JP4268471B2 - 冷陰極の製造方法、及び冷陰極を用いた装置 - Google Patents

冷陰極の製造方法、及び冷陰極を用いた装置 Download PDF

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Publication number
JP4268471B2
JP4268471B2 JP2003272129A JP2003272129A JP4268471B2 JP 4268471 B2 JP4268471 B2 JP 4268471B2 JP 2003272129 A JP2003272129 A JP 2003272129A JP 2003272129 A JP2003272129 A JP 2003272129A JP 4268471 B2 JP4268471 B2 JP 4268471B2
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Prior art keywords
cold cathode
electrons
graphite
emitted
substrate
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Japanese (ja)
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JP2005032638A5 (enExample
JP2005032638A (ja
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貴裕 松本
秀典 三村
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Stanley Electric Co Ltd
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Stanley Electric Co Ltd
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  • Discharge Lamps And Accessories Thereof (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP2003272129A 2003-07-09 2003-07-09 冷陰極の製造方法、及び冷陰極を用いた装置 Expired - Fee Related JP4268471B2 (ja)

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JP2003272129A JP4268471B2 (ja) 2003-07-09 2003-07-09 冷陰極の製造方法、及び冷陰極を用いた装置

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JP2003272129A JP4268471B2 (ja) 2003-07-09 2003-07-09 冷陰極の製造方法、及び冷陰極を用いた装置

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JP2005032638A JP2005032638A (ja) 2005-02-03
JP2005032638A5 JP2005032638A5 (enExample) 2006-08-03
JP4268471B2 true JP4268471B2 (ja) 2009-05-27

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JP2003272129A Expired - Fee Related JP4268471B2 (ja) 2003-07-09 2003-07-09 冷陰極の製造方法、及び冷陰極を用いた装置

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4691363B2 (ja) * 2005-01-05 2011-06-01 株式会社ピュアロンジャパン フィールドエミッション型面状光源
JP2006294545A (ja) * 2005-04-14 2006-10-26 Dialight Japan Co Ltd 真空管
JP2006318702A (ja) 2005-05-11 2006-11-24 Mitsubishi Electric Corp 電子放出源の製造方法
JP4916221B2 (ja) * 2006-06-01 2012-04-11 スタンレー電気株式会社 冷陰極の製造方法、および、冷陰極を備えた装置の製造方法
JP4660522B2 (ja) * 2007-09-14 2011-03-30 財団法人高知県産業振興センター 発光装置
JP5081851B2 (ja) * 2009-02-26 2012-11-28 スタンレー電気株式会社 電界放出電子源の製造方法
JP5406748B2 (ja) * 2010-01-28 2014-02-05 スタンレー電気株式会社 電界放出型電子源及びその製造方法
JP5044005B2 (ja) * 2010-11-08 2012-10-10 マイクロＸジャパン株式会社 電界放射装置
CN104470178A (zh) * 2013-09-18 2015-03-25 清华大学 X射线装置以及具有该x射线装置的ct设备
JP6526014B2 (ja) * 2013-09-18 2019-06-05 清華大学Ｔｓｉｎｇｈｕａ Ｕｎｉｖｅｒｓｉｔｙ Ｘ線装置及び該ｘ線装置を有するｃｔデバイス

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