERIAL, LAMINATED BODY FOR THERMAL LITHOGRAPHY WITH THE MATERIAL AND MOLDING PROCESS WITH THE MATERIAL AND LAMINATE BODY
CN114512150B (zh) 2020-11-16 2025-02-18 华为技术有限公司 一种光存储介质、光存储介质制备方法以及系统

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4423138A (en) * 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
US5051340A (en) * 1989-06-23 1991-09-24 Eastman Kodak Company Master for optical element replication
JPH086256A (ja) * 1994-06-24 1996-01-12 Mitsubishi Electric Corp レジストパターンの形成方法および該方法に用いられる酸性の水溶性材料組成物
US5935733A (en) * 1996-04-05 1999-08-10 Intel Corporation Photolithography mask and method of fabrication
US6030556A (en) * 1997-07-08 2000-02-29 Imation Corp. Optical disc stampers and methods/systems for manufacturing the same
US6964804B2 (en) * 2001-02-14 2005-11-15 Shipley Company, L.L.C. Micromachined structures made by combined wet and dry etching
US6780766B2 (en) * 2001-04-06 2004-08-24 Micron Technology, Inc. Methods of forming regions of differing composition over a substrate
US6511896B2 (en) * 2001-04-06 2003-01-28 Micron Technology, Inc. Method of etching a substantially amorphous TA2O5 comprising layer
US6969472B2 (en) * 2001-04-19 2005-11-29 Lsi Logic Corporation Method of fabricating sub-micron hemispherical and hemicylidrical structures from non-spherically shaped templates
JP4120268B2 (ja) * 2002-05-27 2008-07-16 株式会社日立製作所 情報記録媒体および情報記録方法
US6831019B1 (en) * 2002-08-29 2004-12-14 Micron Technology, Inc. Plasma etching methods and methods of forming memory devices comprising a chalcogenide comprising layer received operably proximate conductive electrodes
EP1482494A3 (en) * 2003-05-28 2007-08-29 Matsushita Electric Industrial Co., Ltd. Method for producing master for optical information recording media
TW200504746A (en) * 2003-06-23 2005-02-01 Matsushita Electric Industrial Co Ltd Method for producing stamper for optical information recording medium

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