JP4267333B2 - 大型合成石英ガラス基板の製造方法 - Google Patents

大型合成石英ガラス基板の製造方法 Download PDF

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Publication number
JP4267333B2
JP4267333B2 JP2003015513A JP2003015513A JP4267333B2 JP 4267333 B2 JP4267333 B2 JP 4267333B2 JP 2003015513 A JP2003015513 A JP 2003015513A JP 2003015513 A JP2003015513 A JP 2003015513A JP 4267333 B2 JP4267333 B2 JP 4267333B2
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substrate
synthetic quartz
quartz glass
processing
flatness
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Japanese (ja)
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JP2003292346A5 (enrdf_load_stackoverflow
JP2003292346A (ja
Inventor
由紀夫 柴野
悟 三原田
修平 上田
厚 渡部
正樹 田畑
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Priority to JP2003015513A priority Critical patent/JP4267333B2/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
JP2003015513A 2002-01-31 2003-01-24 大型合成石英ガラス基板の製造方法 Expired - Lifetime JP4267333B2 (ja)

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JP2003015513A JP4267333B2 (ja) 2002-01-31 2003-01-24 大型合成石英ガラス基板の製造方法

Applications Claiming Priority (3)

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JP2002-23416 2002-01-31
JP2002023416 2002-01-31
JP2003015513A JP4267333B2 (ja) 2002-01-31 2003-01-24 大型合成石英ガラス基板の製造方法

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JP2004249820A Division JP4340893B2 (ja) 2002-01-31 2004-08-30 大型基板の製造方法

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JP2003292346A JP2003292346A (ja) 2003-10-15
JP2003292346A5 JP2003292346A5 (enrdf_load_stackoverflow) 2004-12-16
JP4267333B2 true JP4267333B2 (ja) 2009-05-27

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1566241B1 (en) 2004-02-18 2007-07-25 Shin-Etsu Chemical Co., Ltd. Method for preparing large-size substrate
JP4362732B2 (ja) 2005-06-17 2009-11-11 信越化学工業株式会社 フォトマスク用大型ガラス基板及びその製造方法、コンピュータ読み取り可能な記録媒体、並びにマザーガラスの露光方法
US7608542B2 (en) 2005-06-17 2009-10-27 Shin-Etsu Chemical Co., Ltd. Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method
JP2008151916A (ja) * 2006-12-15 2008-07-03 Shin Etsu Chem Co Ltd 大型フォトマスク基板のリサイクル方法
JP5304644B2 (ja) * 2007-05-09 2013-10-02 株式会社ニコン フォトマスク用基板、フォトマスク用基板の成形部材、フォトマスク用基板の製造方法、フォトマスク、およびフォトマスクを用いた露光方法
JP5584884B2 (ja) * 2007-10-01 2014-09-10 シャープ株式会社 ガラス基板の欠陥修正方法、ガラス基板の製造方法
JP5365137B2 (ja) * 2008-10-29 2013-12-11 東ソー株式会社 フォトマスク用基板およびその製造方法
JP5526895B2 (ja) 2009-04-01 2014-06-18 信越化学工業株式会社 大型合成石英ガラス基板の製造方法
JP5578708B2 (ja) * 2010-04-19 2014-08-27 Ｈｏｙａ株式会社 Ｆｐｄ製造用再生フォトマスク基板の製造方法、再生フォトマスク用ブランクの製造方法、ペリクル付再生フォトマスクの製造方法及びパターン転写方法
JP5937409B2 (ja) * 2011-04-13 2016-06-22 Hoya株式会社 フォトマスク用基板、フォトマスク、フォトマスクの製造方法、及びパターン転写方法
CN112338644A (zh) * 2020-10-30 2021-02-09 江苏汇鼎光学眼镜有限公司 一种镜片表面处理工艺

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