JP4272796B2 - 基板の処理方法 - Google Patents

基板の処理方法 Download PDF

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Publication number
JP4272796B2
JP4272796B2 JP2000087263A JP2000087263A JP4272796B2 JP 4272796 B2 JP4272796 B2 JP 4272796B2 JP 2000087263 A JP2000087263 A JP 2000087263A JP 2000087263 A JP2000087263 A JP 2000087263A JP 4272796 B2 JP4272796 B2 JP 4272796B2
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Japan
Prior art keywords
substrate
layer
porous
electrolyte solution
anodizing
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Expired - Fee Related
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JP2000087263A
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English (en)
Japanese (ja)
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JP2000336499A5 (enExample
JP2000336499A (ja
Inventor
清文 坂口
憲二 山方
聡 松村
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Canon Inc
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Canon Inc
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Priority to JP2000087263A priority Critical patent/JP4272796B2/ja
Publication of JP2000336499A publication Critical patent/JP2000336499A/ja
Publication of JP2000336499A5 publication Critical patent/JP2000336499A5/ja
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JP2000087263A 1999-03-25 2000-03-27 基板の処理方法 Expired - Fee Related JP4272796B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000087263A JP4272796B2 (ja) 1999-03-25 2000-03-27 基板の処理方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8234999 1999-03-25
JP11-82349 1999-03-25
JP2000087263A JP4272796B2 (ja) 1999-03-25 2000-03-27 基板の処理方法

Publications (3)

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JP2000336499A JP2000336499A (ja) 2000-12-05
JP2000336499A5 JP2000336499A5 (enExample) 2006-06-15
JP4272796B2 true JP4272796B2 (ja) 2009-06-03

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JP2000087263A Expired - Fee Related JP4272796B2 (ja) 1999-03-25 2000-03-27 基板の処理方法

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JP (1) JP4272796B2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102204732B1 (ko) * 2019-11-11 2021-01-19 (주)더숨 Soi 기판 제조 방법
WO2021096114A1 (ko) * 2019-11-11 2021-05-20 (주)더숨 Soi 기판 제조 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102201710B1 (ko) * 2019-04-09 2021-01-12 한국생산기술연구원 이종의 전해액 및 양이온교환막을 포함하는 도금조 및 이를 이용한 리튬금속 도금방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102204732B1 (ko) * 2019-11-11 2021-01-19 (주)더숨 Soi 기판 제조 방법
WO2021096114A1 (ko) * 2019-11-11 2021-05-20 (주)더숨 Soi 기판 제조 방법

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JP2000336499A (ja) 2000-12-05

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